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Phi 5400 spectrometer

Manufactured by PerkinElmer

The PHI-5400 spectrometer is a versatile analytical instrument used for surface analysis. It employs X-ray photoelectron spectroscopy (XPS) to provide information about the chemical composition and electronic state of the surface of a sample.

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2 protocols using phi 5400 spectrometer

1

Comprehensive Materials Characterization Protocol

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XRD patterns were recorded on a Rigaku D/max2550VL/PC system, using Cu Kα radiation. SEM (JEOL JSM-6360LV, 15 kV), TEM and HRTEM (JEOL 2010, 200 kV) were used to observe the morphology of the samples. Nitrogen adsorption measurements were performed at 77 K on a Micromeritics ASAP 2020. BET specific surface area was calculated using the P/P0 data between 0.10 and 0.25. Raman spectra were collected on a Renishaw in Via Raman microscope. TGA was conducted on a Perkin-Elmer TGA-7 Thermal Analyzer under O2 flow, with a heating rate of 20 °C min−1. XPS spactra were recorded on a Perkin-Elmer PHI-5400 spectrometer, using Mg Kα radiation as the excitation source.
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2

Comprehensive Characterization of Nanomaterials

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XRD patterns were recorded on a Rigaku D/max2550VL/PC system, using Cu Kα radiation. DLS measurements were operated on Malvern Zetasizer Nano ZS. SEM (JEOL JSM-6360LV, 15 kV), TEM and HRTEM (JEOL 2010, 200 kV) were used to observe the morphology of the samples. Nitrogen adsorption measurements were performed at 77 K on a Micromeritics ASAP 2020. UV-vis absorption spectra were measured on a Perkin-Elmer 330 spectrophotometer. Raman spectra were collected on a Renishaw in Via Raman microscope. TGA was conducted on a Perkin-Elmer TGA-7 Thermal Analyzer under O2 flow, with a heating rate of 20 °C min−1. XPS spactra were recorded on a Perkin-Elmer PHI-5400 spectrometer, using Mg Kα radiation as the excitation source.
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