Multimode 8 system
The Bruker Multimode 8 system is a versatile atomic force microscope (AFM) designed for high-resolution imaging and analysis of a wide range of samples. It offers advanced capabilities for topographic, mechanical, and electrical characterization at the nanoscale.
Lab products found in correlation
13 protocols using multimode 8 system
Growth and Characterization of Sn Nanostructures
Characterization of E-DNA Nanopores
Atomic Force Microscopy of HOPG
Spectroscopy and Microscopy Characterization
for the measurements of UV–vis spectra. 1H NMR spectra
(1H-400 MHz) were recorded on a Bruker DPX 400 spectrometer.
Elemental analyses were carried out with an Elementary Vario El. IR
spectra were recorded using a Bruker Tensor 37 spectrometer. The TEM
measurements were achieved by using a JEOL TEM-2010 electron microscope
(Japan) equipped with a charge-coupled device camera, operated at
200 kV. SEM images were obtained using a JEOL JEM-6510A scanning electron
microscope at 10 kV. The AFM images were recorded from a Bruker Multimode
8 system with a silicon cantilever by using tapping mode. XRD was
measured on a Rigaku TTRIII X-ray diffractometer (Japan) with Cu Kα
radiation (λ = 1.54 Å), which was operated at 45 kV, 100
mA. F-4500 FL spectrophotometer and JASCO J-815 CD spectropolarimeter
were used for fluorescence spectral measurements and CD spectral measurements,
respectively. For photodegradation measurements, a 500 W xenon arc
lamp (CEL-LAX-500 W, Beijing Aulighttech Co. Ltd, China) served as
the light source. In addition, the photodegradation experiment was
performed on a photocatalytic reactor which came from Beijing Aulighttech
Co. Ltd, China.
Modulus Mapping of Polymer Films by AFM
to perform modulus mapping and topographic20 via atomic force microscopy (AFM) measurements. As described previously,21 the reduced Young’s modulus is directly
extracted using the PeakForce QNM imaging mode based on a modified
Hertzian model (i.e., the DMT model, which takes into account the
surface–tip interactions neglected in the Hertz model). In
this study, the system was calibrated using sapphire and then PS standard
(modulus = 2.7 GPa). Thermal tuning of the silicon cantilever (k = 48 N/m, VistaProbe) possesses a frequency of 190 kHz
with an average deformation of approximately 3 nm. A Poisson ratio
of 0.35 was chosen, leading to a potential systemic error for the
moduli evaluation of −12% to +8%. All films were formed by
solution casting, at the same time, under the same conditions. Polymers
were solubilized in warm DMF; a drop was placed on a glass surface.
The samples were warmed at 120 °C for 18 h under vacuum, then
allowed to cool to room temperature, and heated again to 110 °C
for 2 h. After cooling to room temperature, the vacuum was stopped.
Films were kept over P2O5 under vacuum.
Characterizing FNR Activity and AFM Topography
Graphene Bubbles on Ge(110) Substrates
Surface Characterization of Materials
Optoelectrical Characterization of InAs Nanowires
AFM Imaging of DNA Nanostructures
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