X pert pro pw 3040 60 diffractometer

X-ray diffraction analysis (XRD; X’Pert Pro PW3040/60 diffractometer, PANalytical, Eindhoven, Netherlands) was performed on MD-47.5B, DG-120, SG-625 and SG-800 powders to assess the microstructural features of the various materials and identify the presence of crystalline phases deriving from the thermal treatment. The analysis was performed using a Bragg–Brentano camera geometry with a Cu Kα incident radiation (wavelength λ = 0.15405 nm). The 2θ angle was varied in a range of 10°–70°; voltage and current were fixed at 40 kV and 30 mA, respectively. Step counting time for data acquisition was set at 1 s with a step size of 0.02°. Powder size for SG-625 and SG-800 was below 32 µm. Crystalline phases were identified by using X’Pert HighScore software 2.2b (PANalytical, Eindhoven, The Netherlands) equipped with the PCPDFWIN database.

The following characterization methods were used for the graphite oxides and graphene oxides: X-ray diffraction (XRD), X-ray photoelectron microscopy (XPS), Raman spectroscopy (RS), and elementary analysis.
For XRD measurements, the samples were deposited onto glass and analyzed using Cu Ka1 radiation, with a voltage of 45 kV and a current of 30 mA. In the experiments, an X’Pert PRO PW 3040/60 diffractometer (PANalytical, Quebec, Canada) was used. (exemplary spectra are shown in SI files, Figures S4 and S5).
In the XPS measurements, a PHI 500 VersaProbe spectrometer (Chigasaki, Japan) was used (Al Kα anode radiation beam: 1486.6 eV).
The Raman spectra were recorded using an N-TEGRA Spectra platform (NT-MDT, Eindhoven, the Netherlands). In the measurements, a laser beam with a 532 nm wavelength was used (the exposure time was 10 s). (Exemplary spectra are shown in SI files, Figures S2 and S3).
The elementary analysis results were obtained using a Vario Macro Cube automatic elementary analyzer (Elementar Analysysteme GmbH Company, Hanau, Germany).

OT through the rubrene films was performed by using a scanning monochromator (ARC SpecrroPro-500) with a tungsten-halogen lamp as the light source. After a long-pass filter of 400 nm to eliminate the higher-order components, the monochromatic light with wavelength varied from 700 to 450 nm was focused on the sample. The increment of each step was set to 2 nm and the corresponding resolution was ±1.5 nm. The optical transmittance intensity I_OT as well as the original incident light intensity I₀ was measured by an optometer (Graseby UDT S370) with wavelength correction. Then, the normalized OT spectrum was accomplished by dividing I_OT by I₀ at each photon energy position. PL spectrum was performed with exciting by a focused diode laser of 405 nm on the rubrene films. The collected luminescence was dispersed by a spectrometer (Jobin Yvon/Spex TRIAX 550) and detected with a photomultiplier tube. The wavelength was scanned from 700 to 520 nm with an increment of 0.4 nm and a resolution of ±0.3 nm. The temperature of the sample site during the OT and PL measurements was controlled by a cryostat system. The morphology and crystallinity of the as-deposited rubrene polycrystalline films were examined by using a JOEL JSM-6335F scanning electron microscopy and by X-ray diffraction analysis with a Panalytical X’Pert Pro PW 3040/60 diffractometer, respectively.