software. These masks were designed to have equal alternating transparent and
opaque sections for each individual size. Three mask types consisting of 60, and
120 μm alternating patterns, and an OHSU logo mask were fabricated
(Output City). Hydrogel constructs were fabricated by dispensing 10 μl of
GelMA hydrogel precursor onto a TMSPMA (3-(Trimethoxysilyl)propyl methacrylate)
(Sigma) coated glass slide. The hydrogel precursor was then compressed to 100
μm thick disks following previous methods [5 (link)]. This hydrogel disk was then photocrosslinked under UV light with
a power of 850 mW for 30 s and at a distance of 8.5 cm. Patterned hydrogel was
formed by covering the sample with an individual photomask prior to photo
crosslinking. The resulting hydrogel was rinsed with DPBS to remove any
remaining hydrogel precursor, as illustrated in