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X maxn 80

Manufactured by Oxford Instruments
Sourced in United Kingdom, Japan

The X-MaxN 80 is a compact energy-dispersive X-ray (EDX) detector designed for elemental analysis in various applications. It features a silicon drift detector (SDD) with an active area of 80 mm2 and provides high-resolution X-ray spectroscopy capabilities.

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12 protocols using x maxn 80

1

Characterizing Superhydrophobic Surface Morphology

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The surface morphology
of the sheets was observed by a scanning electron microscope (Quanta
250FEG, Fisher Scientific). An X-ray diffraction spectroscope (D8
Advance, Bruker, Germany) was used to identify the materials’
crystal phases at a scan rate of 6° min–1 and
a step size of 0.02°. An energy-dispersive spectroscope (X-Maxn
80, Oxford Instruments, United Kingdom) was used to analyze the chemical
elements on the samples’ surfaces. The superhydrophobic properties
and the dynamic water-repelling abilities were characterized by contact
angle measurements (JC2000D2, Shanghai Zhongchen Digital Technology,
China) with 2 μL water droplets. The adhesive force of the surfaces
was measured using an electronic balance.
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2

Uncoated Sample Microscopic Analysis

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Microscopy was performed on a Tescan MAIA 3 field emission gun scanning electron microscope (FEG_SEM) fitted with secondary and backscattered electron detection. Energy-dispersive X-ray (EDX) analysis and mapping was done using Oxford Instruments X-MaxN 80 detector and the data analysed using the Aztec software. Samples were mounted on silicon wafers and affixed to aluminium stubs using adhesive carbon tape. The samples were analysed uncoated.
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3

Morphological and Elemental Analysis of Synthesized MNPs

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In order to investigate the surface morphology and the elemental composition (qualitative and semi-quantitative analysis) of the synthesized MNPs, the cold field emission- SEM was performed. The analysis was carried out using the Hitachi SU8230 cold field emission gun STEM (Chiyoda, Tokyo, Japan) microscope, equipped with EDX detectors X-MaxN 80 from Oxford Instruments (Bristol, UK). The MNPs were sputter-coated with carbon, mounted on a copper grid support and the analysis proceeded at an acceleration voltage of 30 kV in a high vacuum mode. The elemental composition of the MNPs was assessed by EDX analysis, which identifies the elements present in sample and expresses them in weight percent (wt%).
The MNPs size and shape were assessed by TEM. The analysis was performed using the Hitachi HD2700 cold field emission gun STEM microscope (Chiyoda, Tokyo, Japan), with two windowless EDX detectors (X-MaxN 100). The samples were placed on a carbon-coated copper grid support and analyzed after drying. At 200 kV acceleration voltage, the images were obtained.
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4

FIB-SEM Imaging and EDS Analysis

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Zeiss Crossbeam 540 FIB-SEM (Carl Zeiss Microscopy GmbH) with a Gemini II SEM column and Oxford Instruments X-Maxn 80 EDS detector was used in SEM imaging and EDS measurements. In the imaging, the acceleration voltage was 1 kV, and magnifications in Figure 2b were 1.16 and 15.35 kX. In the EDS measurements, acceleration voltages from 7 to 15 kV were used.
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5

Characterizing Magnetic Nanoparticle Morphology

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SEM analysis, a qualitative and semi-quantitative technique, was employed to establish the morphology of magnetic nanoparticles. The analysis was carried out on a Hitachi SU8230 cold field emission gun STEM (Chiyoda, Tokyo, Japan) scanning electron microscope with an EDX detector X-MaxN 80 from Oxford Instruments (Abingdon, UK). For better conductivity, in order to acquire high-resolution SEM imaging, the magnetic nanoparticles were sputter-coated with gold (6 nm) (Agar Automatic Sputtercoater, Stansted, UK). The parameters set for SEM analysis were HV (high vacuum) mode, 30 kV, acceleration voltage, secondary electron detectors (upper and lower), and two magnification orders, one to highlight the general aspect of magnetic nanoparticles and the other to show the nanomaterial surface topography. The identified chemical species were expressed both in atomic relative percent (At %) and weight relative percent (Wt %).
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6

Nanoscale Crystal Characterization Techniques

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A Zeiss Scope A.1 optical microscope with an Axiocam 503 Color camera was used to image crystals within the nanochannels. A Zeiss 780 NLO confocal laser scanning microscope was used for fluorescence imaging of crystals after soaking with the fluorescent molecules. The fluorescence was measured using an external transmission NDD PMT detector.
A Quanta 650 scanning electron microscope (SEM) (5 kV, spot size 4, Everhart–Thornley detector) was used to collect morphological data from crystals in the nanochannels. Energy dispersive X-ray spectroscopy (EDS) (18 kV beam, Oxford Instruments, X-MaxN 80) was used analyze elemental composition of crystals in delaminated channels. Channels were prepared for these processes by sputter coating them with a protective layer (∼20 nm thick) of gold-palladium using a Precision Etching and Coating System (Model 682 PECS).
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7

Elemental Mapping of Fish Fossils

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The cross-section areas of the fish fossil samples were surveyed with secondary electron imaging system without any conductive coating. The elemental distribution was mapped using energy dispersive x-ray spectroscopy at 15 kV with 0.2 nA using the FEI Helios 660 dual-beam focused ion beam instrument (FIB-SEM) equipped with an Oxford Instrument X-MaxN 80 silicon drift detector system in the Advanced Electron Microscopy Center at the University of Hawai’i, USA. The chemical compositions were also extracted from the elemental maps collected using Aztec software (Oxford Instruments, UK).
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8

Characterization of Magnetic Nanoparticles

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Morphology, qualitative, and semiquantitative analysis of naked MIONPs was carried out using the scanning electron microscope Hitachi SU8230 cold field emission gun STEM (Chiyoda, Tokyo, Japan) with EDX detectors X-MaxN 80 from Oxford Instruments (UK). The magnetic nanoparticles were sputter-coated with 6 nm of gold (Agar Automatic Sputtercoater, UK) for better conductivity, which is required for high resolution SEM imaging. SEM analysis parameters were HV (high vacuum) mode, 30 kV acceleration voltage, secondary electron detectors (upper and lower), and one of two magnification orders, one for a general aspect of samples and a higher one for surface topography analysis. The identified chemical species were expressed in atomic relative percent (At%).
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9

Scanning Electron Microscopy of Coated Samples

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Analysis of cross sections was performed with a FE-SEM Zeiss Σigma HD system equipped with an Oxford Instrument X-MaxN 80 silicon drift detector (SDD). Back-scattered electron (BSE) imaging, as well as EDS elemental analysis and mapping, were carried out in high vacuum at 20 kV and at an 8.5-mm working distance, on 12-nm carbon-coated samples.
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10

Characterization of CAD/CAM Material Powders

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The powders obtained from all three types of CAD/CAM restorative materials (rough exposed, fine exposed, and nonexposed) were subjected to electron microscopy characterization. The morphological and structural changes induced by the acidic artificial saliva (pH = 2.99) on the exposed CAD/CAM materials, as well as the morphology and structure of the nonexposed samples, were assessed by scanning electron microscopy (SEM), by using a Hitachi SU8230 cold field emission gun STEM (Chiyoda, Tokyo, Japan) microscope with EDX detectors X-MaxN 80 from Oxford Instruments (Bristol, United Kingdom). The SEM images were recorded at two magnification orders, one for a general overview of the image/measurements (×100) and another for higher surface topography (×5.00 k). The elemental composition of each CAD/CAM restorative material powder (exposed or nonexposed to artificial acidic saliva) was assessed by EDX analysis and the identified chemical species were expressed in weight percent (wt %).
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