K alpha x ray photoelectron spectrometer system
The K-Alpha X-ray photoelectron spectrometer system is a laboratory instrument designed for surface analysis. It uses X-ray photoelectron spectroscopy (XPS) to determine the chemical composition and electronic state of the surface of a material. The system provides quantitative information about the elements present on the surface, their chemical states, and the relative concentrations of those elements.
Lab products found in correlation
12 protocols using k alpha x ray photoelectron spectrometer system
Analytical Characterization of Silver Nanoparticles
Comprehensive Surface Characterization of Carbon Fibers
Surface topography of the samples was investigated by using a Hitachi S4500 scanning electron microscope by applying an accelerating voltage of 15 kV; the Au/Pd coating was deposited with a Hitachi E1030 ion sputter for 40 s (Hitachi, Ltd., Tokyo, Japan). Field‐emission scanning electron microscopy (FE‐SEM) experiment was also performed with a JSM‐7610F and an accelerating voltage of 15 kV (JEOL, Tokyo, Japan). The FE‐SEM system was coupled with a JEOL EX‐230**BU EX‐37001 energy‐dispersive X‐ray analyzer, which enabled us to record the energy‐dispersive X‐ray spectrum and to carry out chemical mapping experiments.
X-ray Photoelectron Spectroscopy and SEM Characterization
Morphological analysis was performed with a JSM-7610F field emission scanning electron microscope (FE-SEM) applying 8 mm working distance and 15 kV accelerating voltage (JEOL, Tokyo, Japan). Prior to the analysis, Au/Pd layer was sputtered on the sample surface using a Hitachi E1030 type equipment and a deposition time of 40 s (Hitachi, Ltd., Tokyo, Japan).
Characterization of ZPP Nanoparticles
Amination of Galactomannan Biopolymers
Characterization of CdSe Nanoparticles
Electrode Surface Characterization by SEM, XPS, and ECSA
Where Rf is the roughness factor normalized by the Cu foil and S stands for the ideal surface area of smooth Cu foil electrode (1 cm2). The roughness factor was estimated by normalizing the double-layer capacitance Cdl to that of a Cu foil. The Cdl was determined by measuring the capacitive current in the non-faradaic potential region under various scan rates of cyclic voltammetry(10 mV s−1, 20 mV s−1, 40 mV s−1, 60 mV s−1, 80 mV s−1and 100 mV s−1). The Cdl was obtained by plotting the capacitive current against the scan rates.
Characterization of Graphene Oxide Cathodes
Multifaceted Characterization of Graphene Nanoplatelet Composites
XPS Analysis of Plasma-Treated PHB/PHBV Films
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