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2100f field emission tem

Manufactured by JEOL
Sourced in Japan

The 2100F field emission TEM is a transmission electron microscope manufactured by JEOL. It is designed to provide high-resolution imaging and analysis of samples at the nanometer scale. The 2100F utilizes a field emission electron source to generate a high-brightness electron beam, enabling improved resolution and signal-to-noise ratio compared to traditional thermionic emission sources.

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5 protocols using 2100f field emission tem

1

TEM Analysis of Cementum-Dentin Interface

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90 nm ultrathin sections corresponding to the surface studied by AFM, were coated with a thin (~5 nm) layer of carbon and analyzed in a JEOL 2100F Field Emission TEM operated at 120 keV. Conventional bright-field TEM image of the cementum–dentin interface was recorded. The texture of collagen within the cementum–dentin interface was analyzed with selected-area electron diffraction (SAED) patterns.
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2

Atomic-Scale Nanocrystal Characterization

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TEM and high-angle annular dark-field (HAADF)-STEM images were collected on a JEOL 2100-F field emission TEM with an operating voltage of 120 kV. Samples for TEM were prepared by dispersing particles in hexane and drop casting onto copper TEM grids coated with carbon mesh and dried under vacuum. Focus was optimized using a particle on the edge of a NP-COF construct where thickness was minimal. Size analysis was performed by digitally measuring the width of nanocrystals; only particles showing substantial contrast from their COF template were counted for maximum accuracy. A sample size of 100 nanocrystals was used in both the case of ThO2 NPs@COF-5 and UO2 NPs@COF-5 to give a reasonable statistical distribution of nanocrystal size.
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3

Multimodal Characterization of Materials

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XRD patterns were recorded on Rigaku D/max 2400, Japan, with Cu Kα radiation in the 2-theta range from 10°–80°. Raman spectra were scanned from 2850 to 100 cm−1 on a high-resolution dispersive Raman spectroscopic microscope (Horiba Jobin Yvon, USA). Scanning electron microscopy (SEM) images were obtained on a Hitachi S-4700, Japan, operating at 15 kV and equipped with an EDAX lithium-drifted silicon X-ray energy-dispersive spectrometer (XEDS). The transmission electron microscope (TEM) samples were examined in a JEOL (Japan) 2100F field emission TEM equipped with an energy dispersive X-ray spectrometry (EDS).
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4

Comprehensive Characterization of Materials

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X-ray diffraction (XRD) patterns were recorded on Rigaku D/max 2400, Japan, with Cu Kα radiation in the 2-Theta range from 10–80°. X-ray photoelectron spectroscopy (XPS) was carried out on a RBD upgraded PHI-5000C ESCA system (Perkin Elmer) with Mg Kα radiation (1253.6 eV). N2 adsorption-desorption isotherms were measured using a Micromeritics ASAP 2020 Analyzer (USA). Specific surface areas were calculated using the Brunauer- Emmett-Teller (BET) model, and the pore size distributions were evaluated using the Barrett-Joyner-Halenda (BJH) model. Scanning electron microscopy (SEM) images were obtained on a Hitachi S-4700 (Japan) operating at 10 kV. The transmission electron microscope (TEM) samples were examined in a JEOL (Japan) 2100F field emission TEM equipped with an energy dispersive X-ray spectrometry (EDS).
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5

High-resolution TEM imaging of quantum dots

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A JEOL 2100F field emission TEM operating at 200 kV was used to capture high-resolution TEM images. TEM samples were prepared by drop-casting a dilute dispersion of QDs in hexane onto a TEM grid.
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