The structures were printed using the Nanoscribe Photonic Professional GT+ system (Nanoscribe, Karlsruhe, Germany). This system makes use of the 2PP fabrication technique to reach a lateral resolution < 200 nm and an axial resolution < 700 nm [28 (link)]. The system employs a 780 nm Ti-Sapphire laser with a 150 fs pulse durations at 80 MHz repetition rate [26 (link)], and can print either by scanning the laser over the field of view (FOV) of the objective lens with galvo mirrors or by moving the sample using a piezoelectric stage. The structures were printed on a 30 mm Ø borosilicate glass coverslips using the IP-L 780 polyacrylate photoresist (Nanoscribe, Karlsruhe, Germany) and a Plan-APOCHROMAT 63×/1.40 Oil DIC objective (Carl Zeiss, Oberkochen, Germany). In order to avoid stitching errors, the microstructures were arranged in microarrays corresponding to a square with a side length below 140 µm, or a hexagon with a side length below 100 µm. The sizes were selected so that the microarrays could be inscribed in the maximum effective writing field for this microscope objective, which is a circle with a diameter of 200 µm. Several microarrays were printed on the same substrate. Individual micro arrays were printed using the galvo mirrors to scan the laser beam, after which the stage was displaced to a new area on the substrate using the piezoelectric motors.
Photonic professional gt system
Manufactured by Nanoscribe
Sourced in Germany
The Photonic Professional GT system is a high-resolution 3D printing system developed by Nanoscribe. It utilizes two-photon polymerization technology to create complex micro- and nanostructures with high precision and resolution. The system is designed for research and development applications that require accurate and customizable fabrication of microscale and nanoscale features.
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Lab products found in correlation
Plan apochromat 63 1.40 oil dic objective, by Zeiss (1 mentions)
Jsm 7800f, by JEOL (1 mentions)
Q150r s coater, by Quorum Technologies (1 mentions)
Su 8 developer, by MicroChem (1 mentions)
Su 8 50, by MicroChem (1 mentions)
Ip dip, by Nanoscribe (1 mentions)
Fg200lea, by Thorlabs (1 mentions)
Describe software, by Nanoscribe (1 mentions)
Autosamdri 931, by Tousimis (1 mentions)
Isopropyl alcohol, by Merck Group (1 mentions)
Immersol 518f, by Zeiss (1 mentions)
Propylene glycol monomethyl ether acetate, by Merck Group (1 mentions)
Ip l 780, by Nanoscribe (1 mentions)
12 protocols using photonic professional gt system
1
Nanoscale 3D Printing of Microstructures
2
Fabrication of Micro-Structures via Laser-Induced Two-Photon Polymerization
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For laser two-photon polymerisation, a droplet of a hybrid material was placed on a glass slide and then left in a fume hood to evaporate overnight while covered from ambient light. After 24 h such samples were used for structure fabrication on a commercially available Nanoscribe® Photonic Professional GT system (Nanoscribe GmbH, Eggenstein-Leopoldshafen, Germany) that is based at the Department of Chemistry at Lancaster University. A 63X 1.4 NA oil immersion lens was used to focus the laser beam into the polymer. Stereolithography (STL) flies were downloaded from the internet [28 ] and sliced using proprietary Nanoscribe software (DeScribe 2.3.3). Hatching and slicing distances in X, Y and Z coordinates were set to 100 nm. The laser scanning speed was set to 10 mm/s and the laser power was in the range of 20% to 100% (corresponding to 10–50 mW). After polymerization, the Al based hybrid material was developed in toluene for at least 15 min, followed by air-drying. The structures were then sputter-coated at a thickness of 10 nm using a Q150 RS coater (Quorum Technologies, Lewes, UK) and subsequently observed using a SEM (JSM 7800F, JEOL, Tokyo, Japan) operating at 10–15 kV at the Department of Chemistry at Lancaster University.
3
Microneedle Fabrication for Guinea Pig RWM
4
2D, 2.5D, and 3D Polymer Microstructures
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In this study, the TPP setup, named Photonic Professional (GT) system, was supplied by Nanoscribe company, Germany. GT system is designed to produce 2D, 2.5D, and 3D polymer structures with feature sizes ranging from sub-micron to millimeters using direct laser writing. The excitation parameters of the system are as follows: the central laser wavelength is 780 nm, the repetition frequency is 80 MHz, and the pulse width is 100 fs. The structures printed in this paper are mainly used in the DILL configuration of the GT system, in which the objective lens will be directly immersed into the photoresist. And since the DILL configuration is a reverse manufacturing process, the photoresist acts as both a photosensitive and immersion medium. Therefore, the maximum height of the structure is not limited, and structures with a height of less than 2 mm can be manufactured. Fig. 1b is a schematic diagram of the fabrication of microstructures using GT. In the fabrication process, the photoresist is dropped on the substrate, and the laser intensity is controlled by an attenuator. The focus of the laser is on the XY plane by Galvo for high-speed two-dimensional scanning, and the Z-axis direction is controlled by the movement of the piezo stage. Through the above preparation process, the three-dimensional micro–nano device shown in Fig. 1c can be obtained as an example.
5
3D Micro-Rocket Fabrication via Direct Laser Writing
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The 3D micro-rocket was printed based on the direct laser writing technique by the Photonic Professional GT system (Nanoscribe GmbH). With a spin-coated 50-μm-thick photoresist (SU-8 50, MicroChem Corp.) on transparent glass and utilization of the pre-bake and soft-bake processes, a 780-nm laser was focused in the photoresist, and the structure was printed with 0.4-μm slicing and 0.4-μm filling. After the microprinting and post-bake processes, the sample was developed in an SU-8 developer (MicroChem Corp.) and rinsed with isopropyl alcohol. After air drying, hundreds of micro-rockets were obtained from the substrate. To realize near-infrared light actuation, a 100-nm-thick gold layer was coated on the micro-rocket surface.
6
Optical Fiber Plasmonic Sensing Protocol
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To investigate PTEP induced via POFs, three different optical fibers were prepared—bare fiber (BF), gold-coated fiber (GCF), and plasmonic fiber (PF), based on silica multi-mode optical fibers ( core/cladding diameter, 0.22 NA, FG200LEA, Thorlabs, Inc., Germany). All fibers were cut to 96 mm long using an automatic optical fiber cleaver (CT-101, Fujikura Ltd., Japan). Gold thin film (50 nm) deposition for the GCF was carried out by sputtering (HEX thin film deposition system, Korvus Technology, United Kingdom). The PF [Fig. 1(a) ] was fabricated by creating polymeric microstructure arrays using two-photon polymerization, followed by 50 nm gold thin film sputtering. Cross spike arrays [Fig. 1(b) ], which were successfully validated to support effective plasmon excitation in previous works,19 (link),26 (link) were fabricated using the Photonic Professional GT system (Nanoscribe GmbH., Germany) and photoresist (IP-Dip, Nanoscribe GmbH., Germany).
7
Nanoscale Photonic Patterning of Fused Silica
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A drop of IP-Dip photoresist was placed on a fused silica substrate and patterned by a Nanoscribe GmbH Photonic Professional GT system. The writing mode was set to GalvoScanMode, and the laser’s power was set to 20 mW. The nanopillars of the pixels were written in PulsedMode, while the towers and microlenses were written in ContinuousMode. After patterning, the substrate was immersed in propylene glycol monomethyl ether acetate solution for 11 min, then in isopropyl alcohol solution for 2 min with UV curing, and then in nonafluorobutyl methyl ether solution for 5 min. Lastly, the substrate was dried in air.
8
Microneedle Design and Fabrication
9
Photolithography-Enabled Bacterial Motion Analysis
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The pillars consist of a photopolymer resist (IP-Dip) and are 3D-printed on a glass slide by direct laser lithography42 (link), Photonic Professional GT system, Nanoscribe GmbH. Being 150-μm tall and 14-μm wide, the pillars are arranged in square lattices of the period a ranging from 50 μm to 130 μm with 10 μm increment (Fig. 1a ). The central part of the experimental cell is left pillar-free so that parameters of the unconstrained bacterial motion can be monitored simultaneously. In addition, we made honeycomb lattices with lattice constants a = 40 μm and a = 45 μm.
10
Fabrication of Intertwined Polymeric Structures
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We first fabricated polymeric intertwined and monolithic structures out of IP-Dip photoresist using two-photon lithography via a commercially available Photonic Professional GT system (Nanoscribe GmbH). All structures were additively manufactured on a silanized Si substrate with laser power and scan speed set at 15 mW and 10 mm s−1, respectively. Structures originating from the same batch were printed on the same Si substrate within one printing run. An equal hatching (dh) and slicing (ds) distance of 0.1 μm was prescribed for each intertwined rhombus structure and monolithic structure (pillar and plate). The base and top cap of each monolithic pillar was printed using dh = ds = 0.1 μm, while the base and top cap for each intertwined structure had dh = ds = 0.2 μm. IP-Dip plates of dimensions 3.5 μm by 3.5 μm by 0.3 μm (L by W by H) were fabricated with dh = ds = 0.1 μm for XPS analysis. All samples were developed in propylene glycol monomethyl ether acetate for ~20 min and subsequently dried via critical point drying in Autosamdri 931 (Tousimis). To fabricate passivated structures, select polymer structures were conformally coated with 5-nm-thickness Al2O3 using a plasma-enhanced ALD process inside a FlexAL II system (Oxford Instruments). The chamber was held at 200°C, and trimethylaluminum and O2 were used as precursors, resulting in a growth rate of 1.2 Å/cycle.
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