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Field emission gun

Manufactured by JEOL
Sourced in Japan

A field emission gun is an electron source that uses a strong electric field to extract and accelerate electrons from a sharp-tipped cathode. It provides a high-brightness, coherent electron beam for applications that require high-resolution imaging and analysis, such as in scanning electron microscopes and transmission electron microscopes.

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3 protocols using field emission gun

1

Characterization of Fluorescent Graphene Quantum Dots

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High-resolution
transmission electron microscopy (HR-TEM) images of the FGQD samples
were captured using a JEM-2100F transmission electron microscope equipped
with a field emission gun (200 kV; JEOL). XPS profiles were recorded
for both the samples using a VG ESCALAB 220i-XL system (Thermo Fisher
Scientific, Waltham). XPS and high-resolution scans were performed
at pass energies of 100 and 20 eV, respectively, and at an X-ray beam
size of approximately 100 μm. FGQD samples for XPS measurement
were prepared on a silicon substrate by the spin-coating method with
the rotation speed adjusted to 2000 rpm. The samples were dried overnight
in a vacuum oven at 80 °C prior to the measurements. Room-temperature
PL spectra were recorded using a PL spectrophotometer (FluoroMax Plus
fitted with 150 W xenon arc lamp, HORIBA, Kyoto, Japan) in the wavelength
range of 300–800 nm. The PL emission spectra were recorded
at excitation wavelengths of 400, 450, and 500 nm. The above experimental
details are as per our previously published work.31 (link)
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2

In-situ TEM Mechanical Characterization of MoS2

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TEM experiments were recorded in
a JEOL 2010 equipped with a field emission gun operated at 200 kV.
Minimum exposure was ensured to minimize beam damage to the MoS2 sheets. MoS2 were synthesized as described in
ref (17 ), diluted in
ethanol, and drop casted onto a 0.25 mm gold wire of 1 cm in length,
which was then mounted on to a brass cap, to finally mount it in an
AFM-TEM holder from Nanofactory AB as shown in Figure S1, Supporting Information. This holder features
a Si cantilever with a sharp tip used to apply a load to the sample,
while the process is recorded live in the microscope. The brass cap
sits in a piezoelectric used to move the desired region close to the
Si tip and perform the experiments. Micrographs were recorded in a
bottom-mounted AMT CCD with an exposure time of 0.1 s. The load applied
to the sample is estimated by measuring the deflection and multiplying
it by the spring constant of the cantilever (2.3 N/m), then the stress
can be computed by estimating the area of contact from the micrographs
and dividing the applied load by the area of contact.
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3

Characterization of SWCNT Fibers

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Two different types of pristine (non-functional) SWCNT fibers (Lot No. HT0209-DA000 and HT0209-SA001, called SWCNT1 and SWCNT2, respectively) were obtained from Zeon Corporation (Tokyo, Japan). The surface areas were 1,100 and 650 m3/g, respectively. For transmission electron microscopy analyses, SWCNTs suspended in ethanol via vigorous sonication were spread directly over a copper grid with a plastic mesh and a carbon coat (Cat. No. 653; Nisshin EM). After drying, the fibers were analyzed. High-resolution transmission electron microscopy (HRTEM) images were obtained with a JEM-2100F high-resolution transmission electron microscope with a field emission gun (JEOL, Japan) operated at 80 keV under a pressure of <10−6 Pa at room temperature.
MWCNTs were also used as positive (MWCNT-50) and negative (MWCNT-tngl) controls. These fibers were previously fully characterized.13 ) Briefly, MWCNT-50 has a diameter of 50 nm and is highly inflammogenic and highly carcinogenic, whereas MWCNT-tngl has a diameter of 15 nm, is scarcely inflammogenic and induces no MM.14 )
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