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Jsm 7800f field

Manufactured by JEOL
Sourced in Japan

The JSM-7800F field emission scanning electron microscope (FESEM) is a high-performance imaging system designed for a wide range of applications. It features a high-resolution electron optical system and advanced capabilities for high-quality imaging and analysis.

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5 protocols using jsm 7800f field

1

Characterizing Film Morphology and Anisotropic Photocurrent

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SEM images were obtained using a JEOL JSM-7800F field-emission scanning electron microscope at 5 kV and 10.3 mm WD to examine film morphology. Raman spectra were obtained using a RAMHR 800 system from Horiba Jobin Yvon Lab with a laser excitation wavelength of 532 nm. Polarized micro-Raman spectroscopy was obtained in a quasi-back-scattering geometry using ~20 mW at the 514.5-nanometer line of Ar-ion laser equipped with an objective of 100× as the excitation source. All electrical and opto-electrical measurements were performed in air using Keysight B2912A. The measurements of anisotropic photocurrent versus light polarization were characterized by introducing a linear polarizing filter between the sample and incident beam laser.
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2

Micro-Morphology and Phase Analysis of Sputtered Materials

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The micro-morphology of sputtered Ag, PET, ITO, nylon 66, PI, FEP, and PDMS were obtained on a JEOL JSM-7800F field-emission scanning electron microscope (JEOL Ltd., Beijing, China). The chemical states of sputtered Ag with and without air exposure were analyzed by X-ray photoelectron spectroscopy using a K-Alpha XPS (Thermo Fisher Scientific, Waltham, MA, USA). All X-ray photoelectron spectroscopy (XPS) measurements were performed at room temperature, the survey spectra of sputtered Ag were obtained, and the fitted components of Ag 3d were obtained by software. The phase structure of sputtered Ag was examined on a Rigaku D/max 2500 PC diffraction equipment (Rigaku, Tokyo, Japan) with Cu Ka radiation.
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3

Scanning Electron Microscopy Characterization

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The
characterization by
scanning electron microscopy was carried out in an SEM Jeol JSM-7800F
field emission equipment operated at 30 kV that has a secondary electron
detector, transmitted electrons (STEM), and energy-dispersive X-ray
spectroscopy (EDX) detectors.
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4

Comprehensive Characterization of Novel Materials

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The microstructures and sizes of the samples were taken by a JSM-7800F field emission scanning electron microscope (JEOL-7800F, Japan). Optical images were captured by a Nikon Eclipse Ti inverted fluorescence microscope (Nikon, Japan) equipped with a Photometrics Prime sCMOS (scientific complementary metal-oxide-semiconductor) camera (Photometrics Company, USA). Fluorescence imaging was carried out on the above inverted fluorescence microscope under green light excitation (filter, 537 to 552 nm). XRD analysis was performed using a SmartLab diffractometer (Rigaku, Japan) with Cu Kα radiation of 1.54059-Å wavelength between 5° and 80°. The surface composition was recorded using an FTIR (Thermo Nicolet Nexus 670, USA) spectrometer with KBr pellets. UV-vis spectrum was taken on a U2910 double beam UV-vis spectrophotometer (Hitachi, Japan). Fluorescence spectra were measured on a Hitachi F-7000 spectrophotometer (Hitachi, Japan) equipped with a 1-cm quartz cuvette at room temperature. The excitation and emission slit widths were set at 10 and 10 nm, respectively. Zeta potentials were conducted on a Zetasizer Nano ZS instrument (Malvern, UK).
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5

Electroanalytical Characterization of Nanomaterials

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Cyclic voltammetry (CV) and differential pulse voltammetry (DPV) were performed on a CHI 760E electrochemical workstation (Chenhua Instrument Shanghai Co., Ltd. Shanghai, China). A typical three-electrode system consisting of an Ag/AgCl reference electrode, a Pt wire counter electrode and a modified glassy carbon electrode (GCE, Φ = 3 mm) as working electrode, was used for all electrochemical measurements. The morphologies of prepared nanomaterials were observed on a JSM-7800F field emission scanning electron microscope (FESEM, JEOL, Tokyo, Japan) and a JEM-2100F transmission electron microscope (TEM, JEOL, Tokyo, Japan).
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