To study the microstructure and morphology of the PSCP@Ag-FeS arrays, we obtained images using scanning electron microscopy (SEM, JEOL 6500F) (JEOL, Tokyo, Japan) at an accelerating voltage of 200 kV. UV-Vis absorption spectra of the PSCP@Ag-FeS arrays were recorded on a Shimadzu UV-3600 UV-Vis spectrometer (Shimadzu, Kyoto, Japan). To measure the elemental composition and chemical state of PSCP@Ag-FeS, X-ray photoelectron spectroscopy (XPS) measurements were performed using a Thermo Scientific ESCALAB 250Xi A1440 system (Thermo Fisher Scientific, Waltham, MA, USA) with Al Kα as the X-ray source and the XPS spectra were referenced to carbon (C 1s = 284.6 eV). The Raman spectra were measured utilizing Ar+ ion laser excitation in a Renishaw Raman System 2000 spectrometer (Renishaw, London, UK) with a confocal microscope. The PSCP@Ag-FeS ordered arrays prepared by the above cosputtering method were immersed in MB solution at a concentration of 10−3 mol/L for 3 h and the Raman spectra of the PSCP@Ag-FeS-MB assemblies were acquired at an excitation wavelength of 514 nm. Throughout the experiment, all chemicals were used as received without further purification.
Escalab 250xi a1440 system
Manufactured by Thermo Fisher Scientific
Sourced in United States
The ESCALAB 250Xi A1440 is a high-performance X-ray photoelectron spectroscopy (XPS) system designed for advanced surface analysis. It provides accurate and reliable data for a wide range of materials and applications.
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Lab products found in correlation
4 protocols using escalab 250xi a1440 system
1
Characterizing PSCP@Ag-FeS Array Microstructure
2
Comprehensive Photocatalyst Characterization
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Textural, structural, optical, and electronic properties of all photocatalysts were characterized in detail by nitrogen physisorption [22 (link),23 (link)], powder X-ray diffraction (XRD) [22 (link),23 (link)], X-ray fluorescence (XRF) [20 (link)], diffuse reflectance UV-vis spectroscopy (DRS UV-Vis) [22 (link),24 (link)], X-ray photoelectron spectroscopy (XPS) [22 (link)], and photoelectrochemical measurements [23 (link)] (see Supplementary Materials ). Chemical components and the binding energies of CdS/CN were analyzed by XPS (Thermo Scientific ESCALAB 250Xi A1440 system, Waltham, MA, USA). Electrochemical impedance spectroscopy (EIS) analysis was measured by using a CHI 760E electrochemical workstation.
3
Characterization of Nanostructured Materials
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The chemical compositions of the samples were characterized by X-ray photoelectron spectroscopy (XPS, Thermo Scientific ESCALAB 250Xi A1440 system, Thermo Fisher Scientific, Waltham, MA, USA). Transmission electron microscopy (TEM) images were obtained using a Hitachi H-800 (JEOL 2100, JEOL Ltd., Tokyo, Japan) transmission electron microscopy at an acceleration voltage of 200 kV. The UV-Vis absorption spectra and catalytic properties were monitored using a SHIMADZU 3600 spectrometer (Shimadzu Corporation, Tokyo, Japan).
4
Comprehensive Structural and Optical Characterization of ZnO Nanostructures
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The X-ray diffraction patterns (XRD) of the as-prepared samples were measured on a D/max-2500 copper rotating-anode X-ray diffractometer (Rigaku Corporation, Tokyo, Japan) with Cu Kα radiation of wavelength λ = 1.5406Å (40 kV, 200 mA). The surface morphologies of the as-prepared samples were characterized by a field emission scanning electron microscope (FESEM, 7800F, JEOL Ltd., Tokyo, Japan), and the elemental composition was estimated by energy-dispersive X-ray spectroscopy (EDX) (JEOL Ltd., Tokyo, Japan). Transmission electron micrographs (TEM) and high-resolution transmission electron microscopy (HRTEM) images were taken on a FEI Tenai G2 F20 electron microscope (JEOL Ltd., Tokyo, Japan) equipped with an X-ray energy dispersive spectrometer (EDS) (JEOL Ltd., Tokyo, Japan). Chemical components and the binding energies of ZnO NNs and the ZnO@Cu2S NMSHs were analyzed by X-ray photoelectron spectroscopy (XPS) (Thermo Scientific ESCALAB 250Xi A1440 system, Thermo Fisher Scientific, Waltham, MA, USA). Photoluminescence (PL) spectra were investigated at room temperature on a Renishaw in Via micro-PL spectrometer (Renishaw, London, UK) at room temperature (λex = 325 nm, He-Cd laser). The UV-Vis diffuse reflection spectra (DRS) of the samples (S0-S4) were measured by an UV-Vis spectrophotometer (UV-5800PC, Shanghai Metash Instruments Co., Ltd., Tokyo, Japan).
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