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116 protocols using phi 5000 versaprobe

1

Comprehensive Material Characterization

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Morphologies, microstructures and crystal structures of the as-prepared samples were characterized by field-emission scanning electron microscopy (FE-SEM, S4800, Hitachi Ltd., Tokyo, Japan), field-emission transmission electron microscopy (FE-TEM, JEM-2100, JEOL Ltd., Tokyo, Japan) and X-ray powder diffractometry (XRD, Xpert, Philips, Amsterdam, The Netherlands). The diffuse reflectance spectra were measured by a VARIAN Cary5000 spectrophotometer (Varian, CA, USA). The X-ray photoelectron spectroscopy (XPS) data were collected by the PHI 5000 Versaprobe (Ulvac-Phi, Kanagawa, Japan).
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Characterization of Hybrid Conductors

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For the characterization of the structural, morphological, and surface properties of hybrid conductors, we used an optical microscope (OM, IX71, Olympus, Tokyo, Japan), scanning electron microscope (SEM, Nova 400 Nano SEM, FEI, Hillsboro, OR, USA) at an accelerating voltage of 5 kV, an X-ray photoelectron spectroscopy (XPS, PHI 5000 VersaProbe, ULVAC-PHI, Kanagawa, Japan) with an Al Kα (1486.6 eV) source, and a Raman spectrometer (Renishaw, inVia Raman microscope, Gloucestershire, UK) under backscattering geometry with the 633 nm laser at 2.5 mW. We also used a haze meter (NDH 5000, Nippon Denshoku Industries, Tokyo, Japan) and surface resistivity meter (R-CHEK, model RC2175, EDTM, Toledo, OH, USA) to measure the optical transmittance and the sheet resistance of the hybrid conducting films.
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3

X-ray Photoelectron Spectroscopy Analysis

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X-ray photoelectron spectroscopy analysis were acquired on a PHI 5000 VersaProbe (ULVAC-PHI) (ULVAC-PHI, Physical Electronics, Chanhassen, MN, USA) equipped with an Al Kα X-ray source (1486.6 eV) and taken at an angle of 45° relative to the substrate. Spectra were also obtained for the C1s, O1s, Si2p and N1s at high resolution scans for all samples. The deconvolution and curve fitting were subsequently performed using XPSpeak while the atomic concentration was determined by CasaXPS (version 2.3.18, http://www.casaxps.com).
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Comprehensive Characterization of Synthesized Products

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The morphology of the obtained products was analyzed through a Zeiss Ultra-Plus field emission scanning electron microscope (FESEM) with an accelerating voltage of 3 kV. Powder X-ray diffraction (PXRD) was carried out on an analytical X’Pert Pro MRD equipped with Cu Kα as the X-ray source (λ = 0.15418 nm) at a scan rate of 0.033°/s in the 2θ range 10−80°. X-ray photoelectron spectroscopy (XPS) data were recorded using an ULVAC-PHI PHI 5000 VersaProbe X-ray photoelectron spectrometer with Al Kα X-ray beams as the excitation source.
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5

XPS Characterization of Material Surfaces

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X-ray photoelectron spectroscopic (XPS) measurements were performed using a PHI 5000 VersaProbe (ULVAC-PHI) spectrometer with monochromatic Al Kα radiation ( = 1486.6 eV) from an X-ray source operating at a 100 μm spot size, 25 W and 15 kV. The survey XPS spectra were collected with a hemispherical analyzer at the pass energy of 117.4 and an energy step size of 0.4 eV. The X-ray beam was incident at the sample surface at an angle of 45° with respect to the surface normal, and the analyzer axis was located at 45° with respect to the surface. The XPS data were evaluated by MultiPak v.9 software using the set of sensitivity factors supplied by PHI.
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6

Photochromic PHI Characterization Methods

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All photochromism studies of PHI were performed using a white LED (HAYASHI-REPIC, LA-HDF 100NA) as a visible light source.
UV–Vis measurements (V-650 spectrometer, JASCO) of PHIG were performed on samples placed between two quartz plates to combine transmission and diffuse reflection methods. The time variation of specific wavelengths about the PHIG sample between the glass plates was measured using a spectrometer (BIM-6002A, Brolight) in a homemade dark box. The KBr pellet method was used to record FT-IR spectra of the powder samples. XRD analyses were carried out using a diffractometer (Ultima IV, Rigaku) with a Cu Kα radiation source (λ = 0.15496 nm).
Electric current measurements were performed on PHIG pasted on patterned ITO substrate using a source-measure unit (6487, Kethley) under constant voltage (0.5 V) generated by a DC power source (R6144, Advantest).
XPS measurements were performed on PHIG using a PHI 5000 Versa Probe (Ulvac-Phi) instrument with monochromatic Al Kα ( = 1486.6 eV) radiation as the excitation source. The XPS spectra were analyzed with Voigt functions in the XPSPEAK41 software program (written by Raymund W. M. Kwok). PHIG[blue] was probed using a blue laser (λ = 473 nm, KYOCERA SOC, J010BS).
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7

Thermoelectric Material Characterization

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The composition and morphology of the samples were characterized by X-ray photoelectron spectroscopic (XPS) (PHI 5000 VersaProbe (ULVAC-PHI, Chigasaki, Japan) and scanning electron microscopy (SEM; Philips XL 30 FEG, Eindhoven, The Netherlands), respectively. The electrical conductivities and Seebeck coefficients of the samples were measured simultaneously (in a vacuum atmosphere from 300 K to 370 K) on a MRS-3L thin-film thermoelectric test system (Wuhan Giant Instrument Technology Co., Ltd, Wuhan, China). The thermal conductivities of the samples were measured by a transient hot-wire method at room temperature (TC3000E thermal conductivity meter, Xiatech Electronics Co., Ltd., Xi’an, China).
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8

Comprehensive Characterization of Nanomaterials

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Atomic force micrographs were acquired in non-contact mode with a ppp-NCHR 5M probe (Nanosensors) attached to a XE-100 microscope (Park Systems). The Raman spectra were acquired using a Renishaw In-Via system with a 532 nm excitation laser. The XRD profiles were obtained using a Dmax2500/PC (Rigaku) spectrometer operated at 40 kV, 200 mA, and 8 kW using a Cu target (1.5406 Å) at a scan rate of 2° min−1. The XPS profiles were acquired using a PHI 5000 VersaProbe (Ulvac-PHI) system at a base pressure of 6.7 × 10−8 Pa using a monochromated Al Ka (1486.6 eV) anode (25 W, 15 kV) with a spot size of 100 μm × 100 μm. The transmittance data were recorded on a Cary 5000 (Varian) spectrometer from 175 nm to 3300 nm at a scan rate of 600 nm·min−1 at a resolution of 1.0 nm. The optical spectrum, its characteristics, and those of the pulse waveform, were respectively measured using an autocorrelator (25 fs resolution, HAC-200, Alnair Labs), an optical spectrum analyzer (0.02 nm resolution, C-band scan range, SW7370C, Yokogawa), and an oscilloscope (DSO 5054A, Agilent Technology).
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9

Nanoparticle Characterization Techniques

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Transmission electron microscope (JEOL, JEM-2100F, Tokyo, Japan) equipped with an energy dispersive X-ray (EDS) were employed to analyze the nanostructure, morphology, and composition of the as-prepared nanoparticles. Powder X-ray diffraction (XRD) (Bruker, MA, USA) was conducted using a Rigaku D/MAX-2200PC X-ray diffractometer with Cu-Kα radiation (λ = 0.154 nm) at a scan rate of 6°/min. The chemical states of the as-prepared nanoparticles were investigated by X-ray photoelectron spectroscopy (XPS, ULVAC PHI, PHI 5000 VersaProbe, Osaka, Japan). The dissolution amount of nanoparticles was measured via inductively coupled plasma (ICP) (LEEMAN, Direct Reading Echelle ICP, OH, USA) spectrometer.
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10

X-ray Analysis of Nanofibrous Hydrogels

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The crystal structure of the nanofibrous hydrogels was examined by X-ray analysis. X-ray diffractograms were obtained by two theta (2θ) scanning with the PHI 5000 VersaProbe (Ulvac-PHI, Japan) using monochromatized AlKα X-ray with a spatial resolution of 10 μm and 0.48 eV resolution conditions.
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