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Ultima 3 x ray diffractometer

Manufactured by Rigaku
Sourced in Japan, United States

The Ultima III X-ray diffractometer is a versatile instrument designed for the analysis of materials using X-ray diffraction. It provides accurate and reliable data on the crystallographic structure of a wide range of samples, including powders, thin films, and single crystals. The Ultima III features a compact design, advanced optics, and user-friendly software, making it a valuable tool for researchers and industries working in various fields, such as materials science, chemistry, and geology.

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9 protocols using ultima 3 x ray diffractometer

1

Conformational Analysis of Silk Fibroin

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To investigate the conformation of SF in Sal-SF-NPs, infrared spectra were recorded with a Fourier transform infrared spectrophotometer (FTIR) (Bruker VERTEX 80V, Ettlingen, Germany). Lyophilized regenerated silk fibroin (LSF) and degummed silk fibroin fiber (SFF) were also examined. The spectra were all recorded at a resolution of 4 cm−1 and were generated from 64 scans. To determine the β-sheet structure and crystallinity of SF in Sal-SF-NPs, the X-ray diffraction (XRD) intensity curves were measured by a Rigaku Ultima III X-ray diffractometer (Rigaku Corporation, Tokyo, Japan). LSF and SFF were also examined. The curves were all recorded at a scanning rate of 3°/min with the scanning region of 3°–45°.
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2

Characterization of CdTe Quantum Dots

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pH values were measured by a Starter 3C digital pH meter, Ohaus, USA. Transmission electron microscopy (TEM), selected area electron diffraction (SAED), and elemental characterization were done on a JEOL 2010 microscope (Akishima-shi, Japan) with energy-dispersive X-ray spectrometer (EDS) at an accelerating voltage of 200 kV. X-ray powder diffraction (XRD) spectrum was taken on Rigaku Ultima III X-ray diffractometer (Shibuya-ku, Japan) operated at 40 kV voltage and 30 mA current with Cu Ka radiation. UV-visible (vis) spectra were recorded on a Varian Cary 50 UV/Vis spectrometer, Agilent Technologies, Inc., Santa Clara, CA, USA. Emission spectra were collected using a Varian Cary spectrometer. Thermogravimetric analysis (TGA) was done under nitrogen on a STA 409 PC thermal analyzer, Netzsch, Germany. The quantum yield (QY) of CdTe QDs was measured according to the methods described in [26 (link)] using rhodamine 6G as a reference standard (QY = 95%).
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3

Comprehensive Structural Characterization of CGO-10

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All the synthesized materials were structurally characterized using a Rigaku Ultima-III X-ray diffractometer with Cu-Kα radiation (λ = 1.5406 Å). Morphological and elemental analyses were carried out using a Carl Zeiss-Sigma Scanning Electron Microscope with EDAX provision. HRTEM (high resolution transmission electron microscope) images and SAED (selected area electron diffraction) patterns of CGO-10, before and after cycling, were obtained using a Jeol/JEM 2100 HRTEM. The composition and the oxidation states of different elements in CGO-10 were analyzed by X-ray photoelectron spectroscopy (XPS) with a scan range of 1200 eV. Surface area and pore size analyses of CGO-10 were carried out using N2 adsorption–desorption curves obtained by using the Brunauer–Emmett–Teller method, and the data were obtained on a Micrometrics ASAP 2010 Physisorption & Porosimetry system. Pore size distributions were obtained by employing BJH analysis on the desorption branch.
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4

Comprehensive Characterization of ZnO Films

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A field emission scanning electron microscope (Hitachi S-4800, Japan) was used to acquire SEM images of ZnO surface. The XRD patterns of the ZnO films were taken using a Rigaku Ultima III X-ray diffractometer (Rigaku, USA) fitted with a small-angle X-ray scattering at 40 kV accelerating voltage and 44 mA current. Dielectric functions were obtained using a spectroscopic ellipsometry study. To obtain SE data, a rotating-compensator ellipsometer J. A. Woollam Co., (St. Lincoln, NE, USA) M-2000 DI was used. Unpolarized absorbance and transmittance spectra of the films were taken using a Shimadzu UV 2401PC Spectrophotometer. Spectroscopic ellipsometry data were taken to identify their dielectric functions. It is important to note that all these measurements were conducted at room temperature.
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5

Characterization of Nanocrystals Using HRTEM and XRD

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High-resolution TEM (HRTEM) measurements were taken with a JEOL-2010F transmission electron microscope operating at 200 kV and equipped with an Oxford Instruments 200 EDS apparatus, fitted with an Inca X-Site Ultra-Thin Window EDS detector. TEM samples were prepared by placing a drop of the colloidal solution onto a 200-mesh carbon-coated copper grid, and the solvent was allowed to dry, fixing the nanocrystals on the grid. To obtain elemental composition using EDS, the electron beam was focused on a single nanocrystal and the peaks were identified using the Oxford Instruments ISIS software. Data obtained from multiple single-nanocrystal measurements showed good repeatability. X-ray diffraction (XRD) was performed on a Rigaku® Ultima III X-ray diffractometer. The colloidal sample was applied to a heated glass slide and the solvent was evaporated away, affixing the sample to the slide.
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6

Comprehensive Material Characterization

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Single-crystal X-ray diffraction (XRD) data were collected using an Apex DUO with Mo-Kα radiation (λ = 0.71073 Å) at room temperature. The structures were resolved and refined using direct methods with SHELXL and Olex2. X-ray diffraction (XRD) measurements were carried out using a Rigaku Ultima III X-ray diffractometer equipped with Cu Kα radiation (λ = 1.541841 Å). Ultraviolet and visible (UV-vis) absorption spectra were measured using a Shimadzu UV-3600 Plus spectrophotometer at room temperature. PL spectra were measured using a Horiba PTI QuantaMaster 400. Time-resolved photoluminescence spectra were detected using an Edinburgh Instruments FLS980 at room temperature. The absolute fluorescence quantum yields were measured using a Horiba PTI QuantaMaster 400 steady-state fluorescence system with an integrating sphere. Scanning electron microscopy (SEM) and X-ray spectroscopy (EDS) were performed on a JEOL JSM-7800F at 15 kV. Fluorescence microscopy images were captured using an Axio Vert A1 FL-LED at room temperature.
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7

Characterization of Galvanostatic Oxide Products

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An OM (SZ61TRC, Olympus Korea Co., Seocho-gu, Seoul, Korea) was used to observe the surface morphology and the cross-section of each specimen, while each oxide product was analyzed via XRD (Rigaku Ultima III X-ray diffractometer, Tokyo, Japan) analysis with Cu Kα1 radiation (λ = 1.54056 Å) over a 2θ range of 20°–70°, using a step-size of 0.017° and a step-time of 1 s, to confirm the species of each oxide following the galvanostatic experiments.
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8

Comprehensive Characterization of UCNP

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The morphology of UCNP is tested by transmission electron microscopy using a Talos F200i apparatus (Carl Zeiss AG, Germany). UV-vis absorption and fluorescence spectrums of different samples were determined on a Lambda 950 UV spectrophotometer (PerkinElmer, USA) and a FluoroMax-4 spectrophotometer (Horiba Jobin Yvon, France) with laser excitation at 365 or 975 nm (Changchun New Industries, China), respectively. The crystalline phase of the prepared material was tested by an Ultima III X-ray diffractometer (Rigaku, Japan). Fourier transmission infrared spectra of UCNP were tested using a Nicolet-5700 infrared spectrometer (Thermo Elemental, USA).
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9

Powder XRD Analysis of Crystallization

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Powder XRD patterns of samples were analyzed using a Rigaku Ultima III X-ray diffractometer (Texas, USA). Using CuKα radiation with a wavelength of λ = 1.54056 as the source, the crystallization behavior configuration was scanned from a phase angle of 2θ = 5°–60° with a step size of 0.02°.
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