Dimultimode 5 spm

The microscopy analysis at each sequential step such as the pre-PANI shield, the catalyst layer at the pre-PANI, post-PANI shield and the final SCBM (including elemental mapping) was performed using field-emission scanning electron microscope (FE-SEM, GeminiSEM 500, ZEISS, Germany) with energy dispersive spectroscopy detector (EDS, Silicon Drift Detector (SDD)-X-MaxN, OXFORD). The surface morphology at pre- and post-PANI shields and the catalyst layer was also investigated using an atomic force microscope in tapping mode (AFM, DI MultiMode V SPM, Veeco Instruments Inc. UK). For clearer interpretation, the resulting topographic height data was processed using NanoScope Analysis software 1.8 (Bruker Corporation, USA).

The arrangement of PS spheres and the patterned pillars are observed by SEM (Zeiss Sigma). The surface morphologies of self-assembled Ge nanostructures on Si pillars are investigated ex-situ by AFM (Veeco DI Multimode V SPM) in a tapping mode. XTEM was performed on a FEI TECNAI G² S-TWIN F20 operating at 200 kV.