Axis ultra system
The Axis Ultra system is a high-performance X-ray photoelectron spectroscopy (XPS) instrument. It is designed to provide precise analysis of the chemical composition and electronic structure of solid surfaces and thin films. The system features advanced capabilities for depth profiling, imaging, and quantitative analysis.
Lab products found in correlation
7 protocols using axis ultra system
XPS Analysis of Collagen-based Films
Characterization of CuInS2 Nanostructures
Surface Characterization of PEEK and PEPA
Surface wettability of the intact PEEK and PEPA was determined via static water contact angle measurements using the sessile drop method with a goniometer (Krüss DSA100, Germany). A volume of 3 μl ultra-pure water was placed on the surface of the samples using a motor driven syringe at room temperature. The mean value was calculated using four measurements.
The surface topography of PEEK samples was detected by atomic force microscopy (AFM; Dimension icon, Bruker, USA) in the tapping mode at room temperature. An area of 20 μm × 20 μm was imaged, and the roughness was calculated using the software NanoScope Analysis.
X-ray Photoelectron Spectroscopy Protocol
a Kratos Axis Ultra system using monochromatized Al Kα radiation at hν = 1486.6 eV. The binding
energy scale was calibrated to the Fermi edge and the C 1s peak at
284.8 eV.
XPS Analysis of Surface Composition
Comprehensive Material Characterization Protocol
Characterization of Composite Foam Structure
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