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5500 scanning probe microscope

Manufactured by Agilent Technologies
Sourced in United States

The 5500 Scanning Probe Microscope is a high-resolution imaging instrument designed for surface analysis. It uses a sharp probe to scan the sample surface, providing detailed topographical information at the nanoscale level.

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10 protocols using 5500 scanning probe microscope

1

Visualizing Membrane Dynamics with Microscopy

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For the macroscopic observation, an epi-fluorescence microscope (IX51W, Olympus, Inc., Tokyo, Japan) equipped with 60× water immersion objective (N.A. 1.00) was used. The spatial resolution at a wavelength of 560 nm was approximately 350 nm based on the Rayleigh criterion. For SPT, an inverted fluorescence microscope (IX-71, Olympus, Inc.) equipped with 100× oil immersion objective (N.A. 1.45) was used. With the light excitation by 532 nm laser, the obtained diffusion of fluorescent probes in the bilayer was recorded by EM-CCD camera (iXon DU-897, Andor Technology, Ltd., Belfast, UK) at the frame rate of 30 frames/s (fps) or 500 fps. The effective pixel size of the SPT recording was 275.86 nm. We observed the surface structure of the PI+PC-SLBs by AFM (5500 Scanning Probe Microscope, Agilent Technologies, Inc., Santa Clara, CA, USA) with magnetic AC mode before and after addition of FBP-17. For AFM imaging, TYPE VI MAC Lever (Agilent Technologies, Inc.) with typical spring constant of 0.2 N/m was used. The epi-fluorescence microscope and AFM observations were performed at an ambient temperature of 23 °C.
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2

Comprehensive Nanomaterial Characterization Suite

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AFM images were produced using an Agilent 5500 scanning probe microscope. Raman and PL spectroscopy were conducted using Invia Raman Microscope (Renishaw) system with a 532 nm excitation wavelength at 20 mW power and 50X objective. XPS has been performed using a Thermo fisher scientific Thetaprobe system. SEM was performed using a Joel JSM-7500F FEG-SEM. The preparation of the lamella was performed using a Zeiss NVision 40 CrossBeam FIB system. TEM was performed in the Loughborough Materials Characterisation Centre using an FEI Tecnai F20. Electrical measurements were performed in air using an Agilent 4155C semiconductor parameter analyser connected to a cascade micropositioning stage.
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3

Nanocomplexes Morphology Imaging

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To observe the morphology
of the nanocomplexes, 10 μL of different samples were prepared
at a charge ratio of 5 (as mentioned in the previous section) and
deposited on mica followed by drying. The imaging was performed using
a 5500 Scanning Probe Microscope (Agilent Technologies, Inc., AZ)
using Picoview software 1.4.4. Images were taken in the AAC mode in
air with silicon cantilever at 75 kHz of resonance frequency and 2.8
N/m constant force. The scanning speed was set at 1 line/s. Picoview
software was used for minimum image processing and analysis.
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4

Visualizing WhiB4 Binding to Plasmid DNA

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The oxidized apo-WhiB4 was incubated for 1 min with 7 ng ml-1 of supercoiled or relaxed forms of plasmid DNA (pEGFP-C1) in a concentration range from 1:2.5–1:20 (DNA: WhiB4; w/w) at RT and 10 µl of this solution was loaded onto freshly cleaved mica surface. The unbound material was washed with deionised water and the bound surface allowed to air dry. Imaging was carried out using the 5500 scanning probe microscope (Agilent Technologies, Inc.) and the PicoView software. Images were obtained in tapping mode in the air with 225-mm-long silicon cantilevers (Agilent Technologies) that have a resonance frequency of 75 kHz and a force constant of 2.8 Newton m-1. Scan speed used was one line s-1. Minimum image processing (first order flattening and brightness contrast) was employed. Image analysis was performed using Pico Image software v1.4.4. A similar procedure was adopted for WhiB4-Cys3, Mtb HU and Mtb TcrX proteins.
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5

Atomic Force Microscopy Imaging Protocol

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The AFM experiments were performed using an Agilent Technology, 5500 Scanning Probe Microscope. The measurements were carried out in acoustic mode at room temperature using standard Si3N4 cantilever with a resonant frequency of 145–230 kHz. 5 × 5 μm – pixel resolution. The AFM images were collected at a scanning rate of 0.3 line per s.
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6

Surface Morphology Characterization of Films

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The surface morphology of the films was characterized using a 5500 Scanning Probe Microscope (Agilent Technologies, Inc., Chandler, AZ, USA) with scan resolution of 512 pixels × 512 pixels, set point 1.000 V, and scan rate 1.0 Hz. The measurement was conducted in ambient temperature, in a contact mode with the PointProbe®Plus silicon tip (Nanosensors, Neuchatel, Switzerland) of 10–15 µm in height. The most commonly used surface roughness parameter Ra is used to characterize the surface topography:
Ra=1ni=1n|yi|
where yi is the vertical distance from the mean line to the ith data point; n is the total tracing number within a specific area.
The residual indent image scanned by AFM is used to characterize the indent behavior (e.g., pile-up/sink-in, delamination between layers and between film and substrate) in parallel with the corresponding load-displacement curve.
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7

Multimodal Characterization of Nanomaterials

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The SEM images were recorded on a Hitachi SU8010 cold field emission SEM. SEM mapping was done on a Philips XL30 environmental scanning electron microscope. TEM was carried out using an FEI Tecnai F30 TEM working at 300 kV. The AFM images were obtained on an Agilent Technologies 5500 Scanning Probe Microscope. The XPS measurements were performed on a PHI 5000 VersaProbe. The Raman spectra were collected using a Raman spectrometer (Renishaw) with a 514-nm laser.
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8

Atomic Force Microscopy Imaging in Tapping Mode

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Atomic force microscopy
(AFM) studies were carried out using an atomic
force microscope (Agilent 5500 Scanning Probe Microscope, USA). The
AFM imaging was carried out in air at ambient conditions (25 °C)
in tapping mode using a long tapping-mode etched silicon probe (LTESP)
tip.
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9

Surface Topography Characterization of Thin Films

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The surface topography and root mean square (RMS) roughness of the S70, HS55 and S200/HS55 films were characterized by AFM. Samples were imaged in air at room temperature and humidity with a 5500 Scanning Probe Microscope (Agilent Technologies, Santa Clara, CA), operating in intermittent contact mode, typically referred to as an AC mode, with a scan range of 5 µm × 5 µm at 512 × 512 pixels and a scan rate of 0.5 Hz. The intermittent contact was selected to avoid the detachment of nanoparticles during measurement. Tapping-mode silicon cantilever probes, type PPP-RT-NCHR (NanoSensors, Neuchatel, Switzerland) with a nominal resonance frequency of 330 kHz, a nominal constant force of 42 N/m, and a curvature radius of less than 10 nm were used. Image processing and analysis, consisting of background correction, were carried out using Gwyddion 2.53 (Dept. of Nanometrology, Czech Metrology Institute, Brno, Czech Republic).
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10

Polymer Film Topography Analysis

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An Agilent 5500 scanning probe microscope working in contact mode was used to examine the topography of polymer films. AFM micrographs were analyzed with PicoImage software (Agilent, Santa Clara, CA, US).
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