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Ts2 s sm inverted microscope

Manufactured by Nikon
Sourced in United States

The TS2-S-SM inverted microscope is a laboratory equipment designed for optical microscopy. It features an inverted configuration, wherein the objective lens is positioned below the specimen stage. The microscope is intended for various applications that require high-quality imaging and observation of samples.

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2 protocols using ts2 s sm inverted microscope

1

Wound Healing Assay for Cancer Cells

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HCT116 and HT29 cells in the logarithmic phase were used after trypsin digestion and inoculated into a 6-well plate at a density of 6 × 105 cells per well of 2 ml. The cell fusion rate was close to 100% after 24 h of incubation. A 20-μl pipette tip was used to make vertical scratches on the bottom of the 6-well plate (3 strips per well). Then, the plate was washed three times with PBS solution. Following that, a serum-freedrug-containing medium was added for continued incubation. Finally, images were collected at the appropriate time using a Nikon TS2-S-SM inverted microscope and then processed using ImageJ software (version 8.0, Madison, WI, USA) to calculate the proportion of cell-free area in the treated group versus the control groups [16 (link), 17 (link)].
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2

Scratch Wound Healing Assay

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During the logarithmic growth stage, HCT116 and HT29 cells were inoculated in one 6-well plate (1 × 106 cells per well). The cells were transfected when the growth density was 40-50%, and replaced with complete culture medium after 6 h. When the cell confluence was approximately 90%, a 10 μl pipette tip was adopted with a view to making the vertical scratches on the bottom of that plate. Next, that plate was rinsed 3 times using PBS solution. Then, 2 mL of serum-free, fresh medium was placed for continuous hatching. Photographs were taken 48 h later via one Nikon TS2-S-SM inverted microscope and handled by means of ImageJ software to calculate the healing rates of cells in both groups, where the healing ratio (%) = (scratch spacing at 0 h - scratch spacing at 24/48 h) / scratch spacing at 0 h × 100%.
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