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13 protocols using multimode 8 system

1

Growth and Characterization of Sn Nanostructures

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Details on the growth and structural characterization of the Sn nanostructures can be found in ref. 32 (link). The Sn islands were grown using molecular beam epitaxy on Si(111) substrates. The Sn cluster-assembled film was grown on a SiO2 substrate using a laser-vaporization cluster source51 . The AFM images were recorded using a Nanowizard 3 system (JPK, Germany) and a Multimode 8 system (Bruker, USA) and processed using WSxM52 (link). The superconducting behaviour of the different Sn samples was probed by SQUID magnetization measurements (LOT-Quantum Design, MPMS-XL). The phonon density of states of all Sn samples was measured using nuclear resonant inelastic X-ray scattering53 –55 (link) at sector 3-ID of the Advanced Photon Source (Argonne National Laboratory, USA). Measurements were carried out at 35 ± 20 K in a grazing incidence geometry. The data were analyzed using the PHOENIX software56 (link). A more elaborate discussion of the nuclear resonant inelastic X-ray scattering measurements can be found elsewhere32 (link).
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2

Characterization of E-DNA Nanopores

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The assembled E-DNA nanopores were analyzed by 1% agarose gel electrophoresis while using 1 × TAE buffer. The agarose gel was pre-stained by 4S Red Plus Nucleic Acid Stain. For gel loading, a solution of 1 μL E-DNA nanopores, 1 μL 6 × loading buffer was mixed with 4 μL 1 × TAE buffer. The gel was run for 60 min at 70 V at room temperature. The bands were then visualized by UV illumination (Amersham imager 680). Transmission electron microscope (TEM) and atomic force microscope (AFM) were used to determine the morphology and detailed dimension of E-DNA nanopores. An appropriate amount of E-DNA nanopores were dropped on carbon-coated copper grids and incubated for 10 min before being drained with filter paper. 10 μL 2% sodium phosphotungstate was immediately added to the copper grids and incubated for 5 min for negative staining. After drying with filter paper, the samples were rinsed three times with ultra-pure water. The TEM images were captured by transmission electron microscope (HT7700, Hitachi). Initially, 5 μL E-DNA nanopores were mixed with 40 μL 1 × TAE buffer containing 10 mM MgCl2 and 30 mM NiCl2. An appropriate amount of the mixture was spread on the surface of freshly treated mica and incubated for about 2 min. The AFM images were obtained using a Multimode 8 system (Bruker Corp).
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3

Atomic Force Microscopy of HOPG

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AFM was performed with a Bruker Multimode 8 system in tapping mode in air. An HOPG substrate was freshly cleaved before drop-casting the samples. A silicon cantilever (Bruker, MPP-11100–10) was used.
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4

Spectroscopy and Microscopy Characterization

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A JASCO UV-550 spectrophotometer was used
for the measurements of UV–vis spectra. 1H NMR spectra
(1H-400 MHz) were recorded on a Bruker DPX 400 spectrometer.
Elemental analyses were carried out with an Elementary Vario El. IR
spectra were recorded using a Bruker Tensor 37 spectrometer. The TEM
measurements were achieved by using a JEOL TEM-2010 electron microscope
(Japan) equipped with a charge-coupled device camera, operated at
200 kV. SEM images were obtained using a JEOL JEM-6510A scanning electron
microscope at 10 kV. The AFM images were recorded from a Bruker Multimode
8 system with a silicon cantilever by using tapping mode. XRD was
measured on a Rigaku TTRIII X-ray diffractometer (Japan) with Cu Kα
radiation (λ = 1.54 Å), which was operated at 45 kV, 100
mA. F-4500 FL spectrophotometer and JASCO J-815 CD spectropolarimeter
were used for fluorescence spectral measurements and CD spectral measurements,
respectively. For photodegradation measurements, a 500 W xenon arc
lamp (CEL-LAX-500 W, Beijing Aulighttech Co. Ltd, China) served as
the light source. In addition, the photodegradation experiment was
performed on a photocatalytic reactor which came from Beijing Aulighttech
Co. Ltd, China.
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5

Modulus Mapping of Polymer Films by AFM

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A Bruker Multimode 8 system in PeakForce tapping mode permitted
to perform modulus mapping and topographic20 via atomic force microscopy (AFM) measurements. As described previously,21 the reduced Young’s modulus is directly
extracted using the PeakForce QNM imaging mode based on a modified
Hertzian model (i.e., the DMT model, which takes into account the
surface–tip interactions neglected in the Hertz model). In
this study, the system was calibrated using sapphire and then PS standard
(modulus = 2.7 GPa). Thermal tuning of the silicon cantilever (k = 48 N/m, VistaProbe) possesses a frequency of 190 kHz
with an average deformation of approximately 3 nm. A Poisson ratio
of 0.35 was chosen, leading to a potential systemic error for the
moduli evaluation of −12% to +8%. All films were formed by
solution casting, at the same time, under the same conditions. Polymers
were solubilized in warm DMF; a drop was placed on a glass surface.
The samples were warmed at 120 °C for 18 h under vacuum, then
allowed to cool to room temperature, and heated again to 110 °C
for 2 h. After cooling to room temperature, the vacuum was stopped.
Films were kept over P2O5 under vacuum.
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6

Characterizing FNR Activity and AFM Topography

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As a first control, the functionality of FNR after tagging with Sulfo-LC-SDP was ensured by evaluating its FNR cytochrome c reductase activity, as previously described [35 (link)]. Then, AFM topography images were obtained in a MultiMode 8 system (Bruker, Santa Barbara, CA, USA) using a soft silicon nitride 2 nm final tip radius SNL-D AFM cantilevers with a nominal spring constant of 0.06 N/m and a resonance frequency of 18 kHz in air (Microlever; Bruker Probes, Santa Barbara, CA, USA). Imaging measurements were performed using the tapping operation mode based on the cantilever oscillation near its respective resonance frequency in a liquid cell using PBS, pH 8.3. The height of the layers was analyzed by scratching experiments consisting of scraping the surface at a high loaded force in contact mode, dragging the functionalized groups throughout the surface using SNL-A probes with 0.35 N/m stiffness constant. By controlling the normal force applied to the probe, hole-type patterns can be fabricated and the mica surface can be uncovered so that a clear height profile can be obtained from an image of a larger area [37 ]. Analysis of the images was performed using the WxSM free software for SPM [38 (link)].
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7

Graphene Bubbles on Ge(110) Substrates

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Intrinsic Ge(110) wafers (TaiCrystal, >50 ohm.cm, 400 μm thickness) were used in the experiments. The graphene film was synthesized on Ge(110) substrate by chemical vapour deposition in a horizontal tube furnace with H2: CH4: Ar = 0.7: 23: 220 sccm at the growth temperature of 916 °C for 300 min. Bruker Multimode 8 system was utilized to create the GNBs and measure the morphologies of the GNBs at ambient conditions (temperature ~22 °C, relative humidity ~30%). During the graphene bubbles fabrication, Pt/Ir coated silicon AFM tips with radius of curvature ~30 nm (ANSCM-PC with k = 0.4 N/m, APPNANO) were chosen.
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8

Surface Characterization of Materials

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The surface morphologies of samples were examined at 15 kV of accelerating voltage by field emission scanning electron microscopy (FE-SEM; Hitachi SU8220, Japan) and the surface roughness was measured by atomic force microscope in the tapping mode (AFM; Bruker Multimode 8 system, USA). The chemical compositions and chemical states of all samples were tested by X-ray photoelectron spectroscopy (XPS, Al target; PHI 5802, Physical Electronics Inc., Eden Prairie, MN, USA).
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9

Optoelectrical Characterization of InAs Nanowires

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High-resolution transmission electron microscopy (HRTEM) is used to characterize the lattice quality of InAs NW in a Tecnai F20 TEM (FEI, Portland, OR, USA). The morphology of InAs NWs on the transferred substrate are observed and positioned by scanning electron microscopy (SEM) (using a Quanta FEG 600, FEI, Brno, Czech Republic), and the diameter of the NW is measured by atomic force microscopy (AFM) (using a Multimode 8 system, Bruker, Karlsruhe, Germany). All optoelectrical measurements are carried out in air at room temperature on a LabRAM HR800 evolution system (Horiba Jobin-Yvon, Paris, France) with NKT EXR-15 supercontinuum laser sources. Simultaneous optoelectrical characterization was performed using a Keithley 4200 semiconductor analyzer (Keithley, Cleveland, OH, USA) equipped with a probe station. The detailed optoelectrical measurements can be found in the previous report by our group [47 (link)].
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10

AFM Imaging of DNA Nanostructures

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AFM images were captured on a Bruker Multimode 8 system with Nanoscope V controller in a ScanAsyst in Fluid mode with ScanAsyst-Fluid+ AFM probes (Bruker, k ~ 0.7 N/m, tip radius <10 nm). Two microliters of sample was deposited on freshly cleaved mica followed by the addition of 48 μL of 1x TAE with 12.5 mM Mg2+ for 2 min. One mM NiCl2 buffer can be used to enhance the adsorption of DNA nanostructures on the mica surface.
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