The photopolymer (IP-L780) and the developer (PGMEA) used for the fabrication of the 3D structures were purchased from Nanoscribe GmbH. IP-L780 is a biocompatible photopolymer designed for LDW via TPP using the Nanoscribe technology. It contains 2-(Hydroxymethyl)-2-[[(1-oxoallyl)oxy]methyl]-1,3-propanediyl diacrylate (>95%) and 7-(Diethylamino)-3-(2-thienylcarbonyl) -2H-1-benzopyran 2-one (<5%). IP-L780 can be easily handled by drop casting (that is as a precursor step for LDW via TPP processing), it has a refractive index at 780 nm (unexposed) of 1.48 and enables to obtain high resolution and mechanical stability for structures in the micro and sub-micron range [13 (link)]. Collagen (Col, C9301), Chitosan (CT, 9012-76-4) and acetic acid (45754) used for the functionalization of the 3D structures were purchased from Sigma Aldrich, St. Louis, MO, USA.
Ip l 780
Manufactured by Nanoscribe
The IP-L 780 is a photoresist material designed for use with Nanoscribe's 3D printing technology. It is a high-resolution, negative-tone photoresist that is sensitive to 780 nm wavelength laser light. The IP-L 780 is intended for use in the company's 3D printing systems, enabling the fabrication of complex, high-resolution structures at the micro- and nanoscale.
Automatically generated - may contain errors
Lab products found in correlation
Photonic professional, by Nanoscribe (1 mentions)
Microfluidic control system mfcs, by Fluigent (1 mentions)
Photonic professional gt, by Nanoscribe (1 mentions)
Solidworks, by Dassault Systèmes (1 mentions)
Isopropyl alcohol, by Merck Group (1 mentions)
Immersol 518f, by Zeiss (1 mentions)
Photonic professional gt system, by Nanoscribe (1 mentions)
Propylene glycol monomethyl ether acetate, by Merck Group (1 mentions)
Photonic professional gt2, by Nanoscribe (1 mentions)
Trypsin edta, by Thermo Fisher Scientific (1 mentions)
Sylgard 184 elastomer, by Dow (1 mentions)
Bovine serum albumin (bsa), by Merck Group (1 mentions)
Ingenuity pathway analysis (ipa), by Merck Group (1 mentions)
Ab92547, by R&D Systems (1 mentions)
Alexafluor 647, by R&D Systems (1 mentions)
6 protocols using ip l 780
1
3D Micro-Nano Structures Fabrication
2
3D Printing via Direct-Laser Writing
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The direct-laser writing (DLW) 3D printing nanofabrication technology used in this study is based on two-photon polymerization (2PP) technique that is implemented by using a commercial instrument system (Photonic Professional, Nanoscribe GmbH), and by a homemade magnetron-sputtering technique. In fabrication, a 780 nm femtosecond laser beam (with pulse width 120 fs and repetition rate 80 MHz) is focused into a negative photoresist (IP-L-780, Nanoscribe GmbH) by a high numerical aperture (NA) oil-immersion objective (63×, NA = 1.4, Zeiss). Detailed operation steps can refer to supplementary information Sec. S1 .
3
Fabrication of 3D Microfluidic Coil Spring Diode
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For fabrication of both the barrier wall structures and the 3D microfluidic coil spring diode, 3D models of the designs were created using SolidWorks (Dassault Systemes) and then imported into DeScribe (Nanoscribe) for writing-path code generation. The negative-tone photoresist, IP-L 780 (Nanoscribe), was vacuum-loaded into the sol-gel-coated PDMS-on-glass microchannels (Fig. 1f ). The Nanoscribe Photonic Professional GT (Nanoscribe) was used with a 63× objective lens in oil-immersion mode to print the structures inside of the microchannels (Fig. 1g ). Briefly, this printing strategy involves placing a droplet of immersion oil between the objective lens and the bottom of the glass substrate to maintain the focal path of the laser. All microstructures were printed in a “ceiling-to-floor”, point-by-point, layer-by-layer process. Following isDLW completion, the microfluidic devices were placed in a bath of PGMEA for approximately 4 hours. Therafter, the Fluigent Microfluidic Control System (MFCS) (Fluigent, France) was used to perfuse PGMEA through the channels for 5 minutes, and then IPA for 1 minute at pressures of <10 kPa.
4
Fabrication of High-Resolution Topographical Features
5
FlatScope Construction Protocol
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FlatScope prototypes were constructed using an off-the-shelf board level camera (Imaging Source, DMM 37UX178-ML) with a monochrome Sony CMOS imaging sensor (IMX178LLJ, 6.3 MP, 2.4 μm pixels).
The phase mask was fabricated using a 3-D photolithographic system (Nanoscribe, Photonic Professional GT2) using a photoresist (Nanoscribe, IP-L 780) on a 700 μm SiO2 substrate. The substrate was then cut down to more closely match the sensor size of the camera (and filters). The substrate was masked with an opaque material to provide an aperture containing only the phase elements. The substrate with phase mask was affixed atop the imaging sensor, followed by a hybrid filter, similar to Richard et al. 40 , but using a commercially available absorptive filter (Kodak, Wratten #12) placed below an interference filter (Chroma, ET525/50m), both cut to the sensor size requirements (see Fig. 1d). A housing was 3D printed (MJP 2500) to hold the phase mask and filters atop the imaging sensor.
The phase mask was fabricated using a 3-D photolithographic system (Nanoscribe, Photonic Professional GT2) using a photoresist (Nanoscribe, IP-L 780) on a 700 μm SiO2 substrate. The substrate was then cut down to more closely match the sensor size of the camera (and filters). The substrate was masked with an opaque material to provide an aperture containing only the phase elements. The substrate with phase mask was affixed atop the imaging sensor, followed by a hybrid filter, similar to Richard et al. 40 , but using a commercially available absorptive filter (Kodak, Wratten #12) placed below an interference filter (Chroma, ET525/50m), both cut to the sensor size requirements (see Fig. 1d). A housing was 3D printed (MJP 2500) to hold the phase mask and filters atop the imaging sensor.
6
Photocrosslinkable Resin for 3D Microstructures
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Photocrosslinkable resin IP-L 780 (Nanoscribe GmbH) was used for producing master 3D microstructures by 2PP. The structures were developed using propylene glycol monomethyl ether acetate (PGMEA, RER600, Arch Chemicals) and rinsed using isopropyl alcohol (IPA, Sigma-Aldrich). Polydimethylsiloxane (PDMS, Sylgard 184 elastomer, Dow Corning) and fluoroctatrichlorosilane (FOTS, Sigma-Aldrich) were used for microlithography procedure to finally emboss PLA films (Corbion Purac®, Corbion), providing them with microstructures. Components for cell culture such as Minimum Essential Medium α (α-MEM), fetal bovine serum (FBS), penicillin-streptomycin (Pen/Strep), L-glutamine (L-glu) and trypsin in ethylenediaminetetraacetic acid (trypsin-EDTA) were from Gibco, Life Technologies. Bovine serum albumin (BSA) was from Sigma-Aldrich. For fluorescence microscopy, the following probes were used: fluorescein isothiocyanate (FITC) conjugated antibody for vinculin (F7053, Sigma-Aldrich), antivimentin (ab92547) primary antibody and anti-rabbit Alexa Fluor® 647 as secondary antibody (from R&D Systems), CF™594 phalloidin (Biotium) for cytoskeleton, 4′,6-Diamidino-2-phenylindole dihydrochloride for nuclei (DAPI, Sigma-Aldrich).
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