Agnws

The dielectric multilayers were fabricated via plasma-enhanced chemical vapor deposition (PECVD, Plasma Pro System 100, Oxford) of SiO₂ and Si₃N₄ on a standard microscope cover glass (0.17 mm thickness) at a vacuum pressure of <0.1 mTorr and at a temperature of 300 °C. Here, SiO₂ is the low refractive index dielectric and Si₃N₄ is the high refractive index dielectric. The thicknesses of these dielectric layers are 105 and 88 nm, respectively. In total 14 layers were deposited on top of each other. The thickness of the top SiO₂ layer is approximately 160 nm. The Ag NWs were purchased from Nanjing XFNANO Materials Tech Co., Ltd., China. The synthesis steps of Ag NWs using wet-chemistry approaches are detailed in the study by Wei et al. [3 (link)]. The diameters of Ag NWs used in the main text are about 40 and 60 nm. There is a PVP cladding layer on the Ag NWs with a thickness of about 15 nm. The total diameters of the two Ag NWs are about 70 and 90 nm. The PVP cladding layer can make the Ag NWs stable for long-term use. The PS nanoparticles were bought from Thermo Fisher Scientific, USA, and their attachment to the Ag NW was realized by a MET One Aerosol Particle Generator 255 Gen.