Jem 3100f
The JEM-3100F is a field emission scanning electron microscope (FE-SEM) manufactured by JEOL. It is designed to provide high-resolution imaging of samples at the nanoscale level. The JEM-3100F utilizes a field emission gun to generate a high-brightness electron beam, enabling the microscope to achieve a high resolution and low-voltage imaging capabilities.
Lab products found in correlation
10 protocols using jem 3100f
Comprehensive Characterization of Biochar and ACs
Comprehensive Characterization of Hemp Stem-Derived Activated Carbons
Scanning and Transmission Electron Microscopy
Characterization of AgNPs and Bionanocomposite
Characterization of Au-decorated Semiconductors
capacity and the diffuse reflectance spectra over the wavelength range
of 300–800 nm were measured by ultraviolet–visible–near-infrared
spectrophotometry (UV–vis; Lambda 950, PerkinElmer). The crystallite
structure of all semiconductors was analyzed by X-ray diffractometry
(XRD; D2 Phaser, Bruker). The surface morphology and chemical composition
of the fresh semiconductors and Au-decorated semiconductors were primarily
observed via scanning electron microscopy (SEM; JSM-IT-500HR, JEOL)
with energy-dispersive X-ray spectrometry (EDX; JED-2300, JEOL) and
high-resolution transmission electron microscopy (HRTEM; JEM-3100F,
JEOL) with an accelerating voltage of 300 kV. The surface area, average
pore size, and total pore volume were examined using a Multipoint
Surface Area Analyzer (Tristar II3020, Micromeritics) via the Brunauer–Emmett–Teller
(BET) method. The bonding and chemical state of the elements were
determined with an X-ray photoelectron spectrometer (XPS; Axis Supra,
Kratos, U.K.) with a Delay Line detector (DLD) and a monochromatic
Al Kα (hν = 1486.6 eV) source. Accurate
binding energies (±0.1 eV) were established with respect to the
position of the adventitious carbon C 1s peak at 284.8 eV.
Characterization of Silver Nanoparticles
Multimodal Characterization of Cu-Ni Catalysts
patterns were obtained by an X-ray diffractometer (XRD: Bruker D8
ADVANCE) with Cu Kα radiation (λ = 1.54 Å) at 40
kV and 30 mA in the 2θ range from 5° to 90°. Nitrogen
physisorption measurements were obtained at −196 °C using
a Quantachrome Autosorb-1C analyzer to determine the specific surface
area. The pore size distribution was evaluated by BET and Barrett–Joyner–Halenda
methods. The amounts of loaded Cu–Ni metals were measured by
ICP–OES, (Aligent 700-ES series). XPS analysis was conducted
with monochromatic Al Kα radiation (hυ
= 1486.6 eV) on AXIS Ultra DLD (Kratos Analytical Ltd.), in order
to analyze the surface chemical compositions. The surface morphology
of the samples was assessed by a field-emission scanning electron
microscope (FE-SEM: JEOL, JSM-7600F), operating at 5 kV with Pt-coating
of the sample (thickness of ca. 2 nm). The nanostructure of the samples
was observed by a transmission electron microscope (TEM; JEOL JEM-3100F)
operating at 300 kV. Note that, the samples were prepared by dispersion
in ethanol solution through sonication and then coated on copper grids
having 200 mesh.
Surface Characterization of Ag-BDD Electrodes
Transfersomal Formulation Visualization
Comprehensive Material Characterization Protocol
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