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H7650 microscopy

Manufactured by Hitachi
Sourced in China

The Hitachi H7650 is a transmission electron microscope designed for high-resolution imaging and analysis. It features a LaB6 electron gun and advanced optics to deliver clear, detailed images of samples at the nanoscale level. The H7650 is capable of operating at accelerating voltages up to 120 kV and can achieve a maximum resolution of 0.2 nm.

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2 protocols using h7650 microscopy

1

Ischemic Penumbra Ultrastructural Analysis

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For electron microscopy scanning, three small tissue blocks about 1 mm3 in the ischemic penumbra around the region of ischemic necrosis in the right brain were taken and fixed in 2% osmic acid solution. After immersion in 0.2 M phosphate buffer for 10 min×3, the samples were fixed in 2% osmic acid solution at 4°C until embedding. Ultrathin sections were 0.5 mm2and100 nm thick. All of the microscopy images were obtained by a H7650 microscopy (Hitachi, China).
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2

Comprehensive Characterization of Novel Materials

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The samples were characterized by X-ray powder diffraction (XRD, performed on a Philips X'pert PRO X-ray diffractometer, Cu Kα, λ = 1.54182 Å). Absorption spectra were collected using a spectrophotometer (Shimadzu SolidSpec-3700DUV). SEM was recorded on a JEOL JSM-6700F microscopy. TEM was collected using a Hitachi H-7650 microscopy. Raman spectra were taken at room temperature using an inVia Raman Microscope (Renishaw) with 785 nm incident laser excitation. HRTEM, SAED, HAADF-STEM and corresponding STEM-EDX analyses were done on a JEOL JEM-ARF200F TEM/STEM with a spherical aberration corrector. Wide angle X-ray scattering (WAXS) detection was characterized at the BL14B station of Shanghai Synchrotron Radiation Facility (SSRF) with X-ray photon energy of 18 keV (λ = 0.6887 Å).
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