All the starting materials and reagents were commercially available. Mass spectrometry (MS) was undertaken on a Bruker ultrafleXtreme MALDI‐TOF. 1H NMR and 13C NMR spectra were obtained in a JNM‐ECZ600R/S1 spectrometer. Elemental analysis was acquired by Vario Micro cube analyzer. UV–vis spectra were obtained on SHIMADZU UV‐2700 spectrophotometer. Photoluminescence (PL) spectra, lifetimes, and fluorescence quantum yields were recorded on a FLS1000 fluorescence. Thermo gravimetric analysis (TGA) was completed by a TG 209F3 thermal analyzer (Netzsch) analyzer at a heating rate of 10 °C min−1 from 50 to 720 °C under the nitrogen atmosphere. Ultraviolet photoelectron spectrometer (UPS) measurements were completed KRATOS Axis Ultra DLD spectrometer with He I (h = 21.22 eV) as the excitation source. AFM images were carried out on Digital Instruments Nanoscope III atomic force microscope in air. Thin single crystals X‐Ray diffraction was measured in Rigaku D/max‐2500 X‐ray diffractometer. The theoretical calculation of 3,6‐DATT was performed with GAUSSIAN‐09 adopting density functional theory (DFT)/B3LYP methods. Microphotoluminescence spectroscopy and micro‐Raman measurements were recorded on RENISHAW in Via reflex. X‐ray diffraction intensity data were collected at RT and 395 K on a Rigaku Saturn724 CCD diffract meter.
D max 2500 x ray diffractometer
Manufactured by Rigaku
Sourced in Japan
The D/Max-2500 is an X-ray diffractometer manufactured by Rigaku. It is designed to perform X-ray diffraction analysis of materials. The instrument uses X-rays to characterize the atomic and molecular structure of a wide range of solid-state materials.
Automatically generated - may contain errors
Lab products found in correlation
S 4800 fesem, by Hitachi (4 mentions)
Cpl 200 spectrometer, by Jasco (2 mentions)
Axis ultra dld spectrometer, by Shimadzu (1 mentions)
Ultraflextreme maldi tof, by Bruker (1 mentions)
Uv 2700 spectrophotometer, by Shimadzu (1 mentions)
Tg 209f3 thermal analyzer, by Netzsch (1 mentions)
Avance 3 400 mhz spectrometer, by Bruker (1 mentions)
Ascend 400 mhz spectrometer, by Bruker (1 mentions)
F 4600 fluorescence spectrophotometer, by Hitachi (1 mentions)
Uv 550, by Jasco (1 mentions)
Absolute pl quantum yield spectrometer, by Hamamatsu Photonics (1 mentions)
F 4500 fluorescence spectrophotometer, by Hitachi (1 mentions)
Nano zs zetasizer, by Malvern Panalytical (1 mentions)
Multimode 8 atomic force microscope, by Bruker (1 mentions)
4155c semiconductor parameter analyzer, by Agilent Technologies (1 mentions)
Usb2000 spectrometer, by OceanOptics (1 mentions)
Innova atomic force microscope, by Bruker (1 mentions)
Crossbeam scanning electron microscope, by Zeiss (1 mentions)
Escalab 250xi photoelectron spectrometer, by Thermo Fisher Scientific (1 mentions)
F 7000 fluorescence spectrophotometer, by Hitachi (1 mentions)
30 protocols using d max 2500 x ray diffractometer
1
Characterization of 3,6-DATT Compound
2
X-ray Diffraction Analysis of Starch Crystallinity
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XRD analysis was performed according to the method of Qiao (Qiao et al., 2017 ), with a slight modification. The crystal structure of starch samples was determined using a D/MAX2500 X-ray diffractometer (Rigaku Corporation) with Cu Kα radiation of 40 kV and 30 mA. The scanning angle was in the range of 4–45°, and the scanning rate was 5°/min. The relative crystallinity (RC) of samples was calculated using the following equation:
where IC and IA are the cumulative diffraction intensities of the crystalline and amorphous regions of the sample on the diffractogram, respectively.
where IC and IA are the cumulative diffraction intensities of the crystalline and amorphous regions of the sample on the diffractogram, respectively.
3
Characterization of Multifunctional G4-Hydrogels
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For XRD, hydrogels were lyophilized and data were recorded on a D/Max‐2500 X‐ray diffractometer (Rigaku, Tokyo, Japan) with Cu Kα radiation. FTIR spectra of lyophilized hydrogels in KBr tablet (1:100) were collected on an FTS 6000 FTIR instrument (Bio‐Rad, Hercules, California, America) using 128 scans at 8 cm−1 resolution. NMR spectra of the hydrogels were taken at 25 °C in deuterated water (D2O) using a Bruker Avance III 400 MHz spectrometer (for 1H NMR spectra) and an Ascend 400 MHz spectrometer (for 11B NMR spectra) (both were from Bruker, Fällanden, Switzerland). Binding of hemin to G‐quartets in G4‐hydrogels was demonstrated using a Hitachi F‐4600 fluorescence spectrophotometer (Tokyo, Japan) at 410 nm excitation and emission collection between 575 and 750 nm. For SEM, lyophilized hydrogels were put on conductive tape and sputter‐coated with gold for imaging. SEM images were taken on a JSM‐7500F field emission microscope (JEOL Ltd, Tokyo, Japan).
4
Comprehensive Characterization of Nanostructures
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Scanning electron microscopy (SEM) was performed on a Hitachi S-4800 FE-SEM with an accelerating voltage of 10 kV. Before SEM measurements, the samples on silicon wafers were coated with a thin layer of Pt to increase the contrast. UV-Vis, CD and LD spectra were obtained using JASCO UV-550 and JASCO J-810 spectrometers, respectively. CPL measurements were performed with a JASCO CPL-200 spectrometer. 0.1 mm cuvettes were used for measuring the UV-Vis, CD, LD and CPL spectra of samples. For the measurement of CD spectra, the cuvette was placed perpendicularly to the light path of the CD spectrometer and rotated within the cuvette plane, in order to rule out the possibility of birefringence phenomena and eliminate the possible angle dependence of the CD signals. Fluorescence spectra were recorded on a Hitachi F-4500 fluorescence spectrophotometer. The absolute fluorescence quantum yield was measured by using an absolute PL quantum yield spectrometer (Hamamatsu Photonics) with a calibrated integrating sphere. X-ray diffraction (XRD) analysis was performed on a Rigaku D/Max-2500 X-ray diffractometer (Japan) with CuKα radiation (λ = 1.5406 Å), which was operated at a voltage of 40 kV and a current of 200 mA.
5
Characterization of 3D Printed MXene Structures
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Morphologies of the printed structure were observed with a Hitachi S4700 field emission scanning electron microscope (SEM). Few layered MXene sheets were evaluated by a Hitachi 7700 transmission electron microscope (TEM) and a Bruker multi-mode 8 atomic force microscope (AFM). Rheological behaviors of the inks were tested on an Anton Paar MCR302 rheometer equipped with a 40-mm tape parallel plate geometry (1.985°, cutoff gap of 50 µm) at 25 °C. Before the rheology tests, all inks were defoamed by centrifuging. Zeta potentials of MXene, AlCl3/HCl solution and the aqueous dispersion of AlOOH were measured with a Malvern Nano-ZS Zetasizer. MXene, MA, and MG were characterized by a Thermo Fisher ESCALAB 250 X-ray photoelectron spectroscope (XPS) and a Rigaku D/Max 2500 X-ray diffractometer (XRD). Electrical conductivities of the 3D printed skeletons were measured with a Four Probes RST-8 resistivity meter (China). The infrared images were obtained using a FLIR-H16 thermal imager (HikVision). EMI shielding performances were measured with a Keysight N5224B PNA series vector network analyzer (VNA) in the frequency range from 8.2 to 12.4 GHz. All the samples for the EMI shielding measurements were directly printed to conform the shape of the X-band waveguide cavity.
6
Characterization of NiOx and CdSe QDs
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The top-view
and cross-sectional micrographs of the NiOx surface and
fabricated devices were investigated with an ultra-high-resolution
ZEISS Crossbeam scanning electron microscope. The surface morphology
and roughness of the NiOx thin film and NPLs were studied
using a Bruker Innova atomic force microscope. The absorption and
PL spectra of CdSe QDs were recorded with a Princeton Instruments
Acton 2150 spectrophotometer equipped with a Xe lamp as the light
source. The UPS measurements for the NiOx films and NPLs
were performed on a Thermo VG-Scientific/Sigma Probe spectrometer.
A He I (hν = 21.22 eV) discharge lamp was used
as the excitation source. The XPS measurements were conducted on a
Thermo K-Alpha X-ray photoelectron spectrometer for elemental composition
analysis of NiOx. The XRD patterns and crystallinity of
NiOx were measured using a Rigaku D/MAX2500 X-ray diffractometer.
The current density–voltage characteristics of hole- and electron-only
devices were measured using an Agilent 4155C semiconductor parameter
analyzer. The performance and electroluminescence spectra of QLEDs
were recorded using an Agilent 4155C semiconductor parameter analyzer
and an Ocean Optics USB2000+ spectrometer.
and cross-sectional micrographs of the NiOx surface and
fabricated devices were investigated with an ultra-high-resolution
ZEISS Crossbeam scanning electron microscope. The surface morphology
and roughness of the NiOx thin film and NPLs were studied
using a Bruker Innova atomic force microscope. The absorption and
PL spectra of CdSe QDs were recorded with a Princeton Instruments
Acton 2150 spectrophotometer equipped with a Xe lamp as the light
source. The UPS measurements for the NiOx films and NPLs
were performed on a Thermo VG-Scientific/Sigma Probe spectrometer.
A He I (hν = 21.22 eV) discharge lamp was used
as the excitation source. The XPS measurements were conducted on a
Thermo K-Alpha X-ray photoelectron spectrometer for elemental composition
analysis of NiOx. The XRD patterns and crystallinity of
NiOx were measured using a Rigaku D/MAX2500 X-ray diffractometer.
The current density–voltage characteristics of hole- and electron-only
devices were measured using an Agilent 4155C semiconductor parameter
analyzer. The performance and electroluminescence spectra of QLEDs
were recorded using an Agilent 4155C semiconductor parameter analyzer
and an Ocean Optics USB2000+ spectrometer.
7
PXRD Analysis of Dried Samples
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PXRD analysis was performed on a Rigaku D/Max-2500 X-ray diffractometer with Cu/Kα radiation (λ = 1.5406 Å), which was operated at a voltage of 40 kV and a current of 200 mA. Samples were prepared on single-crystal silicon wafer and vacuum dried for PXRD testing.
8
Comprehensive Characterization of Photocatalytic Materials
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X-ray diffraction (XRD) measurements were performed on a Rigaku D/Max-2500 X-ray diffractometer using Cu Kα radiation. The chemical structure and component of all sample were analyzed by Fourier transform infrared spectroscopy (FT-IR) (Bruker TENSOR27, Germany) and X-ray photoelectron spectroscopy (XPS) (Thermo Fisher ESCALAB 250Xi photoelectron spectrometer), respectively. Field emission scanning electron microscopy (FE-SEM) was conducted using a JSM-6490LV scanning electron microscope. Transmission electron microscopy (TEM) measurements were performed using a JEOL JSM-6490L V system. The UV-Visible photocatalytic apparatus used in this work is Japan model Hitachi U-3900H UV-Visible Spectrometer. The N2 adsorption–desorption isotherms were conducted using a Micromeritics 3Flex surface area and pore size analyzer with a liquid nitrogen at the temperature of 77 K. The specific surface area was calculated by the Brunauer–Emmett–Teller (BET) method. Photoluminescence (PL) spectra were recorded on a Hitachi F-7000 fluorescence spectrophotometer.
9
Characterization of Nanocatalyst Materials
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Scanning electron microscopy (SEM) was performed on a NovaNano SEM 450/FEI. For SEM analysis, a few drops of the colloidal solutions were placed on the small pieces (5 mm × 5 mm) of a silicon wafer, followed by drying in air. Transmission electron microscopy (TEM) images were obtained using a F200/JEOL operated at 200 kV. The TEM samples were prepared by placing a few drops of the colloidal solutions on nickel grids coated with formvar carbon film (Ted Pella, Inc.). The X-ray diffraction (XRD) patterns of the nanocatalyst were used to identify peak shape and crystallinity on a high-power (9 kW) powder X-ray diffractometer. A Rigaku D/MAX-2500 X-ray diffractometer with Cu Kα radiation was used for phase analysis. All diffraction patterns were collected at 2θ values between 20° and 80° using a step size of 3° min−1. The crystallite sizes were estimated from the XRD using Scherrer equation: L = Kλ/β cos θ, where L is the average particle (crystallite) size, K is the Scherrer constant related to the shape and index (hkl) of the crystals, λ is the wavelength (0.15406 nm) of the X-rays, β is the value of full width at half maximum (FWHM) of the peak in radians, and θ is the Bragg angle. The N2 sorption isotherms were measured at −196 °C with a TriStar II 3020 surface area analyzer. Before measurement, the samples were degassed in a vacuum at 150 °C for 4 h.
10
Structural and Spectroscopic Characterization
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X-ray diffraction patterns (XRDs) were collected by using powder XRD (Rigaku D/MAX-2500 X-ray diffractometer, with Cu Kα1 radiation λ = 0.154056 nm 40 kV and 40 mA, scanning from 10° to 70°). The microtopography of the synthesized materials was recorded with scanning electron microscopy (SEM, JSM-6700F) and high-resolution transmission electron microscopy (HRTEM, JEM-2100F, Japan). The high-resolution TEM and high-angle annular dark-field scanning TEM (HAADF-STEM) images were recorded on an FEI Tecnai G2 F20 S-Twin high-resolution transmission electron microscope (HRTEM; Hillsboro, OR, United States) set at 200 kV, and a JEOL JEM-ARM300F TEM/STEM (Tokyo, Japan), respectively, with a spherical aberration corrector worked at 300 kV. Through-focal HAADF series were acquired at nanometer intervals, with the first image under-focused (beyond the beam exit surface) and the final image over-focused (before the beam entrance surface). Then, the images were aligned manually to remove the sample drift effects. Electron paramagnetic resonance (EPR) spectra were recorded on a Bruker CW Elexsys E500 spectrometer by applying an X-band (9.4 GHz) microwave with sweeping magnetic field at room temperature.
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