Fourier transform infrared (FT-IR) spectra were recorded on a PE instruments Spectrum One FT-IR spectrometer using the KBr pellet method in the range of 500–4000 cm−1. Raman spectroscopy was recorded on a JobinYvon HR800 Raman Spectrometer with excitation from the 450-nm laser source. Ultraviolet–visible (UV–vis) spectra were conducted on a Perkin–Elmer Lambda 900 UV/VIS/NIR spectrophotometer. X-ray photoelectron spectra (XPS) measurements were carried out on a Kratos AXIS Ultra DLD system using monochromated Al Kα X-ray source (1486.6 eV). The morphology and microstructure of the products were characterized using a transmission electron microscope (TEM) with a JEM 2100 instrument at 200 kV utilizing a JEOL FasTEM system and scanning electron microscopy (SEM) with a Hitachi S4800. The surface morphology and thickness of the film deposited on silicon wafer was investigated by a tapping-mode atomic force microscope (AFM, Digital instrument Nanoscope IIIa).
Axis ultra dld system
Manufactured by Shimadzu
Sourced in United Kingdom, China
The Axis Ultra DLD system is a high-performance X-ray photoelectron spectroscopy (XPS) instrument designed for surface analysis. It provides detailed information about the chemical composition and electronic structure of the sample surface.
Automatically generated - may contain errors
Lab products found in correlation
S 4800, by Hitachi (4 mentions)
Jem 2100, by JEOL (3 mentions)
Lambda 900 uv vis nir spectrophotometer, by PerkinElmer (1 mentions)
Hr800 raman spectrometer, by Horiba (1 mentions)
Cary 630 ftir spectrometer, by Agilent Technologies (1 mentions)
D8 advance device, by Bruker (1 mentions)
Tecnai g2 f20, by Thermo Fisher Scientific (1 mentions)
X pert pro mrd diffractometer, by Philips (1 mentions)
Dxr high resolution raman microscope, by Thermo Fisher Scientific (1 mentions)
D8 advance x, by Bruker (1 mentions)
Nrs 3100 spectrometer, by Jasco (1 mentions)
Jsm 7800f, by JEOL (1 mentions)
Jsm 6700f, by JEOL (1 mentions)
S2000 spectrometer, by OceanOptics (1 mentions)
Quanta 250, by Thermo Fisher Scientific (1 mentions)
Cu kα, by Bruker (1 mentions)
Vertex 70, by Bruker (1 mentions)
Chi 660d, by CH Instruments (1 mentions)
Frontier ft ir spectrometer, by PerkinElmer (1 mentions)
Jsm 6335 f system, by JEOL (1 mentions)
27 protocols using axis ultra dld system
1
Comprehensive Characterization of Novel Materials
2
Physicochemical Characterization of CuNPs
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The physicochemical features of both CuNPs solutions were evaluated, using several analytical techniques. Particle size and distribution profiles were obtained by Dynamic Light Scattering (DLS), using a VASCO 3 DLS analyzer of Cordouan Technologies. High-Resolution Transmission Electron Microscopy (HR-TEM) was employed to verify the size of the CuNPs, while providing information on their morphology and shape (JEOL JEM 2010 & Oxford INCA). Attenuated Total reflectance (ATR) was used to analyze the resulted copper-based nanoparticles, using a Cary 630 FTIR Spectrometer by Agilent Technologies with a Diamond ATR sampling accessory, while X-ray Photoelectron Spectroscopy (XPS) was employed to determinate and quantify the prevalent copper species, using an AXIS UltraDLD system by Kratos Analytical (Shimadzu Group Company). Compositional characteristics were validated through X-ray Diffraction and Scattering (XRD), performed on a Bruker D8 ADVANCE device. Finally, a Laser Doppler Electrophoresis (LDE) technique was used to measure the zeta-potential of copper nanoparticles, by using a Wallis Zeta analyzer, Cordouan.
3
X-ray Photoelectron Spectroscopy of Dried Milled Samples
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An Axis Ultra DLD system (Kratos Analytical Ltd.) was used to collect
XPS spectra using a monochromatic Al Kα X-ray source operating
at 150 W (10 mA × 15 kV). Data from the dried milled samples
were collected with pass energies of 160 eV for survey spectra, and
40 eV for the high-resolution scans with step sizes of 1 and 0.1 eV,
respectively. The system was operated in hybrid mode, using a combination
of magnetic immersion and electrostatic lenses, and acquired over
an area of approximately 300 × 700 μm2. A magnetically
confined charge compensation system was used to minimize charging
of the sample surface, and all spectra were taken with a 90°
take-off angle. A base pressure of ca. 1 × 10–9 Torr was maintained during the collection of the spectra.
Data were analyzed using CasaXPS v2.3.21 (Case Software Ltd.) after
subtraction of a Shirley background and using modified Wagner sensitivity
factors as supplied by the manufacturer. Note that due to the overlap
of the Na(1s) core level with a portion of the Ti Auger signal, a
model for this background signal was obtained from TiO2 and fitted in addition to a Na(1s) component.
XPS spectra using a monochromatic Al Kα X-ray source operating
at 150 W (10 mA × 15 kV). Data from the dried milled samples
were collected with pass energies of 160 eV for survey spectra, and
40 eV for the high-resolution scans with step sizes of 1 and 0.1 eV,
respectively. The system was operated in hybrid mode, using a combination
of magnetic immersion and electrostatic lenses, and acquired over
an area of approximately 300 × 700 μm2. A magnetically
confined charge compensation system was used to minimize charging
of the sample surface, and all spectra were taken with a 90°
take-off angle. A base pressure of ca. 1 × 10–9 Torr was maintained during the collection of the spectra.
Data were analyzed using CasaXPS v2.3.21 (Case Software Ltd.) after
subtraction of a Shirley background and using modified Wagner sensitivity
factors as supplied by the manufacturer. Note that due to the overlap
of the Na(1s) core level with a portion of the Ti Auger signal, a
model for this background signal was obtained from TiO2 and fitted in addition to a Na(1s) component.
4
Comprehensive Characterization of WO3 Photochromic Materials
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The transmission electron microscopy (TEM) images, high resolution transmission electron microscopy (HRTEM) images and the electron diffraction pattern were collected with a transmission electron microscope (FEI Tecnai G2 F20). The scanning electron microscopy (SEM) images, the selected area elemental analysis and the energy dispersive spectroscopy (EDX) were performed by a Field Emission-SEM system (Hitachi S-4800). X-ray diffraction (XRD) patterns were collected by a Philips X'Pert-Pro MRD diffractometer with a Cu Kα radiation. X-ray photoelectron spectroscopy (XPS) was measured by a Kratos AXIS ULTRA DLD system. All the optical pictures were taken by Nikon D750 digital camera, and the photochromic coloration process was carried out by using a handle UV lamp with 254 nm emission. The UV-vis diffuse reflectance spectroscopies of solid WO3 samples and photochromic fiber samples were captured by Ideaoptics PG4000 spectrometer system.
5
Characterization of MWCNT Nanocomposites
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Scanning Electron Microscopy (SEM) was carried out using a ZEISS Supra (Zeiss, Oberkochen, Germany) at an accelerating voltage of 5 kV and a nominal working distance of 2.5 mm. The nanocomposite specimens were coated in a thin layer of gold (3 nm) to prevent charging. Raman spectra were recorded using a DXR high resolution Raman Microscope (Thermo Fisher Scientific, Waltham MA, USA) equipped with Ar laser (irradiation wavelength 532 nm). X-ray Photoelectron Spectroscopy (XPS) (Kratos Analytical Ltd, Manchester, UK) was performed using a Kratos Axis Ultra DLD system using an Al monochromated X-ray source operated at 15 kV, 5 mA emissions. Analysis conditions used were 160 eV pass energy, 1 eV steps, 0.2 s dwell per step and 2 sweeps. Samples for XPS were prepared by evaporation of MWCNT from solution onto Si-wafer substrates.
6
Plasma Treatment Effects on PCL Scaffold Wettability
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Contact angle: Static contact angle measurements using water (Contact angle-surface tensionmeter CAM200, KSV Instruments Ltd) for the untreated and plasma-treated electrospun PCL scaffolds were performed to study and compare the effect of the two treatments on the surface hydrophilicity. At least six different measurements on the plasma-treated surfaces were obtained and the average values for contact angles were calculated. The maximum error in the contact angle measurement did not exceed ±3%.
XPS: X-ray photoelectron spectroscopy (XPS) analysis of the surface layers was carried out in an Axis Ultra DLD system by Kratos Analytical using a monochromated Al Kα1 X-ray beam as the excitation source. The analyzed area had an elliptical shape with the two axes being about 400 and 700 μm. The pass energy was 160 eV for survey scans and 20 eV for HR spectra. In the latter case, the pass energy would result in a broadening (FWHM) of less than 500 meV for the Ag 3d line. Data interpretation was performed with the Kratos-Vision software.
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7
Comprehensive Characterization of HAp/PU Sponge
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Evaluation of structural and chemical properties of the samples was carried out by various characterization techniques. We cut the sponge into 2 mm thick slices and sprayed gold on the surface, Morphologies of the obtained HAp, PU sponge, PDMS/PU sponge, and HAp/PU sponge were observed using KYKY-EM3900M scanning electron microscopy (SEM) with an accelerating voltage of 20 kV. The crystal phase of HAp power and HAp coated on the PU sponge was analyzed using a Bruker D8 Advance X-ray diffractometer with Cu Kα radiation (λ = 0.15406) at a scanning rate of 8 °/min in the 2θ ranging from 10° to 70°. Fourier transfrom infrared spectra (FT-IR) were measured on a Nexus 670 FT-IR spectrometer (VERTEX 70, Bruker, Ettlingen, Germany). The surface element composition of the HAp/PU sponge was analyzed by an Axis Ultra DLD system from Kratos with a resolution of less than 0.2 eV. The water contact angle (WCA) was measured on an optical contact angle meter system (SDC-100, Sindin, Guangdong, China).
8
Comprehensive Microscopic Characterization of Catalytic Coatings
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Scanning Electron Microscopy (SEM) micrographs were acquired with a JEOL 6300 microscope and the composition of the electrode coatings was determined by the companion Oxford ISIS 2000 X-ray, EDS (EDAX) facility.
True three-dimensional morphological features of the deposits as well their thickness were obtained with a NT-MDT Solver Pro Atomic Force Microscope, in the tapping (semi-contact) mode.
X-ray photoelectron spectroscopy (XPS) analysis of the catalyst surface layers was carried out in an Axis Ultra DLD system by Kratos Analytical using a monochromated Al-Ka1 X-ray beam as the excitation source. The analyzed area had an elliptical shape with the two axes being ~400 and 700 μm. The pass energy was 80 eV for survey scans and 20 eV for HR spectra; for the latter case, the pass energy resulted in a broadening (FWHM) of less than 500 meV for the Ag-3d line. The studied surfaces were cleaned of adventitious Carbon and other surface contaminants by using a 4 kV Ar+ ion beam for 2 min. Data interpretation was performed with the Kratos-Vision software.
True three-dimensional morphological features of the deposits as well their thickness were obtained with a NT-MDT Solver Pro Atomic Force Microscope, in the tapping (semi-contact) mode.
X-ray photoelectron spectroscopy (XPS) analysis of the catalyst surface layers was carried out in an Axis Ultra DLD system by Kratos Analytical using a monochromated Al-Ka1 X-ray beam as the excitation source. The analyzed area had an elliptical shape with the two axes being ~400 and 700 μm. The pass energy was 80 eV for survey scans and 20 eV for HR spectra; for the latter case, the pass energy resulted in a broadening (FWHM) of less than 500 meV for the Ag-3d line. The studied surfaces were cleaned of adventitious Carbon and other surface contaminants by using a 4 kV Ar+ ion beam for 2 min. Data interpretation was performed with the Kratos-Vision software.
9
Surface Characterization of Carbon Thin Film
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A field-emission scanning electron microscope (FESEM, JSM-6700F, JEOL) was used to observe the surface structure. The Raman spectra were obtained in backscattering mode by an NRS-3100 spectrometer (JASCO) using an Ar+-ion laser (532.05 nm, 0.3 mW) as the excitation source. The laser beam was focused on the surface of the carbon thin film, producing a spot (analysis area) of approximately 4 mm in diameter. A custom-written software using Microsoft Excel based on Gaussian functions was used for the Raman peak deconvolution and fitting. Energy-dispersive X-ray spectrometry was performed using a FESEM (JSM-7800F, JEOL) and EDX (Octane Elect Super, EDAX). X-ray photoelectron spectroscopy (XPS) was carried out using an AXIS ULTRA DLD system (Kratos Analytical) with Al Ka radiation (1486.6 eV) and the accompanying Vision processing software. The XPS analysis area was 0.3 × 0.7 mm.
10
Arsenic Adsorption on Iron Oxide-Decorated Silica
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To investigate the arsenic adsorption performance of the iron oxide-decorated silica dimples, the particles were submerged in 20 mL of As(v ) solution. In particular, a solution of Na2HAsO4·7H2O in aqueous medium was prepared. The contact time was approximately 1 h, the concentration used was 10 mg L−1, and diluted hydrochloric acid was added to adjust the pH value to 6. X-ray photoelectron spectroscopy (XPS) spectra were obtained with an Axis Ultra DLD system by KRATOS in ultrahigh-vacuum conditions using a monochromated Al-Kα1 X-ray beam as the excitation source. The pass energy was 160 eV for survey scans and 40 eV for high resolution spectra. The spectra were calibrated in terms of charging-induced shifts by considering the C1s peak (originating from carbon surface contamination) to be located at 284.6 eV.
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