Hydrofluoric acid
Hydrofluoric acid is a highly corrosive and toxic chemical compound. It is used in various industrial and laboratory applications, such as etching and cleaning of glass, semiconductor manufacturing, and metal processing. Hydrofluoric acid has a unique ability to dissolve many materials, including silicon, glass, and certain metals.
Lab products found in correlation
14 protocols using hydrofluoric acid
Synthesis and Characterization of Nanoparticles
Comprehensive Silicon Wafer Characterization and Bacterial Culturing
Synthesis and Characterization of SiO2@PNiPAm Particles
further processing, unless stated otherwise. APTES, MPTMS, 4-MBA,
HAuCl4·3H2O, iodine, potassium iodine,
and anhydrous toluene (99.8%) were purchased from Sigma-Aldrich. Acetone
(99%), calcium chloride, ethanol (96%), isopropanol (IPA) (≥98%),
absolute ethanol (99.96%), and hydrofluoric acid (40%) were acquired
from VWR. Hydrogen peroxide (30%) and tri-sodium citrate dihydrate
were obtained from Merck. Sulfuric acid (95–97%) was supplied
by Supelco. The MilliQ water used was double deionized using a MilliQ
system with a resistivity of 18 MΩ. N-doped Si wafers (<100>,
resistivity 1–30 Ω cm) were obtained from Si Materials,
Germany. For the synthesis of SiO2@PNiPAm core–shell
particles used as a colloidal template, N,N′-methylenebis(acrylamide)
(99%), ammonium persulfate (98%), ethanol (99.9%), hexane (≥99%),
tetraethyl orthosilicate (98%), ammonium hydroxide solution (28–30%
NH3 basis), (3(trimethoxysilyl)propyl methacrylate) (98%),
fluorescein isothiocyanate isomer I (>90%), and (3-aminopropyl)triethoxysilane
(>98%) were purchased from Sigma-Aldrich and used as received. N-Isopropylacrylamide (97%) was obtained from Sigma-Aldrich
as well but purified before usage by recrystallization from hexane
(95%, Sigma-Aldrich).70 (link)
Fabrication of Hydrophobic Surfaces
Nanofabrication Protocol for Silicon Surfaces
used without further processing, unless noted otherwise. Iodine (99.8%)
and potassium iodide (99.99%) were purchased from Sigma-Aldrich. Acetone
(99%), ethanol (96%), isopropanol (IPA) (≥98%) and Hydrofluoric
acid (40%), hydrogen peroxide (30%) and nitric acid (65%) were acquired
from VWR. The water used was double deionized using a MilliQ system
with a resistivity of 18 MΩ. P-doped Silicon wafer (50.8 mm,
⟨100⟩, resistivity 1–30 Ω cm, thickness:
275 ± 25 μm) were purchased from Si-Mat, Germany. The TEM
grid used for shadow-masking was a 400 mesh Au lacey carbon grid.
Fabrication of Titanium Alloy Nanotubes
Optical Fiber-Based Nanodisc Assay
Synthesis of Conjugated Polymers
(anhydrous, 99.8%),
mEthanol (anhydrous, 99.8%), borane–tetrahydrofuran complex
solution 1 M in tetrahydrofuran (BH3OC4H8, 1 M in tetrahydrofuran), 1,4-diethynylbenzene (C8H6, 96%), 1-octene (C10H6, 96%),
silica-gel [(40–63) μm], magnesium sulfate (MgSO4, anhydrous, >99.0%), 2,5-dibromo-3-hexylthiophene (97%),
bis(triphenylphosphine)palladium(II) dichloride (Pd(PPh3)2Cl2, 98%), copper(I) iodide (CuI, >98.0%),
and triethylamine (TEA) (N(C2H5)3, 99.0%) were purchased from Sigma-Aldrich. Ethanol (C2H5OH, 99.5%), n-hexane (C7H16, 95%), mEthanol (CH3OH, 99.5%), and chloroform
(CHCl3, 99.7%) were purchased from Dae-Jung (South Korea),
and hydrofluoric acid [(48–51)%] was purchased from J.T. Baker.
Functionalized Nanoparticle Synthesis Protocol
Synthesis of Benzyne-Containing Polymers
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