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Icp optima 2000dv

Manufactured by PerkinElmer
Sourced in United States

The ICP Optima 2000DV is an inductively coupled plasma (ICP) optical emission spectrometer (OES) designed for elemental analysis. The instrument utilizes a dual-view configuration that allows for the simultaneous measurement of both axial and radial plasma views. This feature enhances the instrument's ability to detect a wide range of analyte concentrations, from trace to major levels.

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4 protocols using icp optima 2000dv

1

Comprehensive Materials Characterization Methods

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X-ray diffraction (XRD) was carried out on a Bruker Powder D8 Advance diffractometer with CuKα radiation (λ = 1.5418 Å). Field-emission scanning electron microscope (SEM) images were tested on a JEOL JSM-7600F microscope operated at 5 kV. Transmission electron microscopy (TEM) images were performed using a JEOL JEM-1400 TEM microscope working at 100 kV. The samples for TEM measurements were dispersed in ethanol ultrasonically, dropped on copper grids, and then dried at 373 K. Nitrogen adsorption–desorption characterization was evaluated on Quantachrome Autosorb-iQ instruments at 77 K liquid nitrogen. The samples were degassed at 573 K under vacuum for 10 h before testing. Diffuse reflectance ultraviolet–visible (DRUV/vis) spectra were recorded on a Shimadzu UV-2450 spectrophotometer with BaSO4 as a reference. Fourier Transform Infrared (FTIR) spectra were measured on a Shimadzu IRPrestige-21 spectrometer based on KBr pellets. Elemental analysis of Si, Ti, Na, and K was measured on a Perkin Elmer ICP Optima 2000DV (Waltham, MA, USA) inductively coupled plasma optical emission spectrometer.
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2

Elemental Analysis via ICP-OES

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Inductively coupled plasma–optical emission spectroscopy (ICP-OES) was used to determine the elemental composition. The equipment used was a Perkin Elmer ICP Optima 2000DV, with a detection limit between 0.005 and 0.01 ppm, depending upon the element. The quantitative determination of elements was carried out using a calibration curve prepared from Merck’s certified multi-elemental standard solution. It was constructed with eight calibration points in the concentration range from 0 to 8000 ppm.
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3

Comprehensive Characterization of Nanomaterials

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Powder X-ray diffraction (PXRD) was carried out using a Bruker Powder D8 Advance diffractometer operated at 40 kV and 40 mA with CuKα radiation (λ = 1.5418 Angstrom). Diffuse reflectance ultraviolet-visible (DRUV/vis) spectra were measured on a Shimadzu UV-2450 spectrophotometer at 298 K with BaSO4 as a reference. IR spectra were measured on a Shimadzu IRPrestige-21 spectrometer as KBr pellets. Elemental analyses (Si and Ti) were measured on an inductively coupled plasma optical emission spectrometer (ICP-OES, Perkin Elmer ICP Optima 2000DV). Field-emission scanning electron microscope (SEM) images were recorded on a JEOL JSM-7600F microscope at 5 kV. Transmission electron microscopy (TEM) observations were performed using a JEOL JEM-1400 TEM microscope working at 100 kV. Particle sizes were measured on Malvern Zetasizer Nano ZS90 analyzer.
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4

Characterization of Copper Mine Tailings

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Paste tailing samples from the copper mine held by Compañía Minera Las Cenizas in Cabildo, Region of Valparaíso, Chile, with coordinates 32°28′16.1″ S, 71°05′00.2″ W, were used in the present study. This mining company processed copper sulfide and oxide minerals.
After sampling, the tailings were dried in a laboratory oven at 105 °C to achieve a constant mass; then, they were ground in a hammer mill, sieved through a mesh (ASTM No. 18), and homogenized. The pH was measured using the U.S. Environmental Protection Agency Method 9045D [41 ]. The content of the oxidized compounds was obtained from Servicio Nacional de Geología y Minería de Chile [3 ]. The elemental composition was measured with inductively coupled atomic emission spectroscopy (ICP-OES), Perkin Elmer ICP Optima 2000DV, with a detection limit between 0.005 and 0.01 ppm, depending upon the element. Table 1 presents the pH, granulometric characteristics, and composition of the tailings.
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