Trisodium citrate dihydrate
Trisodium citrate dihydrate is a water-soluble salt used as a buffer and chelating agent in various laboratory applications. It helps maintain a specific pH range and binds to metal ions in solutions.
Lab products found in correlation
24 protocols using trisodium citrate dihydrate
Synthesis of Rhodamine-Doped Silica Nanoparticles
Synthesis of Fluorescent Silica Nanoparticles
Engineered Gold Nanoparticle Synthesis
Synthesis of Metal Nanoparticles
Gold(III) Chloride Functionalization Protocol
diimide (EDC), and SDS were purchased from Sigma Aldrich. N-hydroxysuccinimide (NHS), tetraethyl orthosilicate (TEOS),
and sodium borohydride obtained from Merck, EDTA from Gruessing, trisodium
citrate dihydrate from Acros organics,
and (3-aminopropyl)trimethoxysilane (APTMS) from Alfa Aesar were used
as received. DE was purchased from Supelco (calcined, purified).
Synthesis and Characterization of Porphyrin-Based Compounds
The organic phase supporting electrolyte, bis(triphenylphosphoranylidene) ammonium tetrakis(pentauorophenyl)borate (BATB), was prepared through metathesis of aqueous equimolar solutions of BACl and LiTB-DEE purum. The resulting precipitates were ltered, washed, and recrystallized from an acetone : methanol (1 : 1) mixture. 34 The porphyrin used in this study, zinc(II) 5,15-(di-4-sulfonatophenyl)-10,20-(di-N-methyl-4-pyridyl)porphyrin disodium dichloride (ZnDMPyDSPP), was obtained from PorphyChem (France) using a custom synthesis. As the compound contained non water soluble impurities, the product was rst dissolved in water and ltered through 0.22 mm HPLC PTFE lters (Infochroma AG) before use. The nal concentration of the porphyrin was measured using UV-vis absorption spectroscopy.
Formulation and Characterization of rhIL-1ra
Analytical Methods for Pectin Characterization
Hydrothermal Synthesis of Metal-Based Nanostructures
Boron-Doped Diamond Electrodes Synthesis
Aqueous solutions were prepared using Milli Q water (resistivity 18.2 MΩ∙cm).
Boron-doped diamond electrodes were provided by NEOCOAT company (La Chaux-de-Fonds, Switzerland). 300 nm thick polycrystalline boron-doped diamond with boron concentration higher than 7000–8000 ppm was grown by MPECVD on a highly doped silicon substrate.
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