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Fei nova nanosem 430

Manufactured by Thermo Fisher Scientific
Sourced in United States

The FEI NOVA NanoSEM 430 is a high-resolution scanning electron microscope (SEM) designed for advanced imaging and analysis of nanoscale materials and structures. It features a field emission electron source, high-resolution optics, and advanced detectors to enable detailed characterization of a wide range of samples.

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6 protocols using fei nova nanosem 430

1

Titanium Surface Evaluation for Cell Attachment

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Titanium sheets were observed under scanning electron microscopy (FEI NOVA NanoSEM 430, FEI Company, Hillsboro, OR, USA) to identify cell attachments on their surface. For SEM analysis, one sample from each group was placed on a sterile 24-well plate and sterilized using ethanol 70% for 30 min. A quantity of 2 × 104 cells/well were cultivated on each titanium sheet at 37 °C in a 5% CO2 for 3 days.
The pre-osteoblasts that adhered to the samples were fixed in a solution of 3% glutaraldehyde (50 wt.% in H2O, CAS#111-30-8, Sigma-Aldrich, San Luis, MO, USA), 0.1 mol/L sodium cacodylate (CAS#6131-99-3, Sigma-Aldrich) and 0.1 mol/L sucrose (CAS#57-50-1, Sigma-Aldrich, San Luis, MO, USA) for 45 min. Samples were immersed for 10 min in a buffer solution of 0.1 mol/L sodium cacodylate (CAS#6131-99-3, Sigma-Aldrich, San Luis, MO, USA) and 0.1 mol/L sucrose (CAS#57-50-1, Sigma-Aldrich, San Luis, MO, USA). Samples were then processed in serial ethanol dehydrations for 10 min each (30, 50, 70 and 100%) and dehydrated in hexamethyldisilazane (HDMS, CAS# 999-97-3, Sigma-Aldrich, San Luis, MO, USA).
Titanium sheets were sputter-coated with a palladium–gold alloy (Polaron SC 7620 Sputter Coater, Quorum Technologies, Laughton, East Sussex, UK) with a thickness of 10 nm. The SEM was operated at 10 kV, spot 3.5 and images were made in 100×, 2000× and 10,000×.
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2

Surface Topography Analysis via SEM

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After the 30-day experiment, one sample of each specimen from each treatment group and one reference sample of each material were assessed under scanning electron microscopy (FEI NOVA NanoSEM 430, FEI Company, Hillsboro, OR, USA) to qualitatively evaluate surface topographical changes. Samples were sputter-coated with carbon to reduce charging effects during SEM analysis (10–15 mA, under a vacuum of 130 mTorr). The SEM was operated at 10 kV, spot 3.5.
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3

Mechanical Characterization of HA-Tyr Hydrogels

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The micro-architecture and mechanical properties of HA-Tyr gels in varying mechanical strength were examined by monitoring with scanning electron microscopy (SEM) as well as testing with the micro-mechanical tester. Gels were processed for SEM with freeze-dryer to remove the water, then sputtered with gold at 20 mA for 45 s, and examined under SEM (FEI 430 Nova NanoSEM, USA). In addition, compression test was performed on cylindrical hydrogels with 8-mm diameter and 5-mm heigth to determine the mechanical strength of 1, 3 and 6% HA-Tyr hydrogels. The analysis was performed at 2-mm/min loading rate and under a load of 5 N (Cellscale, Canada). Young’s moduli were calculated based on the stress/strain curves. All the measurements were performed in duplicate.
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4

Hybrid Hydrogel Microstructure Analysis

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The microstructures
of hybrid gel components, namely, HA-Tyr and G-Tyr as well as optimized
hybrid hydrogel HA-Tyr/G-Tyr (1–10% wt), at three different
volumetric ratios (2:1, 1:1, 1:2 v/v) were investigated via scanning
electron microscopy (SEM, FEI 430 Nova NanoSEM, USA). The samples
after freeze-drying were sputter-coated with gold (Quorom SC7640 High
Resolution Sputter Coater, Lewes, UK), and the images were acquired
at 10–15 kV.
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5

Fabrication of Nanoporous Gold Thin Films

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Np-Au thin films were fabricated as previously described [47 (link)]. Briefly, a stencil mask was used to pattern np-Au and pl-Au thin films on piranha-cleaned glass coverslips (Figure 1a). For np-Au, Au0.36Ag0.64 (atomic %) alloy was deposited on top of Cr adhesion layer (160 nm-thick) and Au seed layer (80 nm-thick) via sputter-deposition. In order to fabricate different thicknesses of np-Au thin films, the sputter-deposition time of the alloy was varied (10 min for 500 nm-nominal thickness for np-Au, 5 min for 250 nm nominal thickness for t-np-Au). The alloy-coated coverslips were then dealloyed in nitric acid (70%) at 55 °C for 15 min to produce the as dealloyed np-Au film. To obtain the coarser morphology (A-np-Au), a subset of the np-Au thin films were thermally treated on a hotplate at 250 °C for 40 s. Planar gold (pl-Au) films were fabricated by sputtering only Au (10 min) over the Cr adhesion layer with no dealloying step. Scanning electron microscopy (SEM) was used to obtain high-resolution images of top and side views of each np-Au thin film type at 100,000× magnification (FEI Nova Nano-SEM430, Phenom World, Hillsboro, OR, USA). ImageJ was used to analyze each film’s thickness and surface pore coverage using previously described methods [47 (link)].
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6

Nanoporous Gold Electrode Characterization

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High-magnification images of the np-Au samples were captured via scanning electron microscope (SEM) (FEI Nova Nano-SEM430, Phenom World, Hillsboro, OR, USA) at 100 k× magnification to investigate np-Au electrode morphologies via top-view images and thickness via cross-sectional images. The average pore sizes for all samples were analyzed using ImageJ software as described previously (National Institutes of Health (NIH) shareware) [17 (link)]. The effective electrochemical surface area of different electrode morphologies in the macro-scale setup was obtained by performing cyclic voltammetry (CV) measurements in 0.5 M H2SO4 at a scan rate of 50 mV/s over the potential range of 0–1.8 V [31 (link),32 (link)].
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