Titanium discs (10 × 10 × 0.2 mm) were used for the in vitro study, whereas cylindrical implants (3.5 × 6 mm) with different surfaces were specially designed for the in vivo study. Pure titanium discs and implants (99.99%; Beijing Cuibolin Nonferrous Technology Development Co. Ltd., Beijing, China) were mechanically polished to produce smooth surfaces and used as the control (M group). The samples were disposed of as previously described [33 (link)]. Briefly, machined titanium was prepared via anodic oxidation at 50 V in ethylene glycol (0.5%/10% (w/v) ammonium fluoride/deionized water) for 15 min and then annealed at 500 °C for 2 h in air to obtain nanotubular surface (Nano group) with titanium dioxide nanotubes (TNTs). Subsequently, the experiments were annealed at 500 °C for 4 h (hydrogen, 0.95 × 105 Pa) to generate the hydrogenated TNTs (H-Nano group). A field-emission scanning electron microscope (S-4800 FESEM; Hitachi, Tokyo, Japan) was used to observe the surface morphology.
S 4800 fesem
Manufactured by Hitachi
Sourced in Japan, United States
The S-4800 FESEM is a field emission scanning electron microscope manufactured by Hitachi. It provides high-resolution imaging and analysis capabilities for a variety of materials and applications. The S-4800 FESEM utilizes a field emission gun to generate a stable and high-brightness electron beam, enabling the observation of fine details and structures at the nanoscale level.
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Lab products found in correlation
D max 2500 x ray diffractometer, by Rigaku (4 mentions)
Lsm 710 confocal microscope, by Zeiss (3 mentions)
Ppms vsm, by Quantum Design (2 mentions)
E 1010 ion sputter, by Hitachi (2 mentions)
Cpl 200 spectrometer, by Jasco (2 mentions)
208hr high resolution sputter coater, by Cressington (2 mentions)
Ir prestige 21, by Shimadzu (2 mentions)
Fluoromax 4 spectrofluorometer, by Horiba (2 mentions)
Tensor 27, by Bruker (2 mentions)
Axis ultra dld, by Shimadzu (2 mentions)
K alpha spectrometer, by Thermo Fisher Scientific (2 mentions)
Lsm 710, by Zeiss (2 mentions)
Glutaraldehyde, by Merck Group (1 mentions)
Fv1000, by Olympus (1 mentions)
Ulvac phi, by Physical Electronics (1 mentions)
Ntegra spectra system, by NT-MDT (1 mentions)
S 4800, by Hitachi (1 mentions)
Arl x tra, by Thermo Fisher Scientific (1 mentions)
H 7650 tem, by Hitachi (1 mentions)
Asap 2020m, by Micromeritics (1 mentions)
83 protocols using s 4800 fesem
1
Titanium Implant Surface Modifications
2
Visualizing Gardnerella vaginalis Biofilm Structure
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The structure of G. vaginalis biofilm treated by D‐Fe3S4 was examined by scanning electron microscope (SEM). First, G. vaginalis biofilms were resuspended in glutaraldehyde (2.5%, Sigma‐Aldrich) for 24 h at 4 °C under dark conditions. Bacterial cells were then washed and treated with ethanol gradient dehydration (30%, 50%, 70%, 90%, and 100% twice), before being dried using a critical point dryer and coated with platinum sputter. Finally, scanning electron microscope (SEM) images were obtained on a Hitachi S‐4800 FE‐SEM at a working voltage of 15.0 kV and a working current of 10 µA under magnification of 40 K. The 3D structure of biofilm was also characterized using confocal microscopy. Once the biofilm were grown, 1 µg mL‐1 PI and 5 × 10‐6m Syto9 staining solution were added to the surface of the biofilm and incubated for 20 min avoiding light. Next, the samples were washed twice with PBS before being analyzed using laser confocal microscope FV1000 (OLYMPUS FV1000).
3
Grain Endosperm Ultrastructure Analysis
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Mature grains from both treatment and control groups were put in the fixative (5 ml 38 % formalin, 5 ml glacial acetic acid, 90 ml 70 % ethyl alcohol) for a minimum of 12 h. Then the grains were dehydrated sequentially in 70 % ethanol solutions (20 min), 80 % ethanol solutions (20 min), 90 % ethanol solutions (overnight) and 100 % ethanol solutions (20 min). The samples were treated stepwise for 20 min in mixtures of ethanol and isoamyl acetate with ratios 3:1, 1:1 and 1:3 before soaking in isoamylacetate. Finally, critical point drying was done for SEM observation. Grain endosperm ultrastructures were observed by scanning electron microscope S-4800 FESEM (Hitachi, Japan).
4
Comprehensive Characterization of GDY
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The X-Ray photoelectron spectrometer (XPS, ULVAC-PHI) was carried out to investigate the bonding environment and chemical component. The structure characteristic of GDY was analyzed by using Raman spectra (NT-MDT NTEGRA Spectra System). Morphological information was measured using scanning electron microscope (Hitachi S-4800 FESEM). Magnetic moment measurements were recorded using a vibrating sample magnetometer (PPMS-VSM, Quantum Design) with temperature changing from 2 K to 300 K.
5
Elemental Composition Analysis of CdS and CdS/WOx
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For SEM analysis, powders of CdS and CdS/WOx were deposited onto separate adhesive carbon tabs and examined using a Hitachi S4800 FE-SEM, with the accelerating voltage set to 10 kV and an emission current of 10 µA. Within the analysis chamber of the FE-SEM instrument, the elemental composition of each sample was measured at 5,000-times magnification using an Oxford Instruments Silicon Drift X-Max energy-dispersive X-ray (EDX) detector with 50 mm2 active area; the spectrum was recorded at an accelerating voltage of 20 kV and an emission current of 10 µA, and was subsequently analysed using Oxford Instruments INCA EDX software.
6
Hydrogel Freeze-Drying for SEM Analysis
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All hydrogels were placed onto the sample stage using conductive adhesive. Then, the sample stage was placed in liquid nitrogen to achieve quick‐freeze. Finally, the samples were freeze‐dried and metal‐coated with Au for SEM (Hitachi‐S4800 FESEM).
7
Morphological Analysis of MnFe2O4-Ag NPs
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The morphology of the samples was analyzed using a field emission scanning electron microscopy (FESEM) of Hitachi S-4800. Powder samples were deposited on a Si wafer, dried and inserted in the instrument without further coating. The measurement was performed at energies between 5 and 10 keV. Energy-dispersive X-ray mapping of MnFe2O4–Ag NPs was obtained using the Hitachi S-4800 FESEM equipped with an energy-dispersive X-ray spectroscopy (EDXS) attachment.
8
Scanning Electron Microscopy Sample Preparation
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The cleaned silicon wafers were fixed on a SEM sample stage with conductive adhesive. Afterward, samples were dropped on the fixed silicon wafers and placed in a vacuum oven at 35 °C for 24 h. After drying, the samples were coated with Au, and then were imaged with Hitachi-S4800 FESEM.
9
Scanning Electron Microscopy of Conductive Paste
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The morphology of the printed conductive paste surfaces was characterized by scanning electron microscopy using a Hitachi s-4800 FE-SEM. The acceleration voltage was 5 kV, and the surfaces were coated with chromium before microscopy.
10
Comprehensive Characterization of Materials
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Morphological
analyses of samples were carried out on an H-7650 TEM (Hitachi, Japan)
and an SEMS-3000 N SEM (Hitachi, Japan). Field emission scanning electron
microscopy images were recorded on an S-4800 FE-SEM (Hitachi, Japan).
Powder XRD analyses were carried out using a Thermo ARL X’
TRA with Cu Kα radiation (l = 1.5406 Å).
FT-IR was performed with a Nicolet 7000 using KBr pellets. Shore A
hardness was tested on LX-A Shore hardness equipment for rubber (Jiangdu
Zhenwei test machine Co., Ltd, China). Thickness was tested on a WHT-10A
rubber/plastic instrument (Jiangdu test machine, China). Mechanical
testing was performed using a universal testing machine (Gotech Testing
Machines Co. Ltd). Tensile strength and elongation at break data were
collected referring to a GB/T528-1998 standard, tear strength values
were measured according to a GB/T529-1999 standard, and tensile shear
adhesive strength data were measured referring to a standard of GB/T7124-2008.
TGA and DTA data were recorded on a TG209C thermogravimetric analyzer
(Netzsch, Germany) from room temperature to 800 °C (10 °C/min,
N2 protection).
analyses of samples were carried out on an H-7650 TEM (Hitachi, Japan)
and an SEMS-3000 N SEM (Hitachi, Japan). Field emission scanning electron
microscopy images were recorded on an S-4800 FE-SEM (Hitachi, Japan).
Powder XRD analyses were carried out using a Thermo ARL X’
TRA with Cu Kα radiation (l = 1.5406 Å).
FT-IR was performed with a Nicolet 7000 using KBr pellets. Shore A
hardness was tested on LX-A Shore hardness equipment for rubber (Jiangdu
Zhenwei test machine Co., Ltd, China). Thickness was tested on a WHT-10A
rubber/plastic instrument (Jiangdu test machine, China). Mechanical
testing was performed using a universal testing machine (Gotech Testing
Machines Co. Ltd). Tensile strength and elongation at break data were
collected referring to a GB/T528-1998 standard, tear strength values
were measured according to a GB/T529-1999 standard, and tensile shear
adhesive strength data were measured referring to a standard of GB/T7124-2008.
TGA and DTA data were recorded on a TG209C thermogravimetric analyzer
(Netzsch, Germany) from room temperature to 800 °C (10 °C/min,
N2 protection).
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