Phi x tool
The PHI X-tool is a multi-functional surface analysis system that combines X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and scanning Auger microscopy (SAM) capabilities. It is designed to provide comprehensive surface characterization for a wide range of materials and applications.
Lab products found in correlation
12 protocols using phi x tool
Surface Characterization of Modified Titanium Nitride
Analyzing Surface Topography and Composition
Surface Morphology and Characterization of PEEK Biomaterials
Characterizing Ti Surface Morphology
Characterization of Fe3O4-Fe Nanohybrids
X-ray Photoelectron Spectroscopy Analysis
Calcium Phosphate Coating for Bone Biomaterials
Membrane Characterization Techniques for FO Concentration
Surface Characterization of Alloy Samples
Atomic force microscopy (AFM) (SPM-9600; Shimadzu, Tokyo, Japan) was also performed to obtain the mean average surface roughness (Ra), mean peak-to-valley height (Rz), and two-dimensional surface topography.
The surface chemical compositions of the modified layers were investigated using X-ray photoelectron spectrometry (XPS; PHI X-tool; ULVAC-PHI, Kanagawa, Japan).
X-ray powder diffraction (XRD) (XRD-6100; Shimadzu) was used to determine the surface phase properties. Spectra were recorded in the range of 2θ=20°–60°, operating at 40 kV and 200 mA and using a Cu-Kα radiation source, scanning speed of 2°/min, and incident angle of 1°.
Characterizing PEEK Surface Morphology
X-ray photoelectron spectrum measurements X-ray photoelectron spectra (XPS) of the PEEK surfaces were obtained using a PHI X-tool (Ulvac-Phi, Kanagawa, Japan) equipped with an Al-Kα radiation source (15 kV; 53 W; spot size: 205 μm) at a pass energy of 224 eV (wide scan) or 112.00 eV (narrow scan), a step size of 0.100 eV, and a takeoff angle of 45°, with 20 scans. The measurements were conducted for three randomly selected points on each sample, and the concentrations of all functional groups on PEEK surfaces were calculated from the areas of the relevant spectral peaks.
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