Su5000 fe sem
The SU5000 FE-SEM is a high-resolution field emission scanning electron microscope (FE-SEM) manufactured by Hitachi. It is designed to provide detailed, high-quality images of a wide range of samples at the nanoscale level. The SU5000 FE-SEM utilizes a field emission gun to generate a focused electron beam, enabling high-resolution imaging and analysis capabilities.
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15 protocols using su5000 fe sem
Scanning Electron Microscopy of Biofilm
Characterization of Material Morphology
SEM Imaging and Particle Size Analysis
Cellulose-Chitosan Materials Microscopy
microstructure and morphology of the cellulose–chitosan-based
materials were analyzed by SEM using a FE-SEM SU5000 (Hitachi, Tokyo,
Japan). All samples were dried and coated with gold for 50 s according
to the standard protocol.57 An electron
beam energy of 5 kV was applied for analysis.
Cell Scaffold Surface Characterization
To maximise image quality, scaffolds were coated with a thin layer of gold-palladium (18 nm) using Emitech K500X sputtering system (Quorum Technologies, Lewes, UK) at 25 mA for 150 s. Field emission scanning electron microscopy, FESEM (SU5000, Hitachi, Tokyo, Japan), was used to study surface topography at 5 KV voltage from three random locations per cell-seeded scaffold type.
Substrate Characterization by SEM-BEI-EDS
Scanning Electron Microscopy of Cell Filopodia
Scanning Electron Microscopy Sample Preparation
Detailed SEM and TEM Imaging Protocols
Scanning Electron Microscopy and Elemental Mapping
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