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Low molecular weight tannic acid

Low molecular weight tannic acid is a chemical compound used in various laboratory applications. It serves as a fixative and staining agent for electron microscopy, stabilizing and enhancing the contrast of biological samples during the imaging process.

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4 protocols using low molecular weight tannic acid

1

Combinatorial Heavy Metal Staining Protocol for Backscatter Electron Imaging

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The fixed kidney samples were cut into 250-μm-thick slices with a DTK-1000 Microslicer (Dosaka EM, Kyoto, Japan), and the slices were processed largely in accordance with a combinatorial heavy metal staining protocol which has been released on the website of the National Center for Microscopy and Imaging Research (La Jolla, CA) (http://ncmir.ucsd.edu/sbfsem-protocol.pdf). This protocol was designed to enhance signal for backscatter electron imaging of epoxy-resin-embedded mammalian tissue at low accelerating voltages. In brief, the tissue slices were successively immersed in 1% osmium tetroxide containing 1.5% potassium ferrocyanide in 0.1 M cacodylate buffer for 1 hr on ice, 1% low molecular weight tannic acid (Electron Microscopy Sciences, Hatfield, PA) in 0.1 M cacodylate buffer for 4 hr at RT, 2% aqueous osmium tetroxide for 30 min at RT, 1% aqueous uranyl acetate overnight at RT, and Walton's lead aspartate solution36 (link) for 30 min at 60°C. The slices were then dehydrated with a graded series of ethanol, and were embedded in epoxy resin, Oken Epok 812 (Okenshoji, Tokyo, Japan).
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2

Detailed Planarian Extracellular Matrix Visualization

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Planarians were fixed with 2.5% glutaraldehyde in 0.1 M phosphate buffer at 4°C for 24 hours (hr). The fixed samples were processed by modified cold dehydration method. This method enables detailed morphological observation of the extracellular matrices and cytoskeletons, as previously reported [5 (link)]. In brief, the samples were successively immersed in 0.4% OsO4 in 0.1 M phospate buffer for 1 hr, 2% low molecular weight tannic acid (Electron Microscopy Sciences, Hatfield, PA) in 0.05 M maleate buffer for 4 hr, and 1% uranyl acetate in 0.05 M maleate buffer for 3 hr. The samples were then dehydrated with a graded series of ethanol and embedded in Epoxy resin. The ultrathin sections were stained with uranyl acetate and lead citrate and observed with a JEM1230 transmission electron microscope (JEOL, Tokyo, Japan).
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3

Heavy Metal Staining for Backscatter Electron Imaging

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Fixed specimens were processed using a combinatorial heavy metal staining protocol for enhancing the signal for the backscatter electron imaging of epoxy-resin-embedded biological samples at low accelerating voltages. In brief, the specimens were successively immersed in 1% osmium tetroxide which contained 1.5% potassium ferrocyanide in 0.1 M cacodylate buffer for 1 h on ice, 1% low molecular weight tannic acid (Electron Microscopy Sciences, Hatfield, PA) in 0.1 M cacodylate buffer for 4 h at 25 °C, 2% aqueous osmium tetroxide for 30 min at 25 °C, and 1% aqueous uranyl acetate overnight at 25 °C. Subsequently, samples were dehydrated with a graded series of ethanol and embedded in epoxy resin, Oken Epok 812 (Okenshoji, Tokyo, Japan). For the detailed protocol of sample preparation, see Miyaki et al. (2020a (link), b ).
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4

Combinatorial Heavy Metal Staining for Mammalian Tissue Imaging

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The fixed samples were processed using a combinatorial heavy metal staining protocol. This protocol was designed to enhance the signal for the backscatter electron imaging of epoxy-resin-embedded mammalian tissue at low accelerating voltages. In brief, the samples were successively immersed in 1% osmium tetroxide that contained 1.5% potassium ferrocyanide in 0.1 M cacodylate buffer for 1 h on ice, 1% low molecular weight tannic acid (Electron Microscopy Sciences, Hatfield, PA) in 0.1 M cacodylate buffer for 4 h at 25 °C, 2% aqueous osmium tetroxide for 30 min at 25 °C and 1% aqueous uranyl acetate overnight at 25 °C. The samples were then dehydrated with a graded series of ethanol and were embedded in epoxy resin, Oken Epok 812 (Okenshoji, Tokyo, Japan).
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