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S 4700 device

Manufactured by Hitachi
Sourced in Japan

The S-4700 is a field emission scanning electron microscope (FE-SEM) produced by Hitachi. It provides high-resolution imaging capabilities for a wide range of materials and applications. The core function of the S-4700 is to generate and focus an electron beam to scan the surface of a sample, allowing for detailed examination and analysis at the nanoscale level.

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2 protocols using s 4700 device

1

Characterizing Fibrous Scaffold Morphology

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Field emission scanning electron microscopy (FE-SEM) was used to observe the morphology of each sample. At this time, the sample was analyzed in a sufficiently dried state. Each sample was coated with platinum at 20 mA for 150 s and captured using a Hitachi S-4700 device under vacuum conditions of 20 kV, Mag × 1.00 k, and WD 14.2 mm. The average fiber diameter of the fibers was measured using an image analysis software (Image J, National Institute of Health, USA) and calculated for 100 fibers that were randomly selected from the FE-SEM images of the scaffold.
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2

Characterization of α-MoO3 Composites

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X-ray diffraction (XRD) measurements were carried out with a Rigaku Miniflex II diffractometer (Cu Kα λ = 0.15406 nm, 40 kV, 30 mA, scan step size 0.02°, 20–80 (2θ°), Rigaku, Neu-Isenburg, Germany). The primary crystallite size of the identified crystal phases was estimated using the Scherrer equation.
The morphology of the composites and α-MoO3 was investigated with scanning electron microscopy (SEM) using a Hitachi S-4700 device (Hitachi, Tokyo, Japan). During SEM measurements, the electron beam was produced using a cold-field emission gun applying 10 kV acceleration voltage. The samples were fixed on an aluminum sample holder using conductive carbon tape.
The diffuse reflectance spectra of the samples were recorded with a JASCO-V650 spectrophotometer (JASCO, Vienna, Austria) with an integration sphere (ILV-724) between 250 and 800 nm; as a reference, BaSO4 was used. The band gap of the samples was calculated via Kubelka–Munk and the first-derivative method from their reflectance spectra [20 ].
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