The 2.15%-MAPDSA–MAPDST resist (see
Fig. 1) was synthesized according to previous protocols by the co-polymerization between the starting organic monomer, MAPDST, and the hybrid monomer, MAPDSA, using azobisisobutyronitrile (AIBN) as a free radical initiator.
23 (link) Oxygen (99.999%) and argon (99.999%) were obtained from White Martins-Praxair, Inc. and used as received. They were used for surface oxidation during the experiments and for thin film preparation, respectively.
Potassium trifluoromethanesulfonate (98%) was purchased from Sigma Aldrich and was also used as received.
Moura C.A., Belmonte G.K., Reddy P.G., Gonslaves K.E, & Weibel D.E. (2018). EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer. RSC Advances, 8(20), 10930-10938.