Ultra dld
The Ultra DLD is a high-performance liquid chromatography (HPLC) system manufactured by Shimadzu. It is designed to provide precise and reliable separation and analysis of a wide range of chemical compounds. The core function of the Ultra DLD is to enable efficient and accurate chromatographic separation and detection of analytes in complex samples.
Lab products found in correlation
16 protocols using ultra dld
Characterization of CO₂-LiAlH₄-Graphite Products
Comprehensive Characterization of g-C3N4
Characterization of HA-Tb Nanocrystals
Characterization of Novel Materials
characterized by X-ray diffraction (XRD) using a PANalytical X’pert
pro diffractometer (Cu Kα radiation, secondary graphite monochromator,
scanning rate of 1° 2θ/min). IR spectroscopic studies were
carried out in a PerkinElmer FTIR spectrophotometer (spectrum two)
in the range from 4000 to 550 cm–1 with a resolution
of 4 cm–1. X-ray photoelectron spectra (XPS) of
the samples were recorded using a Kratos axis Ultra DLD. Scanning
electron microscopy (SEM) images were recorded using a Zeiss, Ultra
55 field emission scanning electron microscope. A PerkinElmer LS 35
spectrometer was used to record the UV–visible spectra. The
catalytic oxidation of benzyl alcohol was monitored by HPLC (Jasco)
using a C18 column and a UV detector at 253 nm. A mixture of water
and acetonitrile in a 70:30 volume ratio and 0.2 M phosphoric acid
was used as the mobile phase. The mobile phase flow rate was maintained
at 0.8 mL min–1. The nitrogen sorption analysis
was performed in a BELsorp mini-II instrument at liquid nitrogen temperature.
The surface area of the material was determined by employing the Brunauer–Emmett–Teller
equation. The pore sizes and pore volumes of the materials were obtained
by the Barrett–Joyner–Halenda (BJH) method.
Multimodal Characterization of NTO Powders and Coatings
and phase analyses of the NTO powders and the coatings were carried
out using X-ray diffraction (XRD: Panalytical X’Pert Pro) and
Raman spectroscopy (Renishaw inVia, using a 633 nm laser source).
The morphology and composition of the processed surfaces were characterized
using scanning electron microscopy (SEM, FEI NOVA 230) coupled with
an energy dispersive X-ray emission spectrometer (EDS, Thermo Scientific
UltraDry). Finally, both elemental compositions and valence states
were examined by X-ray photoelectron spectroscopy (XPS, Kratos Ultra
DLD) using monochromated Al Kα radiation (15 kV, 10 mA), with
a pass energy of 20 eV for high-resolution surveys. It should be noted
that, prior to the XPS analysis, the sample surfaces were cleaned
by Ar+ sputtering for 3 min to remove any surface impurities.
Following XPS analysis, quantitative analysis of the spectra was carried
out using the CasaXPS software.31
Graphene Crystallinity Analysis via LEED
Ultraviolet Photoelectron Spectroscopy Technique
Comprehensive Materials Characterization Protocol
In-situ DRIFTS characterization was operated on a Nicolet iS50 FTIR spectrometer. 13C isotope tracing experiment was performed by mass spectrometry (Finnigan MAT 271). The O2 generated during the CO2 photoreduction process was detected by a gas chromatograph (GC14C, Shimadzu) with a TCD detector.
Surface Characterization and Mg Release
Comprehensive Material Characterization
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