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Phi 5400

Manufactured by PerkinElmer
Sourced in United States

The PHI-5400 is a X-ray photoelectron spectroscopy (XPS) system manufactured by PerkinElmer. It is used for the analysis of the elemental composition and chemical state of a material's surface. The PHI-5400 provides high-resolution data on the surface properties of samples.

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7 protocols using phi 5400

1

Catechol-chitosan hydrogel synthesis

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C-CS was placed in Tris-base solution (pH ​= ​8.5) and completely dissolved in an ice bath while stirring. Then Cys solution in Tris-base was added slowly to the C-CS solution and the solution was kept stirring for about 2 ​h to oxidize the catechol groups. The mixture solution was stirred vigorously for 5 ​min at controlled temperature (37 ​°C) for gelation to prepare the C-CS-Cys hydrogel. The C-CS hydrogel was prepared in the same way without the addition of Cys. C-CS with different grafting ratios were used to prepare modifications of the hydrogel. This work used different feed ratios to gain the catechol-chitosan with different grafting rates (as in Table S2). The different preparation conditions, explored for the formation of the C-CS and C-CS-Cys hydrogels, are in Table S3.
After freeze-drying, the C-CS and C-CS-Cys hydrogels were characterized by FT-IR and XPS using a Nicolet-5700 Fourier Infrared Spectrometer and a PHI-5400 Perkin Elmer X-ray photoelectron spectrometer, respectively. C-CS-Tris sample was re-dried after dissolution in Tris-base solution.
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2

Quantification of Drug-loaded Coatings

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In order to confirm the successful preparation of the drug loading of the self-assembled film, the elements contained in the drug-loaded coatings prepared with different concentrations of ACS14 were quantified by X-ray photoelectron spectroscopy (PHI-5400, PerkinElmer, USA).
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3

Material Characterization via ATR-FTIR, XPS, and Contact Angle

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The chemical structures of the samples were characterized by an attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR, NICOLET 5700) with the diffuse reflectance mode in the range of 4000–400 cm−1. X-ray photoelectron spectroscopy (XPS) analysis was carried out by a PHI-5400 (PerkinElmer, USA) X-ray photoelectron spectrometer using a monochromatic AlKcx (hv = 1486.6 eV) at 10–20 kV working voltage and 45 mA emission current. The barometric pressure in the chamber was set below 2 × 10−9 Torr and the binding energy scale was standardized by setting the C1s peak at 284.6 eV. Static water contact angles of the samples were measured using the sessile drop method on a DSA100 contact angle instrument (KRÜSS, Germany).
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4

Characterization of Magnetic Nanocomposites

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The morphological investigations of the samples were observed by the transmission electron microscopy (TEM; Tecnai G2 F20, USA). Thermo Gravimetric Analyzer (TGA, Q500, USA) was utilized for the identification of the thermal properties in the range of 0 to 800 °C (heating rate was 10 °C min−1) under nitrogen atmosphere. The surface functional groups of the materials were characterized by Fourier transform infrared spectrum (FT-IR; Nicolet Magna-IR 750, USA) at room temperature. Surface elemental composition of the samples were analyzed using a X-ray photoelectron spectroscopy (XPS; PerkinElmer PHI-5400, USA). The crystal structure of the samples were analyzed by X-ray diffraction spectrometer (XRD; Bruker D8 ADVANCE, German). Magnetic property of the samples was analyzed using a vibration sample magnetometer (VSM; Quantum Design Instruments, USA) at room temperature. Zeta potentials of Fe3O4@SiO2/PEI was determined using a Zeta-sizer Nano-ZS (Malvern, UK) under different pH.
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5

Comprehensive Characterization of Graphene Oxide

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X-ray photoelectron spectroscopy (XPS, PHI 5400, Perkin-Elmer, Eden Prairie, MN) was used to characterize the elemental composition of GO. Atomic force microscope (AFM, Dimension Icon, Bruker, Santa Barbara, CA) images were taken to characterize the thickness and lateral dimension of GO monolayer deposited on a silicon wafer. The contact angle of solvents on the GO membrane surface were measured using an optical tensiometer (Theta Lite, Biolin Scientific, Sweden).
Scanning electron microscopy (SEM, Ultra-55 FESEM, ZEISS) images were taken for the surface of the Nylon substrate before and after the GO coating. Cross-sectional images were obtained to evaluate the thickness of the GO coating. The zeta potential of GO sheets in the aqueous solutions were measured using a Zetasizer Nano-ZSP analyzer (Malvern, Westborough, MA). The interlayer spacing of GO in the dry state and solvents were characterized by X-ray diffraction (XRD, Bruker D8 Discover GADDS) with a graphite-monochromated Co Ka radiation (λ = 0.179 nm).
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6

X-ray Photoelectron Spectroscopy Analysis of Dentin

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One dentin disc from each group was selected at random on day 21 for XPS analysis (PHI 5400; PerkinElmer Inc., Waltham, MA, USA). XPS analysis was performed for detection of reaction products. Broad-range survey scans were performed to determine the atomic concentration (at%) at a pass energy of 89.45 eV and with an entrance slit width of 4 mm and resolution of approximately 1.3 eV. Binding energy calibration was performed with respect to C1s, from surface hydrocarbons, assuming the value of 284.8 eV for this. The binding energy and the chemical shifts of the Ag3d photo peaks and the kinetic energy of the so-called AgMNN Auger structures were then determined.16 ,17
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7

Comprehensive Characterization of Nanostructures

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The crystal structures of the obtained samples were determined by powder X−ray diffractometer (PANalytical X’Pert PRO, Netherlands) operating at 40 kV and 35 mA, using Cu Kα radiation (λ =1.5418 Å) with a scanning speed of 0.2 °/s. The surface area was measured by N2 absorption−desorption test using automated surface area and prose size analyzer (BELSORP−max, MicrotracBEL Inc., Japan). The morphology of the products was determined with a JEOL JEM-2010 and Tecnai G2 F20 (FEI Inc., USA) at the operating voltage of 200 kV. In high-resolution transmission electron microscopy (HRTEM), the corresponding fast Fourier transform (FFT) was obtained by Gatan Digital Micrograph software (Gatan Inc., America). X−ray photoelectron spectroscopy (XPS) measurements were carried out on a X−ray photoelectron spectrometer (PHI−5400, Perkin Elmer Inc., USA). Al radiation (hv = 1486.6 eV) was adopted as the excitation source and the binding energies were corrected using the background C1s peak (284.6 eV) as a reference.
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