Ecz 400r

Dried solvents and argon as protection gas were used. ¹¹B, ¹³C, ¹⁹F, ²⁹Si, and ⁷⁷Se NMR spectra were recorded with a JEOL ECZ 400R or with a JEOL ECS 400 spectrometer (128.25, 100.51, 376.13, 79, and 76.24 MHz, respectively). Chemical shifts δ are reported in ppm relative to BF₃⋅OEt₂ (¹¹B), Me₄Si (¹³C, ²⁹Si), CFCl₃ (¹⁹F), and Me₂Se (⁷⁷Se).
For ESI‐TOF mass spectra, the samples were measured from CH₃CN, CH₃CN/CH₂Cl₂, CH₃OH, or CH₃CN/CH₃OH solutions with an Agilent 6210 ESI‐TOF, Agilent Technologies, Santa Clara, CA, USA. The solvent flow rate was adjusted to 4 μL min⁻¹, spray voltage set to 4 kV, drying gas flow rate was set to 15 psi (1 bar; ESI‐TOF=electrospray ionization–time of flight). Non‐ionic compounds were analyzed with a HR‐EI‐MS (Autospec Premier, Waters Co., Milford, MA, USA) using 80 eV electron energy.

All reagents and solvents were
purchased from Tokyo Chemical Industry Co., Ltd.; FUJIFILM Wako Pure
Chemical Corporation; Kanto Chemical Co., Ltd.; Sigma-Aldrich Co.,
LLC; and ISOTEC and used without further purification. Unless otherwise
noted, all reactions were conducted without any inert gas. Chromatography
was carried out with Wakogel C-200 silica gel (FUJIFILM Wako Pure
Chemical Corporation, granule, 0.075–0.150 mm). NMR spectra
were recorded at 600, 500, and 400 MHz for ¹H and 150,
125, and 100 MHz for ¹³C on JEOL JNM-ECA600, -ECA500, and
-ECZ400R spectrometers, respectively. Chemical shifts were reported
in parts per million (ppm, δ) relative to the residual solvent
peaks of CD₃OD (3.31 ppm for ¹H NMR, 49.0 ppm
for ¹³C NMR) and (CD₃)₂CO (2.05 ppm
for ¹H NMR, 206.26 ppm for ¹³C NMR), and coupling
constants (J values) were given in Hertz. High-performance
liquid chromatography was carried out with a PU–2089 plus HPLC
pump (JASCO), an LC–NetII/ADC (JASCO), and a UV–2075
plus UV/vis detector (JASCO). High-resolution mass spectra (HRMS)
were measured on a JEOL Accu TOF T-100 equipped with an electrospray
ionization (ESI) unit.