Helios g4 dualbeam

FEI Helios Nanolab G3 (FEI Company, USA) and Helios G4 DualBeam (ThermoFisher Scientific, USA) microscopes were employed for surface morphology observations of both explanted Ti‐PP mesh samples. In contrast to common SEM analysis practice, samples were not previously treated with a conductive coating by deposition. This approach was selected to aid in the visualization of the Ti coating present on the Ti‐PP meshes. An accelerating voltage of 1–2 keV at typical chamber vacuum pressures in the range of 10⁻⁶ mbar and a working distance of 4 mm were chosen to avoid sample damage through surface charging. An Everhart–Thornley Detector (ETD) was selected for low magnification of SE images and a Through Lens Detector (TLD) for high magnification SE images.

ADA-NP suspension was pipetted onto a glass coverslip and airdried overnight. Coverslips were glued on scanning electron microscopy (SEM) aluminum stubs using Acheson silver conducting paint (Plano GmbH, Wetzlar, Germany) and sputter coated with platinum (Quorum Q150T S, Laughton, East Sussex, UK) for 20 s. Secondary electron (SE) imaging was performed with a Helios G4 Dual beam (Thermo Fisher Scientific, Eindhoven, The Netherlands) at 2.5 mm working distance and 2 kV acceleration voltage.