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Quantax 75

Manufactured by Bruker
Sourced in United States

The Quantax 75 is an energy-dispersive X-ray (EDX) microanalysis system designed for elemental analysis and mapping in scanning electron microscopes (SEMs). It features a high-performance silicon drift detector (SDD) for efficient X-ray detection and analysis.

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3 protocols using quantax 75

1

SEM-EDS Analysis of Material Surfaces

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SEM/EDS analyses were performed on four specimens for each group using a tabletop scanning electron microscope (TM4000Plus, Hitachi, Schaumburg, IL, USA) equipped with an EDS probe (Quantax 75 with XFlash 630H Detector, Bruker Nano GmbH, Berlin, Germany). Dry specimens were mounted on stubs using conductive tape and were analyzed without sputter-coating, using a backscattered electron (BE) detector and an accelerating voltage of 15 kV in a surface-charge reduction mode. This method was used to display the surface morphology of the specimens and, in particular, the distribution of filler particles, their shape, and dimensions.
Three randomly selected fields were acquired for each specimen (500×, 2000×, 5000×) for morphological observation of the surface and with the EDS probe (300 μm × 300 μm fields) in full-frame mode at 150 s acquisition time. The data acquired by EDS were averaged for each specimen and element, the wt% in the ≈1 µm superficial layer was displayed. These data were statistically analyzed to assess significant differences in surface chemical composition among the tested materials. Elemental distribution at the surface level was visually obtained in map mode (5000×) using an acquisition time of 600 s.
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2

Characterization of Nanoparticle Morphology

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TEM images were gained with a transmission electron microscope LEO 912AB OMEGA, Zeiss (Oberkochen, Germany) at an acceleration voltage of 100 kV. Particle size distribution histogram was obtained from electron micrographs. It was calculated by measuring the size of 200 displayed particles using the SigmaScan Pro software. The distribution was approximated with Gaussian function using SigmaPlot (11 version) (Systat Software Inc., Richmond, CA, USA). Scanning electron microscopy images for samples placed on a 25 mm aluminum table and secured with a conductive carbon tape were obtained in the secondary electron mode at an accelerating voltage of 15 kV and medium vacuum mode on a Hitachi TM4000Plus desktop electron microscope equipped with an energy dispersive X-ray spectrometer (QUANTAX 75, Bruker, Billerica, MA, USA).
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3

Scanning Electron Microscopy Analysis of Material Surfaces

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A total of four disks for each material underwent SEM/EDS analyses using a tabletop scanning electron microscope (TM4000Plus, Hitachi, Schaumburg, IL, USA) equipped with an EDS probe (Quantax 75 with XFlash 630H Detector, Bruker Nano GmbH, Berlin, Germany). Dry specimens were mounted on stubs using conductive tape and analyzed without sputter-coating, using the secondary electron (SE) and backscattered electron (BE) detector at an accelerating voltage of 15 kV in a surface-charge reduction mode. The surface morphology of the tested materials were thus analyzed, with greater attention on filler particle distribution, shape, and dimensions. In particular, the BE mode that was sensitive to an element’s atomic number enabled differentiation between fillers of different compositions, making elements with higher atomic numbers appear whiter. Three randomly selected micrographs were obtained for each disk (500×, 2000×, and 5000×) for morphological observation of the surface and with the EDS probe (300 × 300 μm fields) in full-frame mode at 150 s acquisition time. The data acquired by EDS were averaged for each specimen and element, representing the wt.% distribution in a ≈1 μm superficial layer (See Ionescu et al., 2022, Figure 6 [27 (link)]). Elemental distribution at the surface level was visually displayed using the map mode (5000×), with an acquisition time of 600 s.
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