Tem grid
TEM grids are sample holders used in transmission electron microscopy (TEM) to support thin specimens for imaging and analysis. They provide a stable and controlled environment for the specimen during the TEM imaging process. TEM grids are available in various materials, sizes, and grid patterns to accommodate different sample types and TEM requirements.
Lab products found in correlation
44 protocols using tem grid
Synthesis of Silver Nanoparticles
Particle Size Analysis of ENMs via TEM
Synthesis of Multimodal Nanoparticles
Imaging ENP Nanoparticles using TEM
Exosome Visualization via TEM
Comprehensive Nanoparticle Characterization Methods
Low-Resolution TEM Imaging Protocol
Cu Thin Film Deposition on SiO2
with native oxides were prepared by Intel Co. Electron-beam evaporation
was performed to deposit 7.7 ± 0.1 nm thick Cu films onto SiO2 substrates. For patterning, 400 mesh TEM grids (Ted Pella,
Inc., USA) were used as deposition masks. Cu was evaporated in a vacuum
with a base pressure below 4 × 10–6 Torr (
0.5 wt % potassium hydroxide (KOH) solution at room temperature for
5 min and then sonicated by 70% ethanol solution (Fisher Scientific,
USA) and DI water for 10 min.
Binary Superlattice Formation via Solvent Evaporation
approach, whereby the NC solution was slowly evaporated over a tilted
support. TEM grids (F/C-coated, Ted Pella, with the Formvar layer
removed by immersing the grid in toluene for 10 s) or SiN membranes
(Agar Scientific, Norcada) were employed as the substrates. A coassembly
was carried out by placing the NC mixture in toluene (30–35
μL) into a 2 mL vial with solid support inside. The vial was
then positioned tilted in the vacuum chamber (pressure ∼0.5
bar, room temperature), where it was left until all solvent evaporated.
The mixtures contained overall NC concentrations in the 0.8–1
μM range. For binary ABO6-type SL, 5.3 nm CsPbBr3 NCs (9.6 μM, 3 μL), 17.6 nm CsPbBr3 NCs (0.9 μM, 4 μL), and anhydrous toluene (25 μL)
were used. For NaCl-type SL, a lower small-to-large NC number ratio
was employed: 5.3 nm CsPbBr3 NCs (9.6 μM, 2 μL),
17.6 nm CsPbBr3 NCs (1.3 μM, 6.2 μL), and anhydrous
toluene (25 μL). For binary ABO3-type SL, larger
8.0 nm CsPbBr3 NCs (10.1 μM, 3 μL) were utilized
together with 17.6 nm CsPbBr3 NCs (1.1 μM, 5 μL),
and anhydrous toluene (25 μL).
Characterization of Bi2-xSbxTe3 Nanowires
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