Icp optima 2000dv
The ICP Optima 2000DV is an inductively coupled plasma (ICP) optical emission spectrometer (OES) designed for elemental analysis. The instrument utilizes a dual-view configuration that allows for the simultaneous measurement of both axial and radial plasma views. This feature enhances the instrument's ability to detect a wide range of analyte concentrations, from trace to major levels.
4 protocols using icp optima 2000dv
Comprehensive Materials Characterization Methods
Elemental Analysis via ICP-OES
Comprehensive Characterization of Nanomaterials
Characterization of Copper Mine Tailings
After sampling, the tailings were dried in a laboratory oven at 105 °C to achieve a constant mass; then, they were ground in a hammer mill, sieved through a mesh (ASTM No. 18), and homogenized. The pH was measured using the U.S. Environmental Protection Agency Method 9045D [41 ]. The content of the oxidized compounds was obtained from Servicio Nacional de Geología y Minería de Chile [3 ]. The elemental composition was measured with inductively coupled atomic emission spectroscopy (ICP-OES), Perkin Elmer ICP Optima 2000DV, with a detection limit between 0.005 and 0.01 ppm, depending upon the element.
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