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Smartlab xrd system

Manufactured by Rigaku
Sourced in Japan

The SmartLab XRD system is a versatile X-ray diffractometer designed for materials analysis. It features an advanced optical system and software-controlled components to enable automated, high-precision measurements of crystalline structures and properties.

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4 protocols using smartlab xrd system

1

Characterization of Chitin Catalysts by Advanced Techniques

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The amount of carbon in the chitin reactant was determined with an elemental analyzer (PerkinElmer 2400 II).
The X‐ray diffraction (XRD) patterns of the catalysts and the reactants were measured on a Rigaku SmartLab XRD system with Cu Kα radiation in the 2θ range of 5–90°.
Thermogravimetry‐differential thermal analysis (TG‐DTA) of the catalysts after the reaction was carried out on a Thermo plus EVO2 TG‐DTA8122 (Rigaku) instrument at a heating rate of 10 K min−1 in flowing dry air. During TG analysis, real‐time images of the samples were recorded with the optional direct monitoring system of the TG‐DTA instrument.
The concentration of magnesium species in the liquid fraction was determined by means of inductively coupled plasma atomic emission spectrometry (SPS4000, SII NanoTechnology).
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2

Quantitative Analysis of Polypropylene Crystallinity

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A Rigaku SmartLab XRD system was adopted to study the crystalline structure of iPP samples. The wavelength is set as 1.5418 Å, the voltage as 40 kV, and the current as 40 mA. XRD pattern was recorded over angles ranging from 10° to 35° with a scan rate of 4 °/min. The relative content of β-crystal, Kβ, could be calculated using Tuner–Jones formula [29 (link)].
Kβ=Aβ(300)Aβ(300)+Aα(110)+Aα(040)+Aα(130),
where Aβ(300) represents the diffraction intensity of β(300) plane at diffraction angle 2θ = 16.1°. Aα(110) , Aα(040) , and Aα(130) represent the diffraction intensities of α(110), α(040), and α(130) planes at diffraction angles 2θ = 14.1°, 16.9°, and 18.5° in the XRD pattern, respectively.
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3

Characterization of TiO2/Ti Thin Film Sensors

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The X-ray diffraction (XRD) measurement for TiO2/Ti was performed by using a SmartLab XRD system (Rigaku, Tokyo, Japan). The thickness of the TiO2 on the Ti substrate was measured by using a SE-2000 spectroscopic ellipsometer (Semilab Japan, Tokyo, Japan). The EGFET in this study was assembled by using a 2N7000 N-channel enhancement-type MOSFET (ON Semiconductor, Phoenix, AZ, USA). The pH and glucose measurements of our EGFETs were performed by using an RE-1B Ag/AgCl reference electrode (ALS, Tokyo, Japan) and a B1500A semiconductor device analyzer (Keysight, Tokyo, Japan). The pH change in the PBS during measurement was monitored by using an AT-610ST titrator equipped with a C171 glass electrode (Kyoto Electronics, Kyoto, Japan). The thickness, roughness, optical absorption, and surface morphology of the SF membrane were measured by using a DektakXTS-0K1704 stylus-type step profiler (Bruker Japan, Kanagawa, Japan), an SPM9700 atomic force microscope (AFM) (Shimazu, Kyoto, Japan), an FTIR-8400S Fourier transform infrared spectrometer (FTIR) with a DRS-8000A diffuse reflector (Shimazu, Kyoto, Japan), and a VE8800 scanning electron microscope (SEM) (Keyence, Osaka, Japan), respectively.
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4

Characterization of Polymer-Coated LATP

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The structure and morphology of the synthesized and (PAA/PEO)30 coated LATP were investigated by using an X-ray diffractometer (XRD, Rigaku SmartLab XRD system) equipped with a Cu X-ray tube, a D-Tex detector and a scanning electron microscope (SEM, Crossbeam 540, FeSEM Auriga). The thickness of the layer was measured using an ellipsometer (SENresearch 4.0, Sentech) and the polymers were coated on one side of a polished Si wafer.
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