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Phi 5702 multi functional x ray photoelectron spectrometer

Manufactured by Physical Electronics
Sourced in United States

The PHI-5702 is a multi-functional X-ray photoelectron spectrometer (XPS) designed for surface analysis. It utilizes X-ray excitation to eject photoelectrons from the surface of a sample, allowing for the determination of the elemental composition and chemical state of the material.

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3 protocols using phi 5702 multi functional x ray photoelectron spectrometer

1

Comprehensive Structural and Compositional Characterization

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The crystal structures, morphologies and microstructures of the samples were characterized by X-ray powder diffraction (XRD) and scanning/transmission electron microscopy (SEM/TEM). The used apparatuses were a D8 Advance X-ray diffractometer (Bruker AXS, Karlsruhe, Germany), a JSM-6701F field-emission scanning electron microscope (JEOL Ltd., Tokyo, Japan) and a JEM-1200EX field-emission transmission electron microscope (JEOL Ltd., Tokyo, Japan). A PHI-5702 multi-functional X-ray photoelectron spectrometer (Physical Electronics, hanhassen, MN, USA) was employed for the X-ray photoelectron spectroscopy (XPS) analysis. Ultraviolet-visible (UV-vis) diffuse reflectance spectroscopy (DRS) measurements were performed on a TU-1901 double beam UV-vis spectrophotometer (Beijing Purkinje General Instrument Co. Ltd., Beijing, China). A Spectrum Two Fourier transform infrared (FTIR) spectrophotometer (PerkinElmer, Waltham, MA, USA) was used for the FTIR spectroscopy analysis of the samples.
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2

Comprehensive Material Characterization Protocol

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A D8 Advance X-ray diffractometer (Bruker AXS, Karlsruhe, Germany) with λCu-kα = 0.15406 nm was used to record the X-ray powder diffraction (XRD) patterns of the samples. Scanning/transmission electron microscopy (SEM/TEM) investigations were performed on a JSM-6701F field-emission scanning electron microscope (JEOL Ltd., Tokyo, Japan) and a JEM-1200EX field-emission transmission electron microscope (JEOL Ltd., Tokyo, Japan). A PHI-5702 multi-functional X-ray photoelectron spectrometer (Physical Electronics, hanhassen, MN, USA) was used for the X-ray photoelectron spectroscopy (XPS) analyses. Fourier transform infrared (FTIR) spectroscopy was analyzed on a Spectrum Two FTIR spectrophotometer (PerkinElmer, Waltham, MA, USA).
The photoelectrochemical properties of the samples, i.e., electrochemical impedance spectroscopy (EIS) and photocurrent response, were measured on a CST 350 electrochemical workstation according to the procedure elaborated in our previous work [47 (link)]. A Na2SO4 aqueous solution (0.1 mol L−1) served as the electrolyte. Simulated sunlight emitted from a 200-W xenon lamp (300 < λ < 2500 nm) was used as the light source. The preparation process of the working electrode was described in our previous work [49 (link)].
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3

Comprehensive Materials Characterization Protocol

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X-ray powder diffraction (XRD) was employed to investigate the phase purity of the samples on a D8 Advance X-ray diffractometer (Bruker AXS, Karlsruhe, Germany). The morphologies and microstructures of the products were observed by field-emission scanning electron microscopy (SEM) and field-emission transmission electron microscopy (TEM). The SEM investigation was performed on a JSM-6701F scanning electron microscope (JEOL Ltd., Tokyo, Japan), and the TEM observation was carried out on a JEM-1200EX transmission electron microscope (JEOL Ltd., Tokyo, Japan). X-ray photoelectron spectroscopy (XPS) was used to record the chemical states of the elements on a PHI-5702 multi-functional X-ray photoelectron spectrometer (Physical Electronics, Chanhassen, MN, USA). The ultraviolet–visible (UV-Vis) diffuse reflectance spectra of the samples were tested by using a TU-1901 double beam UV-Vis spectrophotometer (Beijing Purkinje General Instrument Co. Ltd., Beijing, China) with BaSO4 as a reference. An RF-6000 fluorescence spectrophotometer (Shimadzu, Kyoto, Japan) was available to record the PL spectra of the samples (excitation wavelength: ~350 nm).
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