Ten μl of a 10-mg ml−1 lipid mixture was dropped onto a circular glass coverslip, air dried and kept under vacuum for at least 1 h. The dried lipid smear was hydrated with 90 μl of GTPase buffer for 30 min, followed by rinsing to peel off the membrane regions that did not adhere to the surface. Two μl of the protein mix (AP180+clathrin) was incubated with the adhered membrane sheet for 30 min, followed by rinsing with GTPase buffer to wash the unbound protein. The protein-binding membrane sheet was then fixed with 4% glutaraldehyde and 1.8% osmium tetroxide for 1 h, followed by washes with GTPase buffer. The sample was then dehydrated by series of ethanol washes (30%, 50%, 70% and 90% ethanol for 5 min each) and further kept overnight under absolute ethanol. The dried sample was then imaged using the Multimode V AFM (Veeco) in tapping mode. Pointprobe Plus tips (Nanosensors, Neuchatel, Switzerland) with non-contact high frequency (C=42 N.m−1, fo=330 kHz) were used for scanning the image.
Multimode 5 afm
Manufactured by Veeco
Sourced in United States
The Multimode V AFM is a high-performance atomic force microscope (AFM) designed for a wide range of imaging and characterization applications. It provides accurate topographical and material property measurements at the nanoscale level. The Multimode V AFM is capable of operating in various imaging modes to suit diverse sample types and research requirements.
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Lab products found in correlation
Pointprobeplus tips, by Nanosensors (1 mentions)
Flash 2000, by Thermo Fisher Scientific (1 mentions)
Avance 3 hd, by Bruker (1 mentions)
Dsa100, by Krüss (1 mentions)
Theta probe spectrometer, by Thermo Fisher Scientific (1 mentions)
Ultra plus, by Zeiss (1 mentions)
Scanasyst tapping mode, by Bruker (1 mentions)
Scanasyst fluid tip, by Bruker (1 mentions)
Dektak 150 stylus profiler, by Bruker (1 mentions)
5 protocols using multimode 5 afm
1
Lipid Membrane Visualization by AFM
2
Multifaceted Characterization of Organic Compounds
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NMR spectra (1H NMR, 13C NMR and 2D ROESY) were recorded on a 400 MHz FT-NMR spectrometer (AVANCE III HD, Bruker, USA) using DMSO-d6 or D2O as the solvent. The chemical shifts were referenced to the deuterated solvent. Fourier transform infrared (FTIR) spectra were recorded on a FTIR spectrometer (670-IR, Varian, USA) using an attenuated total reflection (ATR) mode. High resolution mass spectra (HRMS) analyses were performed using a direct analysis in real time (DART) method (AccuToF 4 G+ DART, JEOL, USA). The C, H, O, and N content of organic compound was determined using an elemental analyzer (Flash 2000, Thermo Scientific, USA). The surface topography was analyzed using AFM (Multimode V AFM, Veeco, USA). WCA measurements were performed using a goniometer (DSA100, KRÜSS, Germany). Droplets of ~5 µL were placed on the modified surfaces, and the WCA value was obtained as an average of at least five measurements.
3
Comprehensive Characterization of Graphene Materials
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The MLG and FLG material was characterized by Raman spectroscopy (Renishaw at 514 nm) and the AFM measurements were performed on a MultiMode V AFM (Veeco) in tapping mode under ambient conditions. RTESP silicon probes (Veeco) were used with a nominal tip radius of 10 nm and nominal spring constant of 40 N/m. Image processing was carried out using the Nanoscope software. The X-ray photoelectron spectroscopy (XPS) measurements were performed on a Theta Probe spectrometer (Thermo Electron Co., Germany) using monochromatic Al Kα radiation (photon energy of 15 keV with maximum energy resolution of 0.47 eV). High resolution spectra for the core level C 1s and O 1s were recorded in 0.05 eV steps. An electron flood gun was used during the measurements to prevent sample charging. The FLG material was also characterized by TEM, HRTEM (Jeol ARM at 80 kV) and helium ion microscopy (HeIM, Zeiss Orion at 30 kV). In addition, FLG-polymer A and E were characterized by Raman Spectroscopy (JY T6400 at 514 nm) and SEM (Zeiss Ultra-Plus at 3 kV, EsB grid at 503 V).
4
Nanoscopic Characterization of CNF Suspensions
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Suspension nanoscopic morphology was characterized by atomic force microscopy (AFM). Samples for AFM investigation were prepared in the following manner: CNF suspensions with a concentration of 0.02 wt% were prepared and sonicated for 2 min with an Elmasonic P 30 H (Singen, Germany), 37 kHz at 100% power. One droplet of the fibril suspension was then deposited onto a flat substrate. Most of the water was wicked away using a non-linting paper, and the sample was baked for 20 min at 85 °C. The substrate used for AFM samples was mica (grade V1 muscovite, Ted Pella, Redding, CA, USA). The mica was freshly cleaved and had been plasma treated (O2, 1 min) to activate the surface before droplet addition.
Images were acquired on a Veeco Multimode V AFM (NY, USA), using Nanoscope 8.15 software using an E-scanner (s/n 10054EVLR). Micrographs were recorded using Bruker's proprietary ScanAsyst tapping-mode. Scan rate was set to 0.888 Hz (CNF-L) and 0.977 Hz (CNF-H). At 1024 × 1024 pixels. The tip used was a Bruker ScanAsyst Fluid tip, reported to have a nominal tip radius of 20 nm and a maximal tip radius of26 60 nm.
Images were acquired on a Veeco Multimode V AFM (NY, USA), using Nanoscope 8.15 software using an E-scanner (s/n 10054EVLR). Micrographs were recorded using Bruker's proprietary ScanAsyst tapping-mode. Scan rate was set to 0.888 Hz (CNF-L) and 0.977 Hz (CNF-H). At 1024 × 1024 pixels. The tip used was a Bruker ScanAsyst Fluid tip, reported to have a nominal tip radius of 20 nm and a maximal tip radius of26 60 nm.
5
Thin Film Surface Morphology Analysis
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Atomic
force microscopy (AFM)
was performed using a Multimode V AFM (Veeco, Northern Ireland) in
tapping mode to examine the surface morphologies of the thin films.
Film thickness was measured using a Dektak 150 stylus profiler (Bruker).
force microscopy (AFM)
was performed using a Multimode V AFM (Veeco, Northern Ireland) in
tapping mode to examine the surface morphologies of the thin films.
Film thickness was measured using a Dektak 150 stylus profiler (Bruker).
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