Nova 600 nanolab fib

Manufactured by Thermo Fisher Scientific

Sourced in United States

The Nova 600 NanoLab FIB is a focused ion beam (FIB) system designed for sample preparation and analysis in a range of applications. It features a high-resolution ion beam for precise milling, imaging, and deposition capabilities. The system is capable of operating at low beam currents for sensitive samples.

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Lab products found in correlation

M 2000ui, by J.A. Woollam Co. (2 mentions) Dimension icon, by Bruker (2 mentions) Oca 15pro, by Dataphysics (1 mentions) Sirion microscope, by Thermo Fisher Scientific (1 mentions) Tecnai f20, by Thermo Fisher Scientific (1 mentions)

Spelling variants of this product

Nova 600 Nanolab (45 citations) Nanolab 600 (38 citations) Nova 600 (17 citations) Nova Nanolab 600 SEM/FIB (6 citations) Nova 600 Nanolab Dual-beam SEM/FIB (4 citations) FEI Nova NanoLab 600 FEG-SEM/FIB (2 citations)

2 protocols using nova 600 nanolab fib

Characterization of Deposited Gold Films

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The thickness of
the deposited Au
layers and formed gold oxide films was measured by ellipsometry (M-2000UI,
J.A. Woollam Co., United States) at an angle of 75°. The surface
roughness of the deposited Au layers was measured by atomic-force
microscopy (AFM, Dimension Icon, Bruker Corp., USA) with a contact
mode in air. HR-SEM images were captured with a high-resolution scanning
electron microscope (FEI Sirion, USA) at a 5 kV acceleration voltage
and a spot size of 3. The contact angles of a DI water drop on Au
surfaces were measured by using an interfacial tension meter (OCA
15 Pro, Dataphysics Instruments GmbH, Germany) at ambient temperature.
TEM specimens were prepared by using a focused ion beam (FIB) system
(FEI Nova 600 NanoLab FIB, USA). The TEM analysis was performed with
a Philips CM300ST-FEG TEM system (The Netherlands) at a 300 kV acceleration
voltage.

Le-The H., Tiggelaar R.M., Berenschot E., van den Berg A., Tas N, & Eijkel J.C. (2019). Postdeposition UV-Ozone Treatment: An Enabling Technique to Enhance the Direct Adhesion of Gold Thin Films to Oxidized Silicon. ACS Nano, 13(6), 6782-6789.

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Nanostructure Characterization by SEM, AFM, and TEM

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High resolution scanning electron microscope (HR-SEM) images were captured by using a FEI Sirion microscope at a 5 kV acceleration voltage and a spot size of 3. The surface topography of structures was measured by using an atomicforce microscopy (Dimension Icon, Bruker Corp.) in contact mode in air. The thickness of the sputtered Pt layers and the SiO 2 layers was measured by using an ellipsometer system (M-2000UI, J A Woollam Co.) at an angle of 75°. Sample for transmission electron microscopy (TEM) was prepared by using a focused ion beam (FIB) system (FEI Nova 600 NanoLab FIB). The TEM specimen was measured by using a TEM system (FEI Tecnai F20) at a 200 kV acceleration voltage.

Le-The H., Tregouet C., Kappl M., Müller M., Kirchhoff K., Lohse D., van den Berg A., Odijk M, & Eijkel J.C.T. (2019). Engulfment control of platinum nanoparticles into oxidized silicon substrates for fabrication of dense solid-state nanopore arrays. Nanotechnology, 30(6).

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