A high-resolution field-emission scanning electron microscope (Zeiss 1550, Carl Zeiss AG, Oberkochen, Germany) was used for inspection and imaging. The instrument was operated with 3–7 kV of accelerated voltage with a secondary electron detector. Unless otherwise stated, no gold coating was prepared on SEM specimens. Surface roughness was measured with a Dimension 3100 Scanning Probe Microscope (Veeco, NY, USA) atomic force microscope (AFM).
Dimension 3100 scanning probe microscope
Manufactured by Veeco
Sourced in United States
The Dimension 3100 Scanning Probe Microscope is a lab equipment designed for high-resolution imaging and analysis of surfaces at the nanoscale level. It utilizes a scanning probe technique to capture detailed topographical and material property data of samples.
Automatically generated - may contain errors
Lab products found in correlation
9 protocols using dimension 3100 scanning probe microscope
1
High-Resolution Scanning Electron Microscopy
2
Voltage-Synchronized AFM Fiber Measurement
Check if the same lab product or an alternative is used in the 5 most similar protocols
+ Expand
HVAFM measurements is performed with a Dimension 3100 Scanning Probe Microscope in contact mode with Nanoscope V control station (Veeco). The AFM tip contacts on the fibre surface at a frequency of 1 Hz, with the slow-axis scan disabled. The fibre is connected to an external DC power source (Stanford Research PS350). There is an additional connection between DC power source and AFM to record synchronized data of voltage and deflection.
3
Au Nanostructures on Mechanically Exfoliated MoS2
Check if the same lab product or an alternative is used in the 5 most similar protocols
+ Expand
Au was deposited on the mechanically exfoliated MoS2 layers by thermal evaporation, at a base pressure of 1.5 × 10−6 mBar at a deposition rate of 0.02 Å per second. AFM imaging and SEM images confirmed the formation of Au nanostructures. The AFM and SEM images were used to estimate the height and size of the Au nanostructures resulting from 2.0 nm and 1.0 nm deposition. AFM images were taken on a Dimension 3100 scanning probe microscope (Veeco Instruments Inc) using tapping mode. The SEM images of Au-MoS2 hybrid system was taken by Zeiss Ultra-55 SEM using Inlens detector with an accelerating voltage ~5 kV. XPS was carried out on Physical Electronics 5400 ESCA system utilizing a monochromatized Al Kα X-ray source.
4
AFM Topography Analysis of Samples
Check if the same lab product or an alternative is used in the 5 most similar protocols
+ Expand
For these, 3 × 3 µm2 AFM topography was acquired in tapping mode by using a Dimension 3100 Scanning Probe Microscope equipped with a Nanoscope IVa controller (Veeco Instruments, Plainview, NY, USA). Statistical analysis of AFM micrographs was performed by using the NanoScope 8.15 Software (Veeco instruments).
5
Atomic Force Microscopy of Surfaces
Check if the same lab product or an alternative is used in the 5 most similar protocols
+ Expand
Tapping-mode atomic force microscopy was performed utilising a Dimension 3100 Scanning Probe Microscope (Veeco Instruments) and PPP-NCLR silicon cantilever probes (Nanosensors, Neuchatel, Switzerland). The images collected were 10 × 10 μm in each dimension (1024 × 1024 pixels) in height trace mode (scan rate was constant at 0.80 Hz). Acquisition of the image was followed by processing using the NanoScope 6.13rl software to remove surface tilt and scanner bow (by application of a 3rd order polynomial planefit).
6
Cryogenic Magnetic Force Microscopy
Check if the same lab product or an alternative is used in the 5 most similar protocols
+ Expand
Room temperature MFM experiments were carried out using a Veeco Dimension 3100 Scanning Probe Microscope. The MFM tips used (Nanosensors SSS-MFMR) were ≈30 nm in diameter, with low coercivity (≈12 mT) and ultralow magnetic moment (≈80 emu/cc). Samples were initially saturated in the out of plane (OP) direction using fields up to H = −0.5 T. The measurements were performed in OP fields starting from H = 0 and incrementally approaching H = +HS, with a typical tip height of 20 nm. The field evolution of the spin textures is presented in Section 1 of the Supplementary Information . Low T (5–200 K) MFM imaging is carried out using a cryogenic frequency-modulated MFM system9 (link). We used two commercial probes by Team Nanotec, model ML3 (35–40 nm Co alloy coating), with f0 ≈ 75 kHz and k0 ≈ 1 N/m. The sample was first stabilized at a given temperature and then magnetized in the OP direction by applying H > HS. After saturation, MFM images were acquired at various field values as H was swept from −HS to +HS. The details of the MFM image analysis are reported in our earlier reports5 (link),9 (link),30 (link).
7
Visualizing Fresh and Recovered NCs
Check if the same lab product or an alternative is used in the 5 most similar protocols
+ Expand
Fresh and recovered NCs were visualized using Dimension 3,100 Scanning Probe Microscope (Veeco Instruments, Santa Barbara, CA, USA), equipped with NanoScope III controller as described elsewhere.16 (link) Topographical images were plane-flattened and analyzed by the computer software Nanoscope Software version 7.3 or SPIP version 3.3.6.
8
AFM Thickness Characterization of Enzyme-Silica Films
Check if the same lab product or an alternative is used in the 5 most similar protocols
+ Expand
AFM measurements of the thicknesses of enzyme-silica films on silicon wafer substrates were conducted with a Veeco Dimension 3100 Scanning Probe Microscope (Veeco, Plainview, NY, USA) using a 10 nm radius general purpose probe (n-Silicon Pointprobe, Nanosensors, Inc., Neuchatel, Switzerland). The thickness of a given film was obtained by reference to a region of the substrate from which the film was removed (by scraping with a razor blade) prior to conducting the thickness measurements. Samples were placed on the AFM stage and tapping-mode measurements were executed over a 5 mm  5 mm area that spanned the boundary between coated and uncoated (film removed) regions. The Nanoscope Analysis v1.20 program was used for data analysis. The film-free surface of each scan was plane-leveled and a Bearing Analysis was performed on the entire sample area. For each type of sample, a total of twenty-six measurements were obtained by analyzing two to three different locations on three independently-prepared sister samples.
9
Vancomycin Surface Characterization by AFM
Check if the same lab product or an alternative is used in the 5 most similar protocols
+ Expand
The wells with immobilized vancomycin were washed with PBS (3 × 300 μL), and incubated with 50 μL HRP (0.2 mg L -1 ) for 2 h at room temperature. The solution was removed and the wells were washed with PBS (3 × 300 μL). The flat bottomsurface of a well was cut out and fixed onto a glass slide. A Veeco Dimension 3100 Scanning Probe Microscope (Veeco Instruments Inc. USA), operating NanoScope 6.12 Software was used for AFM imaging, performed at RT. Tapping mode was selected, using a Tap300 antimony-doped silicon probe tip (Bruker, UK) with a scan size of 2.0 × 2.0 μm and scan rate of 0.2 Hz. The total number of sample lines was fixed at 256, and the amplitude set point was 0.8 V, whilst the integral and proportional gain was optimized at 0.04 and 0.06 respectively.
About PubCompare
Our mission is to provide scientists with the largest repository of trustworthy protocols and intelligent analytical tools, thereby offering them extensive information to design robust protocols aimed at minimizing the risk of failures.
We believe that the most crucial aspect is to grant scientists access to a wide range of reliable sources and new useful tools that surpass human capabilities.
However, we trust in allowing scientists to determine how to construct their own protocols based on this information, as they are the experts in their field.
Ready to get started?
Sign up for free.
Registration takes 20 seconds.
Available from any computer
No download required
Revolutionizing how scientists
search and build protocols!