To fabricate FN nanofibers with a submicron width, we used a Photonic Professional GT 3D printer (Nanoscribe GmbH). Briefly, a master mold containing 250 µm long, 5 µm wide, 2 µm high, and 500 nm spaced features was first designed in AutoCAD (Autodesk Inventor) and exported into DeScribe 2.0 software. The master mold was then 3D printed using IP-L photoresist. Unexposed regions were then removed by immersion in a PGMEA developer solution (Microchem). PDMS stamps containing the negative of the master mold (yielding 500 nm wide features) were prepared by casting the PDMS pre-polymer solution over the master mold as previously mentioned. To accurately assess their nanoscale dimensions, the FN was µCP onto PIPAAm-coated glass coverslips and scanned using AFM in air using AC mode with AC160TS-R3 cantilevers (Olympus Corporation). High-resolution AFM images were obtained using a scan size of 1024×1024 lines over a scan area of 8 µm×8 µm. The nanofiber width was quantified using the IGOR Pro software environment (WaveMetrics, Inc.).
Pgmea developer solution
Manufactured by MicroChem
PGMEA developer solution is a chemical compound used in the photolithography process. It serves as a developer solution to selectively dissolve and remove the exposed photoresist material from the substrate, revealing the desired pattern.
Automatically generated - may contain errors
2 protocols using pgmea developer solution
1
Fabrication of Fibronectin Nanofibers via 3D Printing
2
Fabrication of Fibronectin Nanofibers via 3D Printing
Check if the same lab product or an alternative is used in the 5 most similar protocols
+ Expand
To fabricate FN nanofibers with a submicron width, we used a Photonic Professional GT 3D printer (Nanoscribe GmbH). Briefly, a master mold containing 250 µm long, 5 µm wide, 2 µm high, and 500 nm spaced features was first designed in AutoCAD (Autodesk Inventor) and exported into DeScribe 2.0 software. The master mold was then 3D printed using IP-L photoresist. Unexposed regions were then removed by immersion in a PGMEA developer solution (Microchem). PDMS stamps containing the negative of the master mold (yielding 500 nm wide features) were prepared by casting the PDMS pre-polymer solution over the master mold as previously mentioned. To accurately assess their nanoscale dimensions, the FN was µCP onto PIPAAm-coated glass coverslips and scanned using AFM in air using AC mode with AC160TS-R3 cantilevers (Olympus Corporation). High-resolution AFM images were obtained using a scan size of 1024×1024 lines over a scan area of 8 µm×8 µm. The nanofiber width was quantified using the IGOR Pro software environment (WaveMetrics, Inc.).
About PubCompare
Our mission is to provide scientists with the largest repository of trustworthy protocols and intelligent analytical tools, thereby offering them extensive information to design robust protocols aimed at minimizing the risk of failures.
We believe that the most crucial aspect is to grant scientists access to a wide range of reliable sources and new useful tools that surpass human capabilities.
However, we trust in allowing scientists to determine how to construct their own protocols based on this information, as they are the experts in their field.
Ready to get started?
Sign up for free.
Registration takes 20 seconds.
Available from any computer
No download required
Revolutionizing how scientists
search and build protocols!