SiOx at ambient temperature were prepared
(
of a 10 μL imogolite aliquot (drop) with a concentration of
12 mg/mL on the substrate was carried out by drop-casting. Preparation
of the imogolite-Sudan III (Sudan III-IMO) complex on the substrate
was carried out in two successive stages: deposition of a 10 μL
drop of a 0.1 mg/mL solution of Sudan III in tetrahydrofuran (THF)
(Merck) (deposited by spin-coating at 2000 rpm for 60 s on the substrate).
On the formed film, a 10 μL drop of a 12 mg/mL solution of imogolite
hydrogel was deposited by spin-coating at 2000 rpm for 60 s. The third
and last stage is deposition of a 10 μL drop of a 0.65 mg/mL
aqueous solution of Pluronic F68 (F68) on the substrate spin-coating
(it immediately) at 3200 rpm for 60 s.49 (link) The scheme on the right represents the deposition of a 10 μL
drop of a 12 mg/mL aqueous solution of the Sudan III-imogolite (Sudan
III-IMO) complex containing 0.1 mg of Sudan III (Aldrich), which was
applied by drop-casting on the previously formed film (