X-ray photoelectron spectra (XPS) were measured for pristine and chemically modified PDMS devices at a 45° take-off angle, relative to the surface sample holder, with a PHI 5600 Multi Technique System (Physical Electronics GmbH, Feldkirchen, Germany, base pressure of the main chamber 1 × 10−8 Pa) [35 ,36 (link)]. Samples placed on a molybdenum specimen holder were excited with the Al-Kα X-ray radiation using a pass energy of 5.85 eV. The instrumental energy resolution was ≤ 0.5 eV. Structures due to the Al-Kα X-ray satellites were subtracted from the spectra prior to data processing. XPS peak intensities were obtained after a Shirley background removal. Spectra calibration was achieved by fixing the Ag3d5/2 peak of a clean sample at 368.3 eV; this method turned the C1s main peak at 285.0 eV. Atomic concentration analysis was performed by considering the relevant atomic sensitivity factors.
Phi 5600 multi technique system
Manufactured by Physical Electronics
Sourced in Germany
The PHI 5600 Multi Technique System is a comprehensive analytical instrument designed for surface analysis. It offers multiple complementary techniques, including X-ray Photoelectron Spectroscopy (XPS), Auger Electron Spectroscopy (AES), and Ion Scattering Spectroscopy (ISS), within a single high-vacuum system. The system is capable of providing detailed information about the chemical composition and electronic structure of a sample's surface and near-surface region.
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Lab products found in correlation
3 protocols using phi 5600 multi technique system
1
XPS Characterization of PDMS Devices
2
Surface Morphology Characterization by SEM-XPS
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The change in the samples’ surface morphology as a function of AO flux was characterized using a Sigma 300 VP HRSEM from ZEISS (Oberkochen, Germany). XPS measurements were performed using a PHI 5600 Multi-Technique System (Physical Electronics, Chanhassen, MN, USA). The samples were irradiated with an Al Kα monochromatic source (1486.6 eV), and the emitted photoelectrons were analyzed by a spherical analyzer with a slit aperture of 0.8 mm. The samples were characterized by depth profiling using 5 kV argon ions at a sputter rate of 47.6 Å/min, as measured on a SiO2/Si reference sample. Sample charging was compensated with a charge neutralizer, and the binding energies were calibrated according to the C 1s reference line at 285 eV. High-resolution XPS spectra were taken at pass energy of 11.75 eV. Spectra analysis of the different XPS lines was carried out using CasaXPS software (Version 2.3.19PR.0, Casa Software Ltd., Teignmouth, UK) with a Gaussian–Lorentzian product function and a non-linear Shirley background subtraction [59 (link)]. The Gaussian–Lorentzian mixing ratio was taken as 0.3 for all lines.
3
X-ray Photoelectron Spectroscopy Analysis Procedure
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X-ray photoelectron
spectra (XPS) were recorded with PHI 5600 Multi Technique System (Physical
Electronics GmbH, Feldkirchen, Germany, base pressure of the main
chamber: 3 × 10–8 Pa).38 (link),39 Samples, placed on a molybdenum specimen holder, were excited with
Al Kα X-ray radiation using a pass energy of 5.85 eV. The instrumental
energy resolution was ≤0.5 eV. Structures due to the Al Kα
X-ray satellites were subtracted prior to data processing. XPS peak
intensities were obtained after the removal of the Shirley background.
Spectra calibration was achieved by fixing the Ag 3d5/2 peak of a clean sample at 368.3 eV; this method turned the C 1s
peak of the adventitious carbon contamination at 285.0 eV.46 (link) Atomic concentration analysis was performed
by taking into account the relevant atomic sensitivity factors.39 The fitting of some XPS spectra was carried
out using XPSPEAK4.1 software, by fitting the spectral profiles with
symmetrical Gaussian envelopes, after subtraction of the background.
This process involved data refinement, based on the method of the
least-squares fitting, and was carried out until there was the highest
possible correlation between the experimental spectrum and the theoretical
profile. The residual or agreement factor R, defined
by R = [∑ (Fobs – Fcalc)2 / ∑
(Fobs)2]1/2, after
minimization of the function ∑ (Fobs – Fcalc)2, converged
to the value of 0.03.
spectra (XPS) were recorded with PHI 5600 Multi Technique System (Physical
Electronics GmbH, Feldkirchen, Germany, base pressure of the main
chamber: 3 × 10–8 Pa).38 (link),39 Samples, placed on a molybdenum specimen holder, were excited with
Al Kα X-ray radiation using a pass energy of 5.85 eV. The instrumental
energy resolution was ≤0.5 eV. Structures due to the Al Kα
X-ray satellites were subtracted prior to data processing. XPS peak
intensities were obtained after the removal of the Shirley background.
Spectra calibration was achieved by fixing the Ag 3d5/2 peak of a clean sample at 368.3 eV; this method turned the C 1s
peak of the adventitious carbon contamination at 285.0 eV.46 (link) Atomic concentration analysis was performed
by taking into account the relevant atomic sensitivity factors.39 The fitting of some XPS spectra was carried
out using XPSPEAK4.1 software, by fitting the spectral profiles with
symmetrical Gaussian envelopes, after subtraction of the background.
This process involved data refinement, based on the method of the
least-squares fitting, and was carried out until there was the highest
possible correlation between the experimental spectrum and the theoretical
profile. The residual or agreement factor R, defined
by R = [∑ (Fobs – Fcalc)2 / ∑
(Fobs)2]1/2, after
minimization of the function ∑ (Fobs – Fcalc)2, converged
to the value of 0.03.
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