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Phi x tool

Manufactured by Physical Electronics
Sourced in Japan

The PHI X-tool is a multi-functional surface analysis system that combines X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and scanning Auger microscopy (SAM) capabilities. It is designed to provide comprehensive surface characterization for a wide range of materials and applications.

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12 protocols using phi x tool

1

Surface Characterization of Modified Titanium Nitride

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TNS and TNS-MAP surface morphologies were examined by scanning electron microscopy (SEM) (S-4800; Hitachi, Tokyo, Japan). Surface topography and mean average surface roughness (Ra) were examined by atomic force microscopy (AFM) (SPM-9600; Shimadzu, Tokyo, Japan). The chemical compositions of the modified surface layers were analyzed by X-ray photoelectron spectrometry (XPS; PHI X-tool; ULVAC-PHI, Kanagawa, Japan). Contact angles were measured with a contact angle measurement system (VSA 2500 XE; AST Products, Billerica, MA, USA). The physicochemical properties of TNS and TNS-MAP were determined by attenuated reflectance Fourier transform infrared spectroscopy (ATR-FTIR) over a range of 400–4,000 cm−1 with a Spectrum One instrument (PerkinElmer, Norwalk, CT, USA).
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2

Analyzing Surface Topography and Composition

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The surface topography of Ti and TNS were observed using scanning electron microscopy (SEM: S-4800; Hitachi, Tokyo, Japan). The mean average surface roughness (Ra) and three-dimensional surface topography of the samples were then assayed under a scanning probe microscope (Shimadzu, Tokyo, Japan). X-ray photoelectron spectrometry (XPS; PHI X-tool; ULVAC-PHI, Kanagawa, Japan) was also performed to evaluate the surface elemental compositions of Ti and TNS.
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3

Surface Morphology and Characterization of PEEK Biomaterials

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The surface morphologies of the PEEK, PEEK-Ti, and PEEK-TNS disks were observed using scanning electron microscopy (SEM) (S-4800; Hitachi, Tokyo, Japan). The three-dimensional surface topography and mean average surface roughness (Ra) were then obtained using a scanning probe microscope (SPM, Shimadzu, Tokyo, Japan). Cross-section processing of PEEK-Ti and PEEK-TNS was performed using a focused ion beam (FIB), and the cross-sectional morphology was observed at 50° using SEM. X-ray photoelectron spectrometry (XPS; PHI X-tool; ULVAC-PHI, Kanagawa, Japan) was used to evaluate the surface chemical states and elemental composition. The water contact angles were also measured using a contact angle measurement system (VS A2500 XE; AST Products, Billerica, MA, USA).
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4

Characterizing Ti Surface Morphology

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The surface morphology of Ti disks, contaminated Tallow-Ti disks, and Ti disks cleaned using the three methods (Finevo-Ti, UV-Ti, and Plasma-Ti) was examined by scanning electron microscopy (SEM; S-4800; Shimadzu, Kyoto, Japan) at a 5 kV accelerating voltage. The mean average surface roughness (Ra) and surface topography were assessed using a scanning probe microscope (SPM; SPM-9600; Shimadzu, Kyoto, Japan). The range of analysis was 125 μm × 125 μm. To compare the elemental composition of the Ti surface before and after cleaning using the three methods, the samples were analyzed using X-ray photoelectron spectroscopy (XPS; PHI X-tool; ULVAC-PHI, Kanagawa, Japan) equipped with a monochromatic X-ray source (Al Kα anode) operating at 15 kV and 13 W. The diameter of the analysis point was about 55 μm, and the angle between the electronic analyzer and the sample surface was 45 degrees.
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5

Characterization of Fe3O4-Fe Nanohybrids

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The morphology and composition of the Fe3O4-Fe nanohybrids and the Fe3O4 nanospheres were investigated using transmission electron microscopy (TEM; Tecnai G2 F30 S-Twin, FEI), high angle annular dark field-scanning transmission electron microscopy with energy-dispersive X-ray spectroscopy (HAADF-STEM with EDS; JEM-2100F, JEOL, USA), field emission scanning electron microscopy (FESEM; S-4300, Hitachi), and X-ray photo-electron spectroscopy (XPS; PHI X-tool, ULVAC-PHI, Japan). The phase and crystal structure were characterized by X-ray diffraction (XRD; Ultima III, Rigaku). The particle size distribution was determined from dynamic light scattering (DLS) analyses using a particle size analyzer (PSA; ELSZ-1000, Otsuka Electronics Korea Co. Ltd.).
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6

X-ray Photoelectron Spectroscopy Analysis

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The surface atomic changes of each specimen were characterized by XPS using an X-ray photoelectron spectrometer (PHI X-tool, ULVAC-PHI, Inc., Kanagawa, Japan) with an Al-Kα radiation source (15 kV 4 W, spot size: 19 µm). Peak decomposition was achieved using software (PHI MultiPak, ULVAC-PHI, Inc., Kanagawa, Japan), and the peak assignments were supported with Handbook of X-ray Photoelectron Spectroscopy (ULVAC-PHI, Inc., Kanagawa, Japan).
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7

Calcium Phosphate Coating for Bone Biomaterials

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Calcium phosphate coating is known to facilitate the bone-forming ability of biomaterials [52 (link)]. Both sponges were incubated in DMEM for 1 day and 1–4 weeks in cryotubes (500 µL per tube) to analyze the calcium phosphate precipitation. At prescribed time points, the treated sponges were evaluated using FE-SEM (S-4800; Hitachi), X-ray photoelectron spectroscopy (XPS; PHI X-tool, ULVAC-PHI, Kanagawa, Japan), and ATR-FTIR spectroscopy (IRAffinity-1S, Shimadzu).
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8

Membrane Characterization Techniques for FO Concentration

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Membrane characterizations were conducted at the inner surface of hollow fibers to assess the membrane fouling condition during the FO concentration process. Scanning electron microscopy (SEM) (Ultra 55, ZEISS, Oberkochen, Germany) equipped with an energy dispersive spectrometer (EDS) (IE450, Oxford, Oxford, England) was used to analyze the surface morphology and elemental composition of the membrane. Atomic force microscopy (AFM) (SPA300HV, Seiko, Tokyo, Japan) was used to evaluate the surface roughness of the membrane. X-ray photoelectron spectroscopy (XPS) (PHI X-tool, Ulvac-Phi, Kanagawa, Japan) was used to further identify the membrane elemental composition.
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9

Surface Characterization of Alloy Samples

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The surface morphology of the alloy samples was examined using scanning electron microscopy (SEM) (S-4800; Hitachi, Tokyo, Japan) with an accelerating voltage of 10 kV.
Atomic force microscopy (AFM) (SPM-9600; Shimadzu, Tokyo, Japan) was also performed to obtain the mean average surface roughness (Ra), mean peak-to-valley height (Rz), and two-dimensional surface topography.
The surface chemical compositions of the modified layers were investigated using X-ray photoelectron spectrometry (XPS; PHI X-tool; ULVAC-PHI, Kanagawa, Japan).
X-ray powder diffraction (XRD) (XRD-6100; Shimadzu) was used to determine the surface phase properties. Spectra were recorded in the range of 2θ=20°–60°, operating at 40 kV and 200 mA and using a Cu-Kα radiation source, scanning speed of 2°/min, and incident angle of 1°.
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10

Characterizing PEEK Surface Morphology

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The surface morphology of the materials was observed by scanning electron microscopy (SEM) using a 5-kV S-4800 scanning electron microscope (Hitachi High Technologies, Tokyo, Japan) after the sample was dried on an aluminum stub and sputter-coated with Pt-Pd.
X-ray photoelectron spectrum measurements X-ray photoelectron spectra (XPS) of the PEEK surfaces were obtained using a PHI X-tool (Ulvac-Phi, Kanagawa, Japan) equipped with an Al-Kα radiation source (15 kV; 53 W; spot size: 205 μm) at a pass energy of 224 eV (wide scan) or 112.00 eV (narrow scan), a step size of 0.100 eV, and a takeoff angle of 45°, with 20 scans. The measurements were conducted for three randomly selected points on each sample, and the concentrations of all functional groups on PEEK surfaces were calculated from the areas of the relevant spectral peaks.
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