UV-vis absorption and fluorescence measurements were taken using a Shimadzu UV-2450 spectrophotometer and a Shimadzu RF-5301PC spectrofluorometer, respectively. Picosecond time-resolved fluorescence lifetimes were recorded on a Fluo300 (PicoQuant, Germany). Lifetimes were evaluated using FluoFit software, which was attached to the equipment. Nanosecond transient absorption studies were recorded using a nanosecond laser flash photolysis technique (LP980, Edinburgh Instruments, UK). The instrument was connected with a tunable laser source (NT342B-10, Ekspla). Fourier transform infrared (FT-IR) spectra were obtained using a JASCO spectrometer 4100, using a KBr pellet technique. The X-ray diffraction (XRD) measurements were conducted using a Shimadzu 6000 model with Cu Kα (λ = 1.5418 Å) as the incident radiation. Transmission electron microscopy (TEM) images were taken using a JEOL 2010 microscope operating under a maximum acceleration voltage of 200 kV. Zeta potential results were obtained using a Brookhaven zeta potential/particle size analyzer.
2010 microscope
Manufactured by JEOL
Sourced in Japan
The JEOL 2010 is a high-performance transmission electron microscope (TEM) designed for advanced materials analysis. It features a LaB6 electron source and provides a maximum accelerating voltage of 200 kV. The JEOL 2010 offers high-resolution imaging capabilities and is suitable for a wide range of applications in materials science, nanotechnology, and life sciences research.
Automatically generated - may contain errors
Lab products found in correlation
Spectrometer 4100, by Jasco (1 mentions)
Zeta potential particle size analyzer, by Brookhaven Instruments (1 mentions)
Rf 5301pc spectrofluorometer, by Shimadzu (1 mentions)
Lp980, by Edinburgh Instruments (1 mentions)
Uv 2450 spectrophotometer, by Shimadzu (1 mentions)
Jxa 8900 microscope, by JEOL (1 mentions)
Ifs66v, by Bruker (1 mentions)
Vertex 70 spectrometer, by Bruker (1 mentions)
Vertex 70, by Bruker (1 mentions)
V 770 spectrophotometer, by Jasco (1 mentions)
Jsm 6360lv field emission microscope, by JEOL (1 mentions)
Phi 5400, by Physical Electronics (1 mentions)
Ultima 3 x ray diffractometer, by Rigaku (1 mentions)
Cary 50 uv vis spectrometer, by Agilent Technologies (1 mentions)
Sta 409 pc thermal analyzer, by Netzsch (1 mentions)
Vg escalab 250 spectrometer, by Thermo Fisher Scientific (1 mentions)
D max 2550 diffractometer, by Rigaku (1 mentions)
Pyris 1 tga analyzer, by PerkinElmer (1 mentions)
Rf 5301pc spectrofluorophotometer, by Shimadzu (1 mentions)
D8 advanced x ray diffractometer, by Bruker (1 mentions)
13 protocols using 2010 microscope
1
Characterization of Photophysical Properties
2
Materials Characterization by Microscopy
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To acquire FESEM
images, a JEOL JXA-8900 microscope was used, and for TEM images and
EDS, a JEOL 2010 microscope was utilized. To get XPS and XRD patterns,
a PerkinElmer PHI 5600 ci X-ray photoelectron spectrometer and Scintag
X-ray diffractometer (PAD X) fitted with Cu Kα photon source
(45 kV, 40 mA), respectively, were employed. The UV–vis–NIR
electronic absorption and ATR–IR spectra were perceived by
a Varian Cary 50 Bio spectrophotometer and Smiths ChemID diamond ATR
spectrometer, respectively.
images, a JEOL JXA-8900 microscope was used, and for TEM images and
EDS, a JEOL 2010 microscope was utilized. To get XPS and XRD patterns,
a PerkinElmer PHI 5600 ci X-ray photoelectron spectrometer and Scintag
X-ray diffractometer (PAD X) fitted with Cu Kα photon source
(45 kV, 40 mA), respectively, were employed. The UV–vis–NIR
electronic absorption and ATR–IR spectra were perceived by
a Varian Cary 50 Bio spectrophotometer and Smiths ChemID diamond ATR
spectrometer, respectively.
3
Characterization of Colloidal Quantum Dots
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For TEM imaging, the solution of CQD is drop-cast on a copper TEM grid and dried overnight under vacuum. The TEM images are then obtained using a JEOL 2010 microscope operated at 200 kV. Room temperature IR optical absorption is measured using a Bruker Vertex 70 spectrometer. A Globar source equivalent to a 700°C blackbody is used as source with a DTGS detector. Spectra are typically acquired between 10 000 cm -1 and 380 cm -1 with a 4 cm -1 resolution and averaging over 64 spectra. Measurements of the material with DDT ligand are made in an ATR configuration, while we use transmission configuration for ligand exchanged films. In this case we use CaF 2 or undoped Si substrates. For low temperature infrared spectra we used a He gas exchange cryostat with ZnSe windows and conduct the measurements in a transmission configuration. The FTIR is a Bruker IFS66v with optical components similar to the ones in the Vertex 70.
4
Structural Characterization of Nanomaterials
5
Comprehensive Characterization of Synthesized Samples
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Fourier transform-infrared measurements (FT-IR) were conducted on KBr pellets with a PE Paragon 1000 spectrophotometer. The synthesized samples were characterized by Xray diffraction (XRD) on a RigakuD/max 2550VL/PC system operated at 35 kV and 200 mA with Cu Kα radiation (λ = 1.5406 Å), at a scan rate of 5°min -1 and a step size of 0.02°. Raman spectroscopy was measured on a Renishawin Via Raman microscope. X-ray photoelectron spectra (XPS) were collected on a physical electronics PHI5400 using Mg K radiation as the Xray source. All the spectra were corrected with the C 1s (285.0 eV) band. Elemental analysis was processed using a Vario ELIII/ Isoprime isotope ratio mass spectrometer. Nitrogen adsorption measurements at 77 K were performed using an ASAP2020 volumetric adsorption analyzer, after the samples had been outgassed for 8 h in the degas port of the adsorption apparatus. Scanning electron microscopy (SEM) was performed on a JEOL JSM-6360LV field emission microscope at 15 kV. Transmission electron microscopy (TEM) was carried out on a JEOL 2010 microscope at 200 kV. Thermogravimetric analysis (TGA) was conducted on a PE TGA-7 instrument at 20 °C min -1 .
6
Atomic-Resolution ADF-STEM Imaging Protocols
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Preliminary sample
screening was performed using a JEOL 2010 microscope operated at 80
kV. Atomic-resolution ADF-STEM images were acquired by the double-spherical
(Cs) aberration-corrected JEOL ARM-200F and TEAM 0.5 instruments at
the National Center for Electron Microscopy (NCEM). The JEOL ARM-200F
instrument was operated at 80 kV with a 23 mrad convergence angle
and collection semiangles from 40 to 160 mrad. The TEAM 0.5 instrument
was operated at 80 kV with a semiconvergence angle of 30 mrad and
collection semiangles from 37 to 187 mrad.
STEM image simulations
were performed using MacTempas software, which implements multislice
calculations for high-resolution (HR) STEM imaging. STEM simulation
parameters similar to the parameters in the experiments (i.e., a probe
semiangle of 23 or 30 mrad, 0.05 Å/pixel sampling, and 10 frozen
phonon calculations) were used for each simulation. Image analysis
and processing were performed using ImageJ software. The average-cell
calculation was performed with the template matching technique to
increase the signal-to-noise ratio and quality of the STEM image.41 (link)
screening was performed using a JEOL 2010 microscope operated at 80
kV. Atomic-resolution ADF-STEM images were acquired by the double-spherical
(Cs) aberration-corrected JEOL ARM-200F and TEAM 0.5 instruments at
the National Center for Electron Microscopy (NCEM). The JEOL ARM-200F
instrument was operated at 80 kV with a 23 mrad convergence angle
and collection semiangles from 40 to 160 mrad. The TEAM 0.5 instrument
was operated at 80 kV with a semiconvergence angle of 30 mrad and
collection semiangles from 37 to 187 mrad.
STEM image simulations
were performed using MacTempas software, which implements multislice
calculations for high-resolution (HR) STEM imaging. STEM simulation
parameters similar to the parameters in the experiments (i.e., a probe
semiangle of 23 or 30 mrad, 0.05 Å/pixel sampling, and 10 frozen
phonon calculations) were used for each simulation. Image analysis
and processing were performed using ImageJ software. The average-cell
calculation was performed with the template matching technique to
increase the signal-to-noise ratio and quality of the STEM image.41 (link)
7
Characterization of CdTe Quantum Dots
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pH values were measured by a Starter 3C digital pH meter, Ohaus, USA. Transmission electron microscopy (TEM), selected area electron diffraction (SAED), and elemental characterization were done on a JEOL 2010 microscope (Akishima-shi, Japan) with energy-dispersive X-ray spectrometer (EDS) at an accelerating voltage of 200 kV. X-ray powder diffraction (XRD) spectrum was taken on Rigaku Ultima III X-ray diffractometer (Shibuya-ku, Japan) operated at 40 kV voltage and 30 mA current with Cu Ka radiation. UV-visible (vis) spectra were recorded on a Varian Cary 50 UV/Vis spectrometer, Agilent Technologies, Inc., Santa Clara, CA, USA. Emission spectra were collected using a Varian Cary spectrometer. Thermogravimetric analysis (TGA) was done under nitrogen on a STA 409 PC thermal analyzer, Netzsch, Germany. The quantum yield (QY) of CdTe QDs was measured according to the methods described in [26 (link)] using rhodamine 6G as a reference standard (QY = 95%).
8
Comprehensive Characterization of Nanomaterials
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Photoluminescence spectra were recorded on a Shimadzu RF-5301PC spectrofluorophotometer. Transmission electron microscopy (TEM) observations were performed on a JEOL-2010 microscope operating at 100 kV. Zeta-potential measurements were obtained with a Brookhaven 90Plus Zeta laser light scattering system. Element analysis mapping image was recorded on a FEI TECNAI G2 transmission electron microscope operating at 200 kV. X-ray diffraction (XRD) patterns were collected on a Rigaku D/MAX2550 diffractometer. X-ray photoelectron spectroscopy (XPS) measurements were carried out on a Thermo VG ESCALAB 250 spectrometer. Thermogravimetric analyses (TGA) were taken on a Perkin Elmer Pyris 1 TGA analyzer under N2 atmosphere.
9
Nanomaterial Characterization via XRD, TEM, and BET
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X-ray diffraction (XRD) patterns were conducted using a Bruker D8 Advanced X-Ray Diffractometer with Ni filtered Cu K-alpha radiation (λ = 1.5406 Å) at a voltage of 40 kV and a current of 25 mA. Transmission electron microscope (TEM) images and high-resolution transmission electron microscopic (HRTEM) images were captured and energy dispersive X-ray spectroscopy (EDS) analysis was conducted using a JEOL-2010 microscope at an accelerating voltage of 200 kV. Nitrogen adsorption measurements were taken at 77 K using a Micromeritics ASAP 2020 system utilized for Barrett-Emmett-Teller (BET) calculations for surface area. The nitrogen sorption measurement was performed on Autosorb-6B at a temperature where N2 remains in a liquid state (−196 °C).
10
Structural Properties of Thin Films
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Detailed structural properties of the films were investigated by HRTEM (JEOL 2010 microscope) operating at 200 kV and a JEOL 4000 EX microscope operating at 400 kV) and a FEI TitanTM G2 80-200 STEM, with a Cs probe corrector, operated at 200 kV. EDS was used for the element distribution mapping.
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