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Multipak v8.1c software

Manufactured by Physical Electronics
Sourced in Japan

MultiPak v8.1c software is a data acquisition and analysis tool designed for use with Physical Electronics' analytical instrumentation. The software provides a platform for collecting, processing, and managing data generated by various lab equipment. Its core function is to enable users to control, acquire, and analyze data from Physical Electronics' instruments in a standardized and efficient manner.

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7 protocols using multipak v8.1c software

1

XPS Analysis of Polymer Surface Changes

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XPS characterization of the polymer surface was performed to determine changes in the chemical composition after APPJ treatment using an XPS (TFA XPS Physical Electronics, Münich, Germany). The samples were excited with monochromatic Al Kα1,2 radiation at 1486.6 eV over an area with a diameter of 400 µm. Photoelectrons were detected with a hemispherical analyser positioned at an angle of 45° with respect to the normal of the sample surface. To determine the variation of the oxygen concentration over the sample surface, carbon C1s and oxygen O1s spectra were measured in the middle of the treated sample, as well as at various positions over the sample surface (an array of measured points with a distance of 5 mm). In such a way a similar 2D mapping was performed as for wettability measurements. The spectra were measured at a pass-energy of 23.5 eV using an energy step of 0.1 eV. An additional electron gun was used for surface neutralization during the XPS measurements. The measured spectra were analyzed using MultiPak v8.1c software (Ulvac-Phi Inc., Kanagawa, Japan, 2006) from Physical Electronics, which was supplied with the spectrometer. Because of time-consuming experiments, the XPS spectra were acquired only on the limited number of the samples.
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2

XPS Analysis of Coated Polymer Foils

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The surface composition of uncoated and coated polymer foils was compared through using a TFA XPS instrument (Physical Electronics Inc., Chanhassen, MN, USA). The ultimate pressure in the XPS vacuum chamber was ~6 × 10−8 Pa. The samples were irradiated with X-rays from monochromatic Al Kα1,2 radiation at 1486.6 eV. The diameter of the analysis area was 400 µm.
The photoelectrons were detected with a hemispherical analyzer located at a take-off angle of 45° with respect to the normal sample surface. Survey-scan spectra were acquired at a pass energy of 187.85 eV, while, for C 1s, individual high-resolution spectra were taken at a pass energy of 29.35 eV with a 0.125-eV energy step. An additional electron gun was used for charge neutralization. All spectra were referenced to the main C 1s peak of the carbon atoms, which was assigned a value of 284.8 eV. The spectra were analyzed using MultiPak v8.1c software (Ulvac-Phi Inc., Kanagawa, Japan, 2006) from Physical Electronics, which was supplied with the spectrometer.
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3

XPS Characterization of Material Surfaces

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Samples were analyzed by a high-resolution XPS instrument «TFA XPS Physical Electronics» (Physical Electronics Inc., Chanhassen, MN, USA). The base pressure in the XPS analysis chamber was about 6 × 10−8 Pa. The samples were excited with monochromatic Al Kα1,2 radiation at 1486.6 eV over an area of 400 µm2. Photoelectrons were detected with a hemispherical analyzer positioned at an angle of 45° with respect to the normal of the sample surface. XPS survey spectra were measured at a pass energy of 187 eV using an energy step of 0.4 eV, while high-resolution C1s spectra were measured at a pass energy of 23.5 eV using an energy step of 0.1 eV. An additional electron gun was used for surface neutralization during XPS measurements. The measured spectra were evaluated using MultiPak v8.1c software (Ulvac-Phi Inc., Kanagawa, Japan, 2006), which was supplied with the spectrometer.
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4

XPS Analysis of Plasma-Treated Polymers

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XPS characterization of polymer samples was performed to determine their chemical composition after plasma treatment using an XPS (a model TFA XPS Physical Electronics, Chanhassen, MN, US). The samples were excited with monochromatic Al Kα1,2 radiation at 1486.6 eV over an area with a diameter of 400 µm. Photoelectrons were detected with a hemispherical analyzer positioned at an angle of 45° with respect to the normal of the sample surface. XPS survey spectra were measured at a pass-energy of 187 eV using an energy step of 0.4 eV, whereas high-resolution spectra were measured at a pass-energy of 23.5 eV using an energy step of 0.1 eV. An additional electron gun was used for surface neutralization during XPS measurements. All spectra were referenced to the main C1s peak of the carbon atoms, which was assigned a value of 284.8 eV. The measured spectra were analyzed using MultiPak v8.1c software (Ulvac-Phi Inc., Kanagawa, Japan, 2006) from Physical Electronics, which was supplied with the spectrometer.
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5

Surface Morphology and Composition Analysis

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The surface morphology of the deposits was analyzed by secondary electron microscopy (SEM). Microscopic images were acquired in immersion mode using Schottky field emission scanning electron microscope with a monochromator (Thermo Fisher Verios 4G HP, Waltham, MA, USA).
The chemical composition of the samples was analyzed by X-ray photoelectron spectroscopy (XPS). The characterization was performed by using an XPS (TFA XPS Physical Electronics, Münich, Germany). The samples were excited with monochromatic Al Kα1,2 radiation at 1486.6 eV over an area with a diameter of 400 µm. Photoelectrons were detected with a hemispherical analyzer positioned at an angle of 45° with respect to the normal of the sample surface. Survey spectra were measured to determine the surface composition—i.e., the presence of any other elements except carbon. The survey spectra were measured at a pass energy of 187 eV with an energy step of 0.4 eV. The measured spectra were analyzed using MultiPak v8.1c software (Ulvac-Phi Inc., Kanagawa, Japan, 2006) from Physical Electronics, which was supplied with the spectrometer. Standard sensitivity factors were used for the calculation of the surface composition.
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6

XPS Characterization of Plasma-Treated Polystyrene

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Immediately after the APPJ treatment, the samples were transferred to the XPS chamber. XPS characterization of PS was performed using an XPS instrument (model TFA XPS from Physical Electronics, Münich, Germany). The samples were exposed to monochromatic Al Kα1,2 radiation at 1486.6 eV. The diameter of the measured area was 400 µm. Spectra were measured at an electron take-off angle of 45° in the center of the treated samples. Survey spectra were acquired at a pass-energy of 187 eV using an energy step of 0.4 eV, whereas high-resolution C1s spectra were measured at a pass-energy of 23.5 eV using an energy step of 0.1 eV. An additional electron gun was used for compensation of the surface charge. Spectra were calibrated by shifting the C–C peak to 284.8 eV. The measured spectra were analyzed using MultiPak v8.1c software (Ulvac-Phi Inc., Kanagawa, Japan, 2006) from Physical Electronics, which was supplied with the spectrometer. Linear background subtraction was used. The following peaks were identified in C1s spectra: C–C (284.8 eV), C–O (286.2 eV), C=O, O–C-O (287,4 eV), O–C=O (288.6 eV), as well as O–CO–O (289.7 eV) and aromatic shake-up peak π–π* (291.5 eV).
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7

XPS Characterization of Material Composition

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XPS characterization was performed by using an XPS (TFA XPS Physical Electronics, Münich, Germany). The samples were excited with monochromatic Al Kα1,2 radiation at 1486.6 eV over an area with a diameter of 400 µm. Photoelectrons were detected with a hemispherical analyzer positioned at an angle of 45° with respect to the normal of the sample surface. Survey spectra were measured to determine the nitrogen content in the samples. High-resolution spectra of C1s and N1s were also measured. The C1s and N1s spectra were measured at a pass-energy of 23.5 eV using an energy step of 0.1 eV. Auger CKLL spectrum (1190–1250 eV) was also measured with a pass-energy of 117.4 eV using an energy step of 0.25 eV. The measured spectra were analyzed using MultiPak v8.1c software (Ulvac-Phi Inc., Kanagawa, Japan, 2006) from Physical Electronics, which was supplied with the spectrometer. Shirley background subtraction was used. No flood gun for charge neutralization was needed. The binding energy was corrected by taking sp2 carbon for a reference at 284.4 eV. The sp2 carbon was fitted with an asymmetric function determined on highly-oriented pyrolytic graphite (HOPG) reference.
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