(ACS reagent grade,
≥99.5%), ethanol (EtOH) (analytical standard for GC, ≥99.9%),
ammonium hydroxide solution (NH3·H2O) (ACS
reagent grade, 28.0–30.0 wt % NH3 basis), magnesium
nitrate hexahydrate [Mg(NO3)2·6H2O] (ACS reagent grade, ≥99.0%), zinc chloride hexahydrate
[ZnCl2·6H2O] (ACS reagent grade, ≥99.0%),
zinc nitrate hexahydrate [Zn(NO3)2·6H2O] (ACS reagent grade, ≥99.0%), aluminum nitrate nonahydrate
[Al(NO3)3·9H2O] (ACS reagent
grade, ≥99.0%), aluminum chloride hydrate [AlCl3·xH2O] (purity 99.999%), iron(III)
chloride hexahydrate [FeCl3·6H2O] (ACS
reagent grade, ≥97.0%), and sodium hydroxide [NaOH] (ACS reagent
grade, ≥97.0%) were purchased from Sigma-Aldrich (Milano, Italy).
The common household bleach based on sodium hypochlorite (NaClO) (solution
with 2.2 wt %) was employed. All of the chemicals were used as received
without further purification. Si 4″ wafers finished with a
1 μm thick thermally grown SiO2 layer were purchased
from Si-Mat (Kaufering, Germany) and used as substrates for device
fabrication.